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公开(公告)号：US5825463A
公开(公告)日：1998-10-20
申请号：US791545
申请日：1997-01-31
申请人： Shinichi Hara , Nobutoshi Mizusawa , Yuji Chiba
发明人： Shinichi Hara , Nobutoshi Mizusawa , Yuji Chiba
摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.
摘要翻译： 一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模 框架相对于X，Y和θ方向定位。 两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。 掩模在其底表面上的三个点处被支撑以在Z方向上定位。
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公开(公告)号：US5498501A
公开(公告)日：1996-03-12
申请号：US416503
申请日：1995-04-04
CPC分类号： G03F7/70066 , G03F7/2022 , G03F7/7045 , Y10S438/949
摘要： A method of manufacturing of semiconductor devices, includes exposing different portions of a semiconductor substrate with a first exposure apparatus having a first exposure range; placing and aligning the semiconductor substrate with respect to a second exposure range of a second exposure apparatus, which range is larger than the first exposure range of the first exposure apparatus; detecting an alignment error of each of the portions of the semiconductor substrate as covered by the second exposure range of the second exposure apparatus; calculating an overall alignment error of those portions of the semiconductor substrate with respect to the entire second exposure range of the second exposure apparatus, on the basis of the detected alignment errors; and controlling the exposure operation of the second exposure apparatus on the basis of the calculated overall alignment error.
摘要翻译： 一种半导体器件的制造方法，包括用具有第一曝光范围的第一曝光装置曝光半导体衬底的不同部分; 将半导体衬底相对于第二曝光装置的第二曝光范围放置和对准，该范围大于第一曝光装置的第一曝光范围; 检测由第二曝光装置的第二曝光范围所覆盖的半导体衬底的每个部分的对准误差; 基于检测到的对准误差，计算半导体衬底的这些部分相对于第二曝光装置的整个第二曝光范围的总体对准误差; 并根据计算的整体对准误差来控制第二曝光装置的曝光操作。
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公开(公告)号：US5356686A
公开(公告)日：1994-10-18
申请号：US182513
申请日：1994-01-14
申请人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
发明人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
CPC分类号： G03F1/22 , G03F7/70866 , Y10T428/21 , Y10T428/24612 , Y10T428/24851
摘要： An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.
摘要翻译： X射线掩模结构包括具有图案的掩模基板; 用于承载和支撑掩模基板的支撑框架; 以及用于将掩模基板固定到支撑框架的粘合材料; 其中在所述掩模基板和所述支撑框架中的至少一个中形成有应力释放槽。
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公开(公告)号：US5277539A
公开(公告)日：1994-01-11
申请号：US58791
申请日：1993-05-10
IPC分类号： G03F7/20 , H01L21/677 , H01L21/68 , B65G47/24
CPC分类号： G03F7/70691 , H01L21/67766 , H01L21/67778 , H01L21/68
摘要： A substrate conveying apparatus usable with a semiconductor manufacturing apparatus wherein a pattern of a mask is transferred onto a semiconductor wafer by exposing the semiconductor wafer to synchrotron orbital radiation or other exposure energy through a mask. The conveying apparatus transfers the semiconductor wafer to and from a wafer chuck while the surface thereof extends vertically, and/or transfers the wafer to and from a wafer cassette which contains a plurality of wafers horizontally. The apparatus includes a conveying hand having a gimbal mechanism for supporting the semiconductor wafer to assure the semiconductor wafer transfer to and from the wafer chuck while the wafer is vertical. When the semiconductor wafer is transferred to and from a wafer cassette, the apparatus is provided with a correcting mechanism for correcting the attitude of the conveying hand to prevent the semiconductor wafer from contacting the wafer cassette.
摘要翻译： 一种可用于半导体制造装置的基板输送装置，其中通过将半导体晶片暴露于同步加速器轨道辐射或通过掩模的其他曝光能量将掩模的图案转印到半导体晶片上。 输送装置将晶片卡盘的表面向垂直方向延伸和/或从晶片卡盘传送半导体晶片，和/或将晶片从包含多个晶片的晶片盒水平地传送到晶片盒。 该装置包括具有用于支撑半导体晶片的万向架机构的传送手，以确保半导体晶片在晶片垂直时传送到晶片卡盘。 当将半导体晶片转移到晶片盒或从晶片盒转移时，该装置设置有校正机构，用于校正传送手的姿态以防止半导体晶片接触晶片盒。
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公开(公告)号：US5552812A
公开(公告)日：1996-09-03
申请号：US465933
申请日：1995-06-06
申请人： Ryuichi Ebinuma , Nobutoshi Mizusawa , Yuji Chiba
发明人： Ryuichi Ebinuma , Nobutoshi Mizusawa , Yuji Chiba
CPC分类号： B41J2/17523 , B41J11/14 , B41J2/1652 , B41J2/16585 , B41J2/1714 , B41J2/17513 , B41J2/1752 , B41J29/02 , B41J29/377 , G03G21/1628 , G03G21/1647 , G03G21/206 , H04N1/00525 , H04N1/00543 , H04N1/00554 , H04N1/00976 , G03G2221/1645 , G03G2221/1651 , G03G2221/1672 , G03G2221/1687
摘要： A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head. The recording apparatus further having a blower which introduces air and directs an air stream through the apparatus and past a full page width recording head. The air stream directs ink mist generated by the printhead through a recording medium discharge port such that ink mist is removed from the apparatus body by riding the air stream or by adhering to the recording medium. Internal contamination of the recording apparatus is avoided.
摘要翻译： 记录装置具有上部单元，该上部单元具有用于排出墨水的记录头，用于响应于信息在记录介质上进行记录，并且该装置的电路的至少一部分具有用于保持 通过记录头在记录站中记录介质，下部单元能够相对于上部单元间隔开;以及传送构件，用于将记录介质传送到记录站。 上部单元和下部单元能够通过记录头在记录站中间隔开并打开。 该记录装置还具有引入空气并引导空气流通过设备并经过全页宽度记录头的鼓风机。 空气流通过记录介质排出口引导由打印头产生的墨雾，从而通过乘坐空气流或通过粘附到记录介质将墨雾从设备主体移除。 避免了记录装置的内部污染。
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公开(公告)号：US5390227A
公开(公告)日：1995-02-14
申请号：US062151
申请日：1993-05-17
CPC分类号： G03F7/70066 , G03F7/702 , G03F7/70858 , G03F7/70875
摘要： An exposure apparatus for exposing a semiconductor wafer to a semiconductor device pattern formed in a mask. The exposure energy is, for example, X-rays contains in synchrotron orbit radiation. A blade for limiting the area irradiated with the exposure energy on a mask or wafer is integrally movable in an alignment detecting unit for detecting the alignment mark. Four of such blades are provided to provide a square exposure area. The blades are movable independently by the associated alignment detecting units. Each of the blades is finely movable relative to the associated alignment detecting unit. The shape or size or the like of the blade is determined in consideration of the position of the blade in the direction of the exposure energy irradiation, and the maximum and minimum exposure view angle. The blade is cooled. The exposure area can be changed highly accurately and efficiently with a simple structure.
摘要翻译： 一种用于将半导体晶片暴露于形成在掩模中的半导体器件图案的曝光装置。 曝光能量例如是X射线含有同步加速器轨道辐射。 用于将在曝光能量上照射的面积限制在掩模或晶片上的刀片可在用于检测对准标记的对准检测单元中一体地移动。 提供四个这样的刀片以提供方形曝光区域。 叶片可通过相关联的对准检测单元独立地移动。 每个叶片相对于相关联的对准检测单元精细地移动。 考虑到叶片在曝光能量照射方向上的位置以及最大和最小曝光视角来确定叶片的形状或尺寸等。 刀片冷却。 曝光区域可以用简单的结构高精度高效地进行改变。
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公开(公告)号：US5377251A
公开(公告)日：1994-12-27
申请号：US203498
申请日：1994-02-28
申请人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shumichi Uzawa
发明人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shumichi Uzawa
CPC分类号： G03F7/70008 , G03F7/702
摘要： An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.
摘要翻译： 一种用于制造半导体器件的曝光方法，包括移动具有边缘的快门，使得边缘与预定曝光区域相关; 将曝光光束投影到所述光闸的边缘和所述曝光区域的至少一部分; 确定由曝光光束形成的快门的边缘相对于与可移动卡盘移动有关的预定坐标系的位置; 根据确定调整快门; 将基板放置在卡盘上; 移动卡盘使得基板与曝光区域相关; 以及通过所述快门控制所述基板与曝光光束的曝光。
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公开(公告)号：US5317615A
公开(公告)日：1994-05-31
申请号：US987554
申请日：1992-12-08
申请人： Ryuichi Ebinuma , Nobutoshi Mizusawa , Takao Kariya , Shigeyuki Suda , Shunichi Uzawa , Takayuki Hasegawa
发明人： Ryuichi Ebinuma , Nobutoshi Mizusawa , Takao Kariya , Shigeyuki Suda , Shunichi Uzawa , Takayuki Hasegawa
CPC分类号： G03F7/70066 , G03F7/70858 , G03F7/70891 , G03F9/70
摘要： An exposure apparatus and method for exposing a workpiece to a pattern of an original with radiation includes a masking device having movable blades for variably defining an aperture to selectively block and transmit the radiation to define on the workpiece a desired exposure zone corresponding to the aperture, the masking device having a window, and a detector for detecting the positional deviation between the original and the workpiece by using light passing through the window of the masking device.
摘要翻译： 一种用于将工件暴露于具有辐射的原稿图案的曝光装置和方法包括：具有可动刀片的掩模装置，用于可变地限定孔径以选择性地阻挡和透射辐射，以在工件上限定对应于孔的期望曝光区域， 具有窗口的掩蔽装置和用于通过使用穿过掩蔽装置的窗口的光检测原件和工件之间的位置偏差的检测器。
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公开(公告)号：US5168512A
公开(公告)日：1992-12-01
申请号：US668238
申请日：1991-03-12
IPC分类号： G03F7/20 , G21K1/02 , H01L21/027
CPC分类号： G03F7/702 , G03F7/2039 , G03F7/70691 , G03F7/70808 , G21K1/025 , H01L21/0278
摘要： A method for the manufacture of semiconductor devices wherein a radiation beam including first and second beams is projected from a synchrotron orbit radiation source into an ambience maintained substantially at a vacuum, includes the steps of directing the radiation beam to a wafer through a window effective to isolate the ambience to thereby print a circuit pattern on an X-ray sensitive layer on the wafer with the first beam, providing a support for supporting the window having an opening, extracting the second beam through the opening, and detecting and correcting any deviation of the first beam with respect to the wafer.
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10.发明授权Ink-jet recording apparatus with mechanism for automatically regulating a recording head 失效具有用于自动调节记录头的机构的喷墨记录装置
公开(公告)号：US5140429A
公开(公告)日：1992-08-18
申请号：US746085
申请日：1991-08-12
申请人： Ryuichi Ebinuma , Yuji Chiba , Nobutoshi Mizusawa
发明人： Ryuichi Ebinuma , Yuji Chiba , Nobutoshi Mizusawa
CPC分类号： B41J2/19 , B41J2/16579 , B41J2202/12
摘要： An ink jet apparatus in which a recorded image is read to provide an image reference signal for comparison with an image recording signal, the resulting comparison being used as a basis for diagnosing an ink ejection state of a recording head nozzle in order to determine and implement an ink ejection recovery process.
摘要翻译： 一种喷墨装置，其中读取记录图像以提供用于与图像记录信号进行比较的图像参考信号，所得到的比较用作诊断记录头喷嘴的喷墨状态的基础，以便确定和实现 喷墨恢复过程。
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