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10 条记录 (耗时 0.025 秒)

    Cryopump
    1.
    发明授权
    Cryopump 失效
    冷冻者

    公开(公告)号：US5582017A

    公开(公告)日：1996-12-10

    申请号：US427827

    申请日：1995-04-26

    申请人： Nobuharu Noji ,  Junichi Hayakawa ,  Motoyasu Sato ,  Hiroshi Aono ,  Tetsuo Komai

    发明人： Nobuharu Noji ,  Junichi Hayakawa ,  Motoyasu Sato ,  Hiroshi Aono ,  Tetsuo Komai

    IPC分类号： F04B37/08 ,  F04B49/06 ,  B01D8/00

    CPC分类号： F04B37/08 ,  F04B37/085 ,  F04B49/065 ,  F04B2205/01 ,  F04B2205/10 ,  Y10S417/901

    摘要： A cryopump is provided with a detecting means for detecting an operation parameter at an elapsed operation time in a current operation cycle of the cryopump, a storing means for storing a value of another operation parameter in a past operation cycle of the cryopump as a management parameter, an arithmetic controlling means for calculating a succeeding rotational speed of the expander motor based on the current operational parameter and the management parameter stored in the storing means and outputting the same as a driving instruction signal, with which the succeeding rotational speed of the expander motor is controlled so as to maintain a temperature of a cryopanel or a pressure in a vacuum chamber to which the cryopump is attached at a predetermined value by using the operation parameter at the elapsed operation time in the current operation cycle of the cryopump detected by the detecting means and the operation parameter at the corresponding elapsed operation time in the past operation cycle of the cryopump stored in the storing means as the management parameter, and an expander motor driving means for driving the expander motor according to the driving instruction signal output from the arithmetic controlling means, whereby the cryopump may be operated stably even if a temporal load change has occurred.

    摘要翻译： 低温泵设置有检测装置，用于在低温泵的当前运行循环中检测经过的运行时间的运转参数，存储装置，用于将低温泵的过去运转循环中的另一个运转参数值存储为管理参数 运算控制装置，用于根据当前操作参数和存储在存储装置中的管理参数来计算膨胀机马达的后续转速，并输出作为驱动指令信号的膨胀机马达的随后转速， 被控制为通过使用在检测到的低温泵的当前操作循环中经过的操作时间的操作参数来将冷冻板的温度或低温泵所附着的真空室中的压力保持在预定值 手段和操作参数在过去操作中相应的经过的操作时间 存储在存储装置中的低温泵的运转周期作为管理参数;以及扩展器电动机驱动装置，用于根据从算术控制装置输出的驱动指令信号来驱动膨胀机电动机，由此即使在时间 发生负载变化。

    PFC gas recovery process and apparatus
    2.
    发明授权
    PFC gas recovery process and apparatus 失效
    PFC气体回收过程和装置

    公开(公告)号：US06374635B1

    公开(公告)日：2002-04-23

    申请号：US09582659

    申请日：2000-08-17

    申请人： Junichi Hayakawa ,  Tetsuo Komai ,  Yoichi Mori

    发明人： Junichi Hayakawa ,  Tetsuo Komai ,  Yoichi Mori

    IPC分类号： F25J100

    CPC分类号： B01D53/74 ,  B01D53/002 ,  H01L21/3065 ,  Y02C20/30 ,  Y02P70/605

    摘要： The present invention aims to provide a process and an apparatus for recovering a PFC gas, which can readily bring cooling traps to a cryogenic temperature with a low-capacity refrigerator and can recover a high-purity PFC gas by applying deep freeze separation without the need for a multistage fractionator. To achieve this object, the present invention relates to an apparatus for recovering a PFC gas from a mixed gas containing the PFC gas discharged from a vacuum processing chamber (etching chamber), comprising a cooling trap connected to the exhaust system of the vacuum processing chamber and adapted to freeze and collect a mixed gas discharged from said vacuum processing chamber, a non-PFC gas removal system for removing gases other than the PFC gas from the regenerated mixed gas emitted by vaporization of said frozen and collected gas after the operation of said cooling trap is stopped, and a recovery means for recovering a high-concentration PFC gas freed of gases other than the PFC gas in said non-PFC gas removal system, as well as a process therefor.

    摘要翻译： 本发明的目的在于提供一种用于回收PFC气体的方法和装置，其可以容易地用低容量冰箱将冷凝阱带入低温温度，并且可以通过在不需要的情况下应用深度冷冻分离来回收高纯度PFC气体 用于多级分馏塔。 为了实现该目的，本发明涉及一种用于从包含从真空处理室（蚀刻室）排出的PFC气体的混合气体中回收PFC气体的装置，包括连接到真空处理室的排气系统的冷却阱 并且适于冷冻和收集从所述真空处理室排出的混合气体;非PFC气体去除系统，用于除去所述PFC气体之外的气体，从所述冷冻和收集气体的蒸发发出的再生混合气体中除去 停止冷却阱，以及用于在所述非PFC气体去除系统中回收除PFC气体以外的除了气体的高浓度PFC气体的回收装置及其工艺。

    Exhaust pipe having means for preventing deposition of a reaction by-product and method for preventing deposition of a reaction by-product
    4.
    发明授权
    Exhaust pipe having means for preventing deposition of a reaction by-product and method for preventing deposition of a reaction by-product 失效
    排气管具有防止反应副产物沉积的装置和用于防止反应副产物沉积的方法

    公开(公告)号：US07635501B2

    公开(公告)日：2009-12-22

    申请号：US10203804

    申请日：2001-02-14

    申请人： Tetsuo Komai ,  Norihiko Nomura

    发明人： Tetsuo Komai ,  Norihiko Nomura

    IPC分类号： C23C16/00

    CPC分类号： C23C16/4412

    摘要： An exhaust pipe (10) includes an inner cylinder (11) having an exhaust gas passage (10′) formed therein, an outer cylinder provided outside the inner cylinder with a gap (15) being formed therebetween and a heating device (13) attached to the inner cylinder 11. The gap (15) is communicated with the exhaust gas passage (10′). When a gas is discharged from the reaction vacuum chamber, a vacuum is created not only in the exhaust gas passage (10′) but also in the gap (15). Therefore, release of heat from the heating device to the outside can be suppressed. Consequently, the inner cylinder (11) can be efficiently heated to a sufficiently high temperature, thus preventing deposition and accumulation of a substance contained in the discharged gas on the inner surface of the inner cylinder (11). The deposition and accumulation of such a substance can also be prevented by forming a gas flow layer (18) of, for example, an inert gas, along the inner surface of the inner cylinder (11.

    摘要翻译： 排气管（10）具有形成有排气通路（10'）的内筒（11），设置在内筒外侧的外筒，在其间形成有间隙（15），以及安装有加热装置 间隙（15）与废气通道（10'）连通。 当气体从反应真空室排出时，不仅在排气通道（10'）中而且在间隙（15）中也产生真空。 因此，可以抑制从加热装置释放到外部的热量。 因此，能够将内筒（11）有效地加热到足够高的温度，从而防止包含在排出气体中的物质在内筒（11）的内表面上的堆积和堆积。 也可以通过沿内筒（11）的内表面形成例如惰性气体的气流层（18）来防止这种物质的沉积和堆积。

    Exhaust apparatus in ion implantation system
    5.
    发明授权
    Exhaust apparatus in ion implantation system 失效
    离子注入系统中的排气装置

    公开(公告)号：US5894131A

    公开(公告)日：1999-04-13

    申请号：US848356

    申请日：1997-02-07

    申请人： Akira Fukunaga ,  Tetsuo Komai

    发明人： Akira Fukunaga ,  Tetsuo Komai

    IPC分类号： H01J37/08 ,  C23C14/48 ,  C23C14/56 ,  H01J37/18 ,  H01J37/317

    CPC分类号： C23C14/48 ,  C23C14/564 ,  H01J37/18 ,  H01J2237/31701

    摘要： An exhaust apparatus in an ion implantation system for implanting impurities into a target substrate is used for evacuating an ion source chamber. The exhaust apparatus comprises at least one vacuum pump which does not use working oil for evacuating the ion source chamber, an atmospheric exhaust pipe connected to the vacuum pump for exhausting gas from the vacuum pump; and a device for introducing inert gas into at least one of the vacuum pump and the atmospheric exhaust pipe. The exhaust apparatus includes at least two vacuum pumps comprising a turbomolecular pump and a dry pump.

    摘要翻译： 离子注入系统中用于将杂质注入目标衬底中的排气装置用于抽真空离子源室。 排气装置包括至少一个不使用工作油排出离子源室的真空泵，连接到真空泵的大气排气管，用于从真空泵排出气体; 以及用于将惰性气体引入到真空泵和大气排气管中的至少一个中的装置。 排气装置包括至少两个包括涡轮分子泵和干式泵的真空泵。