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    DENTAL MATERIALS BASED ON MONOMERS HAVING DEBONDING-ON-DEMAND PROPERTIES
    2.
    发明申请
    DENTAL MATERIALS BASED ON MONOMERS HAVING DEBONDING-ON-DEMAND PROPERTIES 有权

    公开(公告)号：US20140329929A1

    公开(公告)日：2014-11-06

    申请号：US14343297

    申请日：2012-09-10

    申请人： Norbert Moszner ,  Iris Lamparth ,  Thorsten Bock ,  Urs Karl Fischer ,  Ulrich Salz ,  Volker Rheinberger ,  Robert Liska

    发明人： Norbert Moszner ,  Iris Lamparth ,  Thorsten Bock ,  Urs Karl Fischer ,  Ulrich Salz ,  Volker Rheinberger ,  Robert Liska

    IPC分类号： A61K6/083

    CPC分类号： A61K6/0835 ,  A61K6/0002 ,  A61K6/0023 ,  A61K6/083 ,  C07D239/47 ,  C07F3/06 ,  C08F122/22 ,  C08L33/00

    摘要： The invention relates to a dental restorative material which comprises a thermolabile or photolabile polymerizable compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]1  Formula I, in which T represents a thermolabile or photolabile group, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, wherein at least one Z1 or Z2 is a polymerizable group, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical and k, l, m and n in each case independently are 1, 2 or 3.

    Dental materials with improved hydrolysis stability based on phthalic acid monomers
    3.
    发明授权
    Dental materials with improved hydrolysis stability based on phthalic acid monomers 有权
    具有改善的基于邻苯二甲酸单体的水解稳定性的牙科材料

    公开(公告)号：US09393181B2

    公开(公告)日：2016-07-19

    申请号：US13630491

    申请日：2012-09-28

    申请人： Thorsten Bock ,  Urs Karl Fischer ,  Iris Lamparth ,  Norbert Moszner ,  Volker Rheinberger

    发明人： Thorsten Bock ,  Urs Karl Fischer ,  Iris Lamparth ,  Norbert Moszner ,  Volker Rheinberger

    IPC分类号： A61K6/00 ,  A61K6/083 ,  C08F2/50

    CPC分类号： A61K6/0023 ,  A61K6/083 ,  C08L33/24

    摘要： Dental material which contains a polymerizable phthalic acid derivative of the general Formula I: with R1=H, methyl or a C1-C5 alkyl residue; R2=H, a phenyl, benzyl or C1-C8 alkyl residue; Q1=is absent or is a C1-C15 alkylene residue, wherein the carbon chain can be interrupted by O or S; Q2=is absent or a (n+1)-valent aliphatic C1-C20 residue, wherein the carbon chain can be interrupted by O or S and wherein Q1 and Q2 cannot be absent simultaneously; X=is absent, is O, S or (—CO—NR4—)—, wherein R4 is H, CH3 or C2H5; Y=is absent, is O, S or (—CO—NR5—)—, wherein R5 is H, CH3 or C2H5; n, m=independently of one another in each case mean 1, 2 or 3; R3=H, CH3, C2H5, Cl, Br or OCH3, and wherein the two carboxyl groups of the benzene ring can together form an anhydride group.

    摘要翻译： 含有通式I的可聚合邻苯二甲酸衍生物的牙科材料：其中R1 = H，甲基或C1-C5烷基残基; R2 = H，苯基，苄基或C1-C8烷基残基; Q1 =不存在或是C1-C15亚烷基残基，其中碳链可被O或S间隔; Q2 =不存在或（n + 1）价的脂族C1-C20残基，其中碳链可以被O或S中断，并且其中Q1和Q2不能同时存在; X =不存在，为O，S或（-CO-NR 4 - ） - ，其中R 4为H，CH 3或C 2 H 5; Y =不存在，是O，S或（-CO-NR 5 - ） - ，其中R 5是H，CH 3或C 2 H 5; 在每种情况下，n，m =彼此独立，意指1,2或3; R3 = H，CH3，C2H5，Cl，Br或OCH3，其中苯环的两个羧基可以一起形成酸酐基团。

    Dental restorative material based on an antimicrobially active compound
    6.
    发明授权
    Dental restorative material based on an antimicrobially active compound 有权
    基于抗微生物活性化合物的牙齿修复材料

    公开(公告)号：US09339443B2

    公开(公告)日：2016-05-17

    申请号：US13368998

    申请日：2012-02-08

    申请人： Ulrich Salz ,  Thorsten Bock ,  Christoph Peter Fik ,  Jörg Tiller ,  Volker Rheinberger

    发明人： Ulrich Salz ,  Thorsten Bock ,  Christoph Peter Fik ,  Jörg Tiller ,  Volker Rheinberger

    IPC分类号： A61K6/083 ,  A61K6/00 ,  A61K6/093

    CPC分类号： A61K6/0023 ,  A61K6/0008 ,  A61K6/0017 ,  A61K6/0067 ,  A61K6/083 ,  A61K6/093

    摘要： The invention relates to a dental restorative material which comprises (a) at least one antimicrobially active compound of Formula (I) [AG]m-R1—Z—SP—Y—R2—[WG]p  (I), or a filler that is surface-modified with at least one compound of Formula (I), (b) at least one radically polymerizable monomer and (c) at least one initiator for the radical polymerization. The invention also relates to a use of such dental restorative material for the preparation of an adhesive, primer, cement, coating material or filling material. The invention also relates to a dental material which comprises at least one compound of Formula (I), as well as a use of a compound of Formula (I) for modifying the surface of a substrate selected from ceramic materials, noble and non-noble metals, hard tooth structure, tooth enamel, dentine, collagen, soft tissue, mucous membrane and leather.

    摘要翻译： 本发明涉及一种牙科修复材料，其包含（a）至少一种式（I）[AG] m-R1-Z-SP-Y-R2- [WG] p（I）的抗微生物活性化合物或填充剂 其用至少一种式（I）的化合物，（b）至少一种可自由基聚合的单体和（c）至少一种用于自由基聚合的引发剂进行表面改性。 本发明还涉及这种牙科修复材料用于制备粘合剂，底漆，水泥，涂料或填充材料的用途。 本发明还涉及包含至少一种式（I）化合物的牙科材料，以及式（I）化合物用于改性选自陶瓷材料，贵金属和非贵金属的基材表面的用途的牙科材料 金属，硬齿结构，牙釉质，牙质，胶原，软组织，粘膜和皮革。

    Oligomeric and polymeric aromatic phosphonic acids, their blends, processes for preparing them and uses as polyelectrolytes
    8.
    发明授权
    Oligomeric and polymeric aromatic phosphonic acids, their blends, processes for preparing them and uses as polyelectrolytes 失效
    低聚和聚合芳族膦酸，它们的共混物，其制备方法和用作聚电解质

    公开(公告)号：US08609789B2

    公开(公告)日：2013-12-17

    申请号：US12279794

    申请日：2007-02-12

    申请人： Helmut Moehwald ,  Thorsten Bock ,  Rolf Muelhaupt

    发明人： Helmut Moehwald ,  Thorsten Bock ,  Rolf Muelhaupt

    IPC分类号： C08F32/00 ,  C08F32/04 ,  C08F132/04

    CPC分类号： H01M8/1041 ,  B01D67/0009 ,  B01D67/0011 ,  B01D71/82 ,  B01D2325/04 ,  B01D2325/14 ,  C08G65/48 ,  C08G75/23 ,  C08J5/2256 ,  C08L65/00 ,  C08L71/126 ,  C08L81/06 ,  H01M8/0289 ,  H01M8/1023 ,  H01M8/1025 ,  H01M8/1027 ,  H01M8/103 ,  H01M8/1032 ,  H01M8/1039 ,  C08L2666/02

    摘要： The present invention relates to halogen-free, oligomeric or polymeric phosphonic acids made up of units of the general formula (I) —[(O)m—{R1(X)n(Y)o}pR1(X)q]r—[(O)s—R5(X)t]v—  (I), where: Xis —P═O(OH)2, Yis carbonyl or sulfonyl, R1, R5are, independently of one another, divalent or polyvalent, substituted or unsubstituted, heteroatom-free or heteroatom- comprising aromatic radicals, m, o, sare each, independently of one another, 0 or 1, n, q, tare each, independently of one another, 0 or an integer from 1 to 8, with n and s not simultaneously being 0, r, vare each, independently of one another, from 0 to 1, with the sum of r and v being from 0.95 to 1.05, and pis 0 or an integer ≧1, where the radicals X are substituents on R1 and R5 and the radicals Y are parts of polymer or oligomer chain, to a process for preparing these compounds and also to halogen-free mixtures comprising one or more compounds of the general formula (I) and a nitrogen-free solvent having a boiling point of >150° C.

    摘要翻译： 本发明涉及由通式（I） - [（O）m - {R 1（X）n（Y）o} p R 1（X）q] r的单元组成的无卤素，低聚或聚合膦酸 - [（O）s-R5（X）t] v-（I），其中：X是-P = O（OH）2，Y是羰基或磺酰基，R1，R5彼此独立地是二价或 多价，取代或未取代的，无杂原子的或含杂原子的芳基，m，o，s各自独立地为0或1，n，q，t各自彼此独立地为0或整数 1至8，其中n和s不同时为0，r，v各自彼此独立地为0至1，r和v之和为0.95至1.05，p为0或整数 > = 1，其中基团X是R 1和R 5上的取代基，基团Y是聚合物或低聚物链的部分，用于制备这些化合物的方法以及含卤素的混合物，其包含一种或多种通式（ I）和沸点为的无氮溶剂 > 150°C

    OLIGOMERIC AND POLYMERIC SILOXANES SUBSTITUTED BY ARYLPHOSPHONIC ACIDS
    9.
    发明申请
    OLIGOMERIC AND POLYMERIC SILOXANES SUBSTITUTED BY ARYLPHOSPHONIC ACIDS 审中-公开
    由芳香族膦取代的低聚硅氧烷和聚硅氧烷

    公开(公告)号：US20090048395A1

    公开(公告)日：2009-02-19

    申请号：US12279656

    申请日：2007-02-13

    申请人： Helmut Mohwald ,  Thorsten Bock ,  Rolf Mulhaupt

    发明人： Helmut Mohwald ,  Thorsten Bock ,  Rolf Mulhaupt

    IPC分类号： C08G77/30 ,  C08L83/06

    CPC分类号： C07F9/6596 ,  C08G77/045 ,  C08G77/30 ,  C08G77/395

    摘要： The present invention relates to oligomeric or polymeric siloxanes comprising phosphonic acid groups, a process for preparing them, oligomeric or polymeric siloxanes comprising silyl phosphonate and/or alkyl phosphonate groups, blends comprising at least one oligomeric or polymeric siloxane according to the invention comprising polyphosphonic acid groups and/or at least one oligomeric or polymeric siloxane comprising silyl phosphonate and/or alkyl phosphonate groups and at least one further polymer, membranes, films or composites comprising at least one oligomeric or polymeric siloxane according to the invention comprising phosphonic acid groups and/or at least one oligomeric or polymeric siloxane according to the invention comprising silyl polyphosphonate and/or alkyl polyphosphonate groups or a blend according to the invention, and also various uses of oligomeric or polymeric siloxanes comprising phosphonic acid groups and/or oligomeric or polymeric siloxanes comprising silyl phosphonate and/or alkyl phosphonate groups or blends according to the invention.

    摘要翻译： 本发明涉及包含膦酸基团的低聚或聚合硅氧烷，其制备方法，包含膦酸甲硅烷基酯和/或烷基膦酸酯基团的低聚或聚合硅氧烷，包含至少一种根据本发明的低聚或聚合硅氧烷的共混物，其包含多膦酸 基团和/或至少一种包含甲硅烷基膦酸酯和/或烷基膦酸酯基团的低聚物或聚合物硅氧烷和至少一种包含至少一种根据本发明的低聚或聚合硅氧烷的聚合物，膜，膜或复合材料，其包含膦酸基团和/ 或根据本发明的至少一种包含聚膦酸酯甲硅烷基酯和/或烷基聚膦酸酯基团或根据本发明的共混物的低聚或聚合硅氧烷，以及包含膦酸基团和/或低聚或聚合硅氧烷的低聚或聚合硅氧烷的各种用途，其包含 甲硅烷基磷酸酯 酸和/或烷基膦酸酯基或本发明的共混物。