专利检索 ap:("Nina Vladimirovna Dziomkina" OR "Nicolaas Ten Kate" OR "Sandra Van Der Graaf" OR "Henricus Jozef Castelijns") AND inv:"Sandra Van Der Graaf" 第 1 页

1.

发明授权
Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备，制造用于光刻设备的制品的方法和装置制造方法

公开(公告)号：US08891053B2

公开(公告)日：2014-11-18

申请号：US12555301

申请日：2009-09-08

申请人： Nina Vladimirovna Dziomkina , Nicolaas Ten Kate , Sandra Van Der Graaf , Henricus Jozef Castelijns

发明人： Nina Vladimirovna Dziomkina , Nicolaas Ten Kate , Sandra Van Der Graaf , Henricus Jozef Castelijns

IPC分类号： G03B27/52 , G03F7/20 , C23C16/455

CPC分类号： G03B27/52 , C23C16/45555 , G03F7/70341 , G03F7/70916 , G03F7/7095

摘要： A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.

摘要翻译： 公开了一种光刻设备，其中将特定涂层施加到特定表面。涂层由至少99wt％的以下至少一种制成：过渡金属氧化物; 不良金属氧化物，硫化物或硒化物; 具有式ATiOn的化合物，其中A是元素周期表第2族的元素; 或掺杂有周期表第3,5或7族金属的TiO 2，其中涂层小于或等于49nm厚。

2.

发明申请
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：流体处理结构，平面设备和设备制造方法

公开(公告)号：US20110194084A1

公开(公告)日：2011-08-11

申请号：US13022319

申请日：2011-02-07

申请人： Michel RIEPEN , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate

发明人： Michel RIEPEN , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被构造成包括浸没流体到所述流体处理结构外部的区域的空间的边界处连续地具有：提取器，其具有布置在第一行中的至少一个开口，在使用中指向基底和/或桌子; 以及在使用中面向基板和/或表的表面上的液体操纵器，以减少表面上的液滴的聚结机会。

3.

发明授权
Fluid handling structure, lithographic apparatus and device manufacturing method 有权

公开(公告)号：US09625828B2

公开(公告)日：2017-04-18

申请号：US13022319

申请日：2011-02-07

申请人： Michel Riepen , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate

发明人： Michel Riepen , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

4.

发明授权
Sensor, a table and lithographic apparatus 失效
标题翻译：传感器，桌子和光刻设备

公开(公告)号：US08395772B2

公开(公告)日：2013-03-12

申请号：US12818358

申请日：2010-06-18

申请人： Henricus Wilhelmus Maria Van Buel , Jeroen Thomas Broekhuijse , Vitaliy Prosyentsov , Sandra Van Der Graaf , Nina Vladimirovna Dziomkina

发明人： Henricus Wilhelmus Maria Van Buel , Jeroen Thomas Broekhuijse , Vitaliy Prosyentsov , Sandra Van Der Graaf , Nina Vladimirovna Dziomkina

IPC分类号： G01N21/00

CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70616

摘要： A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.

摘要翻译： 公开了一种用于浸没系统的传感器。传感器包括：感测装置，透明层和不透明图案层。感测装置被配置为感测辐射束的特性。透明层构造成允许辐射束通过其中。透明层覆盖感测装置。不透明图案层被配置为赋予辐射束图案。在图形层中是位于填充材料的开口。填充材料对辐射束是透明的，并且具有与透明层相似的折射率。

5.

发明申请
SENSOR, A TABLE AND LITHOGRAPHIC APPARATUS 失效
标题翻译：传感器，表和平面设备

公开(公告)号：US20100321695A1

公开(公告)日：2010-12-23

申请号：US12818358

申请日：2010-06-18

申请人： Henricus Wilhelmus Maria VAN BUEL , Jeroen Thomas Broekhuijse , Vitaliy Prosyentsov , Sandra Van Der Graaf , Nina Vladimirovna Dziomkina

发明人： Henricus Wilhelmus Maria VAN BUEL , Jeroen Thomas Broekhuijse , Vitaliy Prosyentsov , Sandra Van Der Graaf , Nina Vladimirovna Dziomkina

IPC分类号： G01N21/00

CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70616

摘要： A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.

摘要翻译： 公开了一种用于浸没系统的传感器。传感器包括：感测装置，透明层和不透明图案层。感测装置被配置为感测辐射束的特性。透明层构造成允许辐射束通过其中。透明层覆盖感测装置。不透明图案层被配置为赋予辐射束图案。在图形层中是位于填充材料的开口。填充材料对辐射束是透明的，并且具有与透明层相似的折射率。

6.

发明申请
Substrates and methods of using those substrates 审中-公开
标题翻译：底物和使用这些底物的方法

公开(公告)号：US20090014030A1

公开(公告)日：2009-01-15

申请号：US11822695

申请日：2007-07-09

申请人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi

发明人： Anthonius Martinus Cornelis Petrus De Jong , Igor Petrus Maria Bouchoms , Richard Joseph Bruls , Hans Jansen , Martinus Hendrikus Antonius Leenders , Peter Franciscus Wanten , Marcus Theodoor Wilhelmus Van Der Heijden , Jacques Cor Johan Van Der Donck , Frederik Johannes Van Den Bogaard , Jan Groenewold , Sandra Van Der Graaf , Carmen Julia Zoldesi

IPC分类号： B08B7/02 , B08B3/10

CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916

摘要： A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.

摘要翻译： 公开了一种从光刻中使用的设备中除去污染物的方法。该方法包括将基底装载到装置中，基底包括刚性支撑层和设置在刚性支撑层上的可变形层，使得基底的可变形层与待除去污染的装置的表面接触引入可变形层与设备表面之间的相对运动，从该表面去除污染物以从表面去除污染物以便去除，并除去脱落的污染物。还描述和要求保护本发明的其它方面。