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    Film cassette for gaseous vapor deposition
    2.
    发明授权
    Film cassette for gaseous vapor deposition 失效
    用于气相沉积的胶片盒

    公开(公告)号：US08551249B2

    公开(公告)日：2013-10-08

    申请号：US12550743

    申请日：2009-08-31

    Applicant: Peter Francis Carcia ,  Calixto Estrada ,  Richard Dale Kinard ,  Robert Scott McLean ,  Kirstin H. Shilkitus

    Inventor： Peter Francis Carcia ,  Calixto Estrada ,  Richard Dale Kinard ,  Robert Scott McLean ,  Kirstin H. Shilkitus

    IPC: C23C16/00

    CPC classification number: C23C16/458 ,  B33Y80/00 ,  B65H18/00 ,  B65H2301/51145 ,  B65H2801/87 ,  C23C16/45506 ,  C23C16/45544 ,  C23C16/45582 ,  C23C16/45591 ,  C23C16/545

    Abstract: A cassette for supporting a film during a gaseous vapor deposition process includes a central shaft having first and second end plates. A rib on each end plate forms a spiral groove able to accept an edge of a film. Each rib has a cross sectional configuration having substantially linear major edges, a predetermined width dimension and a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The rib could be substantially rectangular with an optional flow spoiler at the free end or substantially wedge-shaped. The interspoke spacing between end plates is at least three hundred millimeters (300 mm) and is also greater than the width dimension of a film substrate at a gaseous deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the interspoke spacing.

    Abstract translation: 用于在气相气相沉积工艺期间支撑膜的盒包括具有第一和第二端板的中心轴。 每个端板上的肋形成能够接受胶片边缘的螺旋槽。 每个肋具有截面构造，其横截面形状具有大致线形的主边缘，预定的宽度尺寸和预定的平均厚度尺寸，以及至少2:1的宽度与厚度纵横比。 肋可以是基本上矩形的，在自由端具有任选的流动扰流板或基本上是楔形的。 端板之间的间隙间距至少为三百毫米（300毫米），并且也大于气相沉积温度下薄膜基片的宽度尺寸。 每个肋的宽度尺寸在间隙间距的约0.5％至约2.0％之间。

    FILM CASSETTE FOR GASEOUS VAPOR DEPOSITION
    3.
    发明申请
    FILM CASSETTE FOR GASEOUS VAPOR DEPOSITION 失效
    气体蒸发沉积胶片

    公开(公告)号：US20110048327A1

    公开(公告)日：2011-03-03

    申请号：US12550743

    申请日：2009-08-31

    Applicant: PETER FRANCIS CARCIA ,  Calixto Estrada ,  Richard Dale Kinard ,  Robert Scott McLean ,  Kirstin H. Shilkitus

    Inventor： PETER FRANCIS CARCIA ,  Calixto Estrada ,  Richard Dale Kinard ,  Robert Scott McLean ,  Kirstin H. Shilkitus

    IPC: C23C16/458

    CPC classification number: C23C16/458 ,  B33Y80/00 ,  B65H18/00 ,  B65H2301/51145 ,  B65H2801/87 ,  C23C16/45506 ,  C23C16/45544 ,  C23C16/45582 ,  C23C16/45591 ,  C23C16/545

    Abstract: A cassette for supporting a film during a gaseous vapor deposition process includes a central shaft having first and second end plates. A rib on each end plate forms a spiral groove able to accept an edge of a film. Each rib has a cross sectional configuration having substantially linear major edges, a predetermined width dimension and a predetermined average thickness dimension, and a width-to-thickness aspect ratio of at least 2:1. The rib could be substantially rectangular with an optional flow spoiler at the free end or substantially wedge-shaped. The interspoke spacing between end plates is at least three hundred millimeters (300 mm) and is also greater than the width dimension of a film substrate at a gaseous deposition temperature. The width dimension of each rib is between about 0.5% to about 2.0% of the interspoke spacing.

    Abstract translation: 用于在气相气相沉积工艺期间支撑膜的盒包括具有第一和第二端板的中心轴。 每个端板上的肋形成能够接受胶片边缘的螺旋槽。 每个肋具有截面构造，其横截面形状具有基本上线性的主边缘，预定的宽度尺寸和预定的平均厚度尺寸，以及至少为2:1的宽度与厚度纵横比。 肋可以是基本上矩形的，在自由端具有任选的流动扰流板或基本上是楔形的。 端板之间的间隙间距至少为三百毫米（300毫米），并且也大于气相沉积温度下薄膜基片的宽度尺寸。 每个肋的宽度尺寸在间隙间距的约0.5％至约2.0％之间。

    WEB BASED CHEMICAL BATH DEPOSITION APPARATUS
    6.
    发明申请
    WEB BASED CHEMICAL BATH DEPOSITION APPARATUS 审中-公开
    基于WEB的化学浴沉积装置

    公开(公告)号：US20160312348A1

    公开(公告)日：2016-10-27

    申请号：US15102574

    申请日：2014-12-19

    Applicant: NUVOSUN, INC.

    Inventor： Bruce HACHTMANN ,  Preston CLOVER ,  Dennis HOLLARS ,  Arthur C. WALL ,  Rocky TAYLOR ,  Gang Grant PENG

    IPC: C23C2/24

    CPC classification number: C23C2/24 ,  B65H20/06 ,  B65H2301/51214 ,  B65H2301/5162 ,  B65H2401/213 ,  B65H2404/20 ,  B65H2404/694 ,  B65H2515/71 ,  B65H2701/1121 ,  B65H2801/87 ,  C23C18/02 ,  C23C18/1204 ,  H01L31/0392 ,  H01L31/03923 ,  H01L31/206 ,  Y02E10/541 ,  Y02P70/521

    Abstract: Disclosed are methods and systems for processing a web. The web (402) has a first surface, a second surface opposite the first surface, and includes a magnetic material. An example system includes a processing bed (202) configured to support the web while the first surface of the web undergoes one or more processing steps. The system also includes magnets (300) positioned relative to the processing bed so as to exert a magnetic force on the web that pulls the center of the web (403) toward the processing bed. The system further includes a conveyor belt (404) configured to move the web over the processing bed (202). The conveyor belt has a first contact surface and a second contact surface opposite the first contact surface. The first contact surface is configured to contact the second surface of the web, and the second contact surface is configured to contact the processing bed.

    Abstract translation: 公开了用于处理网络的方法和系统。 网（402）具有第一表面，与第一表面相对的第二表面，并且包括磁性材料。 示例性系统包括被配置为在纤维网的第一表面经历一个或多个处理步骤时支撑幅材的处理床（202）。 该系统还包括相对于处理床定位的磁体（300），以便对卷筒纸（403）的中心向处理床施加磁力。 所述系统还包括被配置为将所述幅材移动到所述处理床（202）上的传送带（404）。 传送带具有与第一接触表面相对的第一接触表面和第二接触表面。 第一接触表面构造成接触幅材的第二表面，并且第二接触表面构造成接触处理床。

    HANDLING OF STACKED SUBSTRATES
    10.
    发明申请
    HANDLING OF STACKED SUBSTRATES 审中-公开

    公开(公告)号：US20180065820A1

    公开(公告)日：2018-03-08

    申请号：US15256357

    申请日：2016-09-02

    Applicant: SolarCity Corporation

    Inventor： Valeriy S. Litvak

    IPC: B65H3/48 ,  B65H1/18 ,  B65H3/08

    CPC classification number: B65H3/48 ,  B65H1/18 ,  B65H3/0816 ,  B65H2406/342 ,  B65H2801/87

    Abstract: A pneumatic device for transporting a substrate during a manufacturing operation is described. The pneumatic device can include multiple suction assemblies for securely coupling the substrate to the pneumatic device. The vertical position of the suction assemblies can be varied so that when vacuum is applied through the suction assemblies to the substrate, the substrate is in a bent configuration when secured to the pneumatic device. When the pneumatic device is used to lift the substrate off a stack of other substrates, the bending of the substrate reduces the surface area contact and likelihood of inadvertently removing additional substrates from the stack of substrates.

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