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公开(公告)号:US20180345638A1
公开(公告)日:2018-12-06
申请号:US15997926
申请日:2018-06-05
Applicant: Nanosys, Inc.
Inventor: Austin SMITH , Martin DEVENNEY , David OLMEIJER
CPC classification number: C09K11/08 , B82Y30/00 , C09K11/025
Abstract: The present invention provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise a population of nanostructures, a stabilization additive, and an organic resin. The present invention also provides nanostructure films comprising a nanostructure layer and methods of making nanostructure films.
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公开(公告)号:US20200347254A1
公开(公告)日:2020-11-05
申请号:US16758626
申请日:2018-10-24
Applicant: Nanosys, Inc.
Inventor: Ravisubhash TANGIRALA , Austin SMITH , Charles HOTZ
IPC: C09D11/50 , C09K11/02 , C09K11/08 , C09K11/70 , C09K11/88 , C09D11/033 , C09D11/037 , C09D11/102
Abstract: The present invention provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise a population of nanostructures comprising polyfunctional poly(alkylene oxide) ligands. The present invention also provides nanostructure films comprising the nanostructure compositions and methods of making nanostructure films using the nanostructure compositions.
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公开(公告)号:US20180370800A1
公开(公告)日:2018-12-27
申请号:US16015582
申请日:2018-06-22
Applicant: Nanosys, Inc.
Inventor: Austin SMITH , David OLMEIJER , Jared LYNCH , Minghu TU , Charles HOTZ
IPC: C01B25/08 , C01B19/04 , G02F1/015 , H01L33/06 , H01L51/50 , C08L63/00 , C08L81/02 , C08L75/04 , C08K5/3432
Abstract: The present disclosure provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise at least one population of nanostructures, at least one reactive diluent, at least one anaerobic stabilizer, and optionally at least one organic resin. The present disclosure also provides nanostructure films comprising a nanostructure layer and methods of making nanostructure films.
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公开(公告)号:US20240301278A1
公开(公告)日:2024-09-12
申请号:US18657548
申请日:2024-05-07
Applicant: Nanosys, Inc.
Inventor: David OLMEIJER , Ravisubhash TANGIRALA , Austin SMITH
IPC: C09K11/02 , B82Y20/00 , B82Y40/00 , C07C319/18 , C07C323/22 , C09K11/56 , C09K11/74 , C09K11/88
CPC classification number: C09K11/025 , C07C319/18 , C09K11/565 , C09K11/7492 , C09K11/883 , B82Y20/00 , B82Y40/00 , C07C323/22
Abstract: The present invention provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise a population of nanostructures comprising polythiol ligands with pendant moieties. The polythiol ligand with pendant moieties increase the solubility of the nanostructures in solvents and resins. The present invention also provides nanostructure films comprising the nanostructure compositions and methods of making nanostructure films using the nanostructure compositions.
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公开(公告)号:US20180327661A1
公开(公告)日:2018-11-15
申请号:US15975811
申请日:2018-05-10
Applicant: NANOSYS, INC.
Inventor: David OLMEIJER , Anh DUONG , Austin SMITH , Kao SAECHAO
CPC classification number: C09K11/025 , C08L83/08 , C08L2203/20 , C08L2205/025 , C08L2205/03 , C08L2205/08 , C09K11/02
Abstract: The present invention provides quantum dot compositions and methods of producing quantum dot compositions. The quantum dot compositions comprise a population of quantum dots, a siloxane polymer, an emulsification additive, and an organic resin. The present invention also provides quantum dot films comprising a quantum dot layer and methods of making quantum dot films.
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公开(公告)号:US20220098475A1
公开(公告)日:2022-03-31
申请号:US17487148
申请日:2021-09-28
Applicant: Nanosys, Inc.
Inventor: David OLMEIJER , Ravisubhash TANGIRALA , Austin SMITH
IPC: C09K11/02 , C07C319/18
Abstract: The present invention provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise a population of nanostructures comprising polythiol ligands with pendant moieties. The polythiol ligand with pendant moieties increase the solubility of the nanostructures in solvents and resins. The present invention also provides nanostructure films comprising the nanostructure compositions and methods of making nanostructure films using the nanostructure compositions.
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公开(公告)号:US20210130170A1
公开(公告)日:2021-05-06
申请号:US17146791
申请日:2021-01-12
Applicant: Nanosys, Inc.
Inventor: Austin SMITH , David OLMEIJER , Jared LYNCH , Minghu TU , Charles HOTZ
IPC: C01B25/08 , G02F1/015 , H01L33/06 , H01L51/50 , C08L63/00 , C08L81/02 , C08L75/04 , C08K5/3432 , C01B19/04 , C09D7/20 , C09K11/02 , C09D7/61 , C08F2/38 , C09D5/00 , C09D7/40 , C08F2/50
Abstract: The present disclosure provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise at least one population of nanostructures, at least one reactive diluent, at least one anaerobic stabilizer, and optionally at least one organic resin. The present disclosure also provides nanostructure films comprising a nanostructure layer and methods of making nanostructure films.
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