WEB BASED CHEMICAL BATH DEPOSITION APPARATUS
    1.
    发明申请
    WEB BASED CHEMICAL BATH DEPOSITION APPARATUS 有权
    基于WEB的化学浴沉积装置

    公开(公告)号:US20160315215A1

    公开(公告)日:2016-10-27

    申请号:US15102569

    申请日:2014-12-19

    Applicant: NUVOSUN, INC.

    Abstract: Methods and systems for forming a layer from a fluid mixture on a web are provided. The system includes a fluid delivery apparatus for delivering the fluid mixture onto the web. The fluid delivery apparatus includes a cascade device and a chemical dispenser device. The system also includes a fluid stirring apparatus comprising at least one fan positioned over the web and configured to generate a flow pattern that stirs the fluid mixture on the web while the layer is being formed, without the at least one fan contacting the fluid mixture. The system further includes a fluid removal apparatus having a rinsing device and a suction device. The rinsing device is configured to dispense a rinsing fluid onto the web. The suction device is configured to remove by suction the rinsing fluid and a remaining portion of the fluid mixture remaining on the web after formation of the layer.

    Abstract translation: 提供了用于从网上的流体混合物形成层的方法和系统。 该系统包括用于将流体混合物输送到卷材上的流体输送装置。 流体输送装置包括级联装置和化学分配装置。 该系统还包括流体搅拌装置,其包括至少一个风扇,该风扇定位在纸幅上并且被配置为产生流动图案,其在形成该层的同时搅拌幅材上的流体混合物,而至少一个风扇不接触流体混合物。 该系统还包括具有漂洗装置和抽吸装置的流体清除装置。 冲洗装置被配置为将清洗流体分配到网上。 抽吸装置构造成在形成层之后通过抽吸去除冲洗流体和剩余部分的流体混合物。

    METHOD FOR MONITORING SE VAPOR IN VACUUM REACTOR APPARATUS
    2.
    发明申请
    METHOD FOR MONITORING SE VAPOR IN VACUUM REACTOR APPARATUS 审中-公开
    在真空反应器装置中监测蒸汽的方法

    公开(公告)号:US20160273097A1

    公开(公告)日:2016-09-22

    申请号:US15035227

    申请日:2014-10-16

    Applicant: NUVOSUN, INC.

    CPC classification number: C23C14/546 C23C14/0623 C23C14/243 C23C14/543

    Abstract: Methods and systems are disclosed for monitoring vapor in a vacuum reactor apparatus. An system has (a) a vacuum chamber, (b) a vapor source housed in the vacuum chamber, wherein the vapor source is configured to generate a vapor, (c) a reaction vessel housed in the vacuum chamber and coupled to the vapor source, where the reaction vessel has an outlet to the vacuum chamber, and where the reaction vessel is configured to receive the vapor from the vapor source and to emit a portion of the received vapor into the vacuum chamber through the outlet, and (d) one or more sensors housed in the vacuum chamber, where the one or more sensors are configured to detect the vapor emitted through the outlet.

    Abstract translation: 公开了用于监测真空反应器装置中的蒸气的方法和系统。 一种系统具有(a)真空室,(b)容纳在真空室中的蒸气源,其中蒸汽源被配置成产生蒸气,(c)容纳在真空室中的反应容器,并与蒸气源 ,其中反应容器具有到真空室的出口,并且其中反应容器构造成从蒸汽源接收蒸气并且通过出口将一部分接收的蒸气排放到真空室中,并且(d)一个 或更多的传感器,其中所述一个或多个传感器被配置为检测通过所述出口排出的蒸汽。

    WEB BASED CHEMICAL BATH DEPOSITION APPARATUS
    6.
    发明申请
    WEB BASED CHEMICAL BATH DEPOSITION APPARATUS 审中-公开
    基于WEB的化学浴沉积装置

    公开(公告)号:US20160312348A1

    公开(公告)日:2016-10-27

    申请号:US15102574

    申请日:2014-12-19

    Applicant: NUVOSUN, INC.

    Abstract: Disclosed are methods and systems for processing a web. The web (402) has a first surface, a second surface opposite the first surface, and includes a magnetic material. An example system includes a processing bed (202) configured to support the web while the first surface of the web undergoes one or more processing steps. The system also includes magnets (300) positioned relative to the processing bed so as to exert a magnetic force on the web that pulls the center of the web (403) toward the processing bed. The system further includes a conveyor belt (404) configured to move the web over the processing bed (202). The conveyor belt has a first contact surface and a second contact surface opposite the first contact surface. The first contact surface is configured to contact the second surface of the web, and the second contact surface is configured to contact the processing bed.

    Abstract translation: 公开了用于处理网络的方法和系统。 网(402)具有第一表面,与第一表面相对的第二表面,并且包括磁性材料。 示例性系统包括被配置为在纤维网的第一表面经历一个或多个处理步骤时支撑幅材的处理床(202)。 该系统还包括相对于处理床定位的磁体(300),以便对卷筒纸(403)的中心向处理床施加磁力。 所述系统还包括被配置为将所述幅材移动到所述处理床(202)上的传送带(404)。 传送带具有与第一接触表面相对的第一接触表面和第二接触表面。 第一接触表面构造成接触幅材的第二表面,并且第二接触表面构造成接触处理床。

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