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152 条记录 (耗时 0.028 秒)

    Dental restorative material based on an antimicrobially active compound
    1.
    发明授权
    Dental restorative material based on an antimicrobially active compound 有权
    基于抗微生物活性化合物的牙齿修复材料

    公开(公告)号：US09339443B2

    公开(公告)日：2016-05-17

    申请号：US13368998

    申请日：2012-02-08

    申请人： Ulrich Salz ,  Thorsten Bock ,  Christoph Peter Fik ,  Jörg Tiller ,  Volker Rheinberger

    发明人： Ulrich Salz ,  Thorsten Bock ,  Christoph Peter Fik ,  Jörg Tiller ,  Volker Rheinberger

    IPC分类号： A61K6/083 ,  A61K6/00 ,  A61K6/093

    CPC分类号： A61K6/0023 ,  A61K6/0008 ,  A61K6/0017 ,  A61K6/0067 ,  A61K6/083 ,  A61K6/093

    摘要： The invention relates to a dental restorative material which comprises (a) at least one antimicrobially active compound of Formula (I) [AG]m-R1—Z—SP—Y—R2—[WG]p  (I), or a filler that is surface-modified with at least one compound of Formula (I), (b) at least one radically polymerizable monomer and (c) at least one initiator for the radical polymerization. The invention also relates to a use of such dental restorative material for the preparation of an adhesive, primer, cement, coating material or filling material. The invention also relates to a dental material which comprises at least one compound of Formula (I), as well as a use of a compound of Formula (I) for modifying the surface of a substrate selected from ceramic materials, noble and non-noble metals, hard tooth structure, tooth enamel, dentine, collagen, soft tissue, mucous membrane and leather.

    摘要翻译： 本发明涉及一种牙科修复材料，其包含（a）至少一种式（I）[AG] m-R1-Z-SP-Y-R2- [WG] p（I）的抗微生物活性化合物或填充剂 其用至少一种式（I）的化合物，（b）至少一种可自由基聚合的单体和（c）至少一种用于自由基聚合的引发剂进行表面改性。 本发明还涉及这种牙科修复材料用于制备粘合剂，底漆，水泥，涂料或填充材料的用途。 本发明还涉及包含至少一种式（I）化合物的牙科材料，以及式（I）化合物用于改性选自陶瓷材料，贵金属和非贵金属的基材表面的用途的牙科材料 金属，硬齿结构，牙釉质，牙质，胶原，软组织，粘膜和皮革。

    Dental materials based on radically polymerizable macromers with antimicrobial effect
    2.
    发明授权
    Dental materials based on radically polymerizable macromers with antimicrobial effect 有权
    基于可自由基聚合的大分子单体的牙科材料具有抗菌作用

    公开(公告)号：US07553881B2

    公开(公告)日：2009-06-30

    申请号：US11502420

    申请日：2006-08-11

    申请人： Ulrich Salz ,  Jörg Zimmermann ,  Dirk Poppe ,  Volker Rheinberger ,  Jörg Tiller ,  Christian Waschinski

    发明人： Ulrich Salz ,  Jörg Zimmermann ,  Dirk Poppe ,  Volker Rheinberger ,  Jörg Tiller ,  Christian Waschinski

    IPC分类号： A61K6/083 ,  C08F26/06

    CPC分类号： A61K6/0017 ,  A61K6/0023 ,  A61K6/083 ,  A61K6/09 ,  C08L33/00 ,  C08L75/16

    摘要： Dental material which contains at least one compound of the formula [PG]m—R1—Z—SP—Y—R2—[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR′, CONH CONR′, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof R2=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR′, CONH CONR′, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; PG=a radically polymerizable group; SP=a polymeric spacer which is selected from polyethylene glycol, polypropylene glycol, polyglycerol, polyalkyloxazoline, polyethyleneimine, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, polyvinyl acetate, poly-(2-hydroxyethyl)acrylate, poly-(2-hydroxyethyl)methacrylate groups, hydrophilic polypeptide groups and copolymers of the corresponding monomers; WG=antimicrobially active group; Z=is absent, O, S, an ester, amide or urethane group; Y=is absent, O, S, an ester, amide or urethane group, and which has a molecular weight of at least 1,000.

    摘要翻译： 含有至少一种式[PG] m -R1-Z-SP-Y-R2- [WG] p化合物的牙科材料，其中m = 1,2或3; p = 1,2或3; R 1 =不存在，可被O，S，NH，SiR'，CONH CONR'，COO和/或OCONH间隔一次或多次的直链或支链C1至C20亚烷基，取代或未取代的芳族C6至 C 14基团或其组合，R 2 =不存在，可被O，S，NH，SiR'，CONH CONR'，COO和/或OCONH间隔一次或多次的直链或支链C 1至C 20亚烷基， 或未取代的芳族C 6至C 14基团或其组合; PG =自由基聚合性基团; SP =选自聚乙二醇，聚丙二醇，聚甘油，聚烷基恶唑啉，聚乙烯亚胺，聚丙烯酸，聚甲基丙烯酸，聚乙烯醇，聚乙酸乙烯酯，聚（2-羟乙基）丙烯酸酯，聚（2-羟乙基）甲基丙烯酸酯 基团，亲水性多肽基团和相应单体的共聚物; WG =抗微生物活性组; Z =不存在，O，S，酯，酰胺或氨基甲酸酯基; Y =不存在，O，S，酯，酰胺或氨基甲酸酯基，其分子量至少为1,000。

    DENTAL MATERIALS BASED ON MONOMERS HAVING DEBONDING-ON-DEMAND PROPERTIES
    5.
    发明申请
    DENTAL MATERIALS BASED ON MONOMERS HAVING DEBONDING-ON-DEMAND PROPERTIES 有权

    公开(公告)号：US20140329929A1

    公开(公告)日：2014-11-06

    申请号：US14343297

    申请日：2012-09-10

    申请人： Norbert Moszner ,  Iris Lamparth ,  Thorsten Bock ,  Urs Karl Fischer ,  Ulrich Salz ,  Volker Rheinberger ,  Robert Liska

    发明人： Norbert Moszner ,  Iris Lamparth ,  Thorsten Bock ,  Urs Karl Fischer ,  Ulrich Salz ,  Volker Rheinberger ,  Robert Liska

    IPC分类号： A61K6/083

    CPC分类号： A61K6/0835 ,  A61K6/0002 ,  A61K6/0023 ,  A61K6/083 ,  C07D239/47 ,  C07F3/06 ,  C08F122/22 ,  C08L33/00

    摘要： The invention relates to a dental restorative material which comprises a thermolabile or photolabile polymerizable compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]1  Formula I, in which T represents a thermolabile or photolabile group, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, wherein at least one Z1 or Z2 is a polymerizable group, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical and k, l, m and n in each case independently are 1, 2 or 3.

    Photopolymerizable dental materials with bisacylphosphine oxides as initiators
    8.
    发明申请
    Photopolymerizable dental materials with bisacylphosphine oxides as initiators 有权
    具有双酰基氧化膦作为引发剂的光聚合牙科材料

    公开(公告)号：US20070027229A1

    公开(公告)日：2007-02-01

    申请号：US11385058

    申请日：2006-03-21

    申请人： Norbert Moszner ,  Volker Rheinberger ,  Ulrich Salz ,  Heinrich Gruber ,  Robert Liska ,  Beate Ganster ,  Gerald Ullrich

    发明人： Norbert Moszner ,  Volker Rheinberger ,  Ulrich Salz ,  Heinrich Gruber ,  Robert Liska ,  Beate Ganster ,  Gerald Ullrich

    IPC分类号： A61K6/10

    CPC分类号： A61K6/083 ,  A61K6/0023 ,  C08L33/00

    摘要： Polymerizable dental material which contains at least one radically-polymerizable monomer and at least one bisacylphosphine oxide of the Formula I, in which R1 is a linear or branched C2 to C14 alkyl residue, which can be interrupted by one or more O atoms, PG-Y-R2-X- or a substituted or unsubstituted, aromatic C6 to C14 radical; R2 is absent or a linear or branched C1 to C20 alkylene radical, which can be interrupted by one or more O atoms; R3 is H, a linear or branched C1 to C6 alkyl residue or PG-Y-R2-X-; R4 is a linear or branched C1-C6 alkyl or —O—C1-C6 alkyl residue; R5 is H or PG-Y-R2-X-; R6 is H or PG-Y-R2-X-; PG is a polymerizable group; X is absent, O or S; Y is absent, O, S, an ester, amide or urethane group; the bisacylphosphine oxide having at least one PG-Y-R2-X group and X and/or Y being absent if R2 is absent.

    摘要翻译： 含有至少一种可自由基聚合的单体和至少一种式I的双酰基氧化膦的可聚合的牙科材料，其中R 1是直链或支链C 2〜C 可以被一个或多个O原子间隔的烷基残基，PG-YR 2 -X-或取代或未取代的芳族C 6 - SUB>至C 14 基团; R 2不存在或可以被一个或多个O原子中断的直链或支链C 1至C 20亚烷基; R 3是H，直链或支链C 1至C 6烷基或PG-YR 2 - X-; R 4是直链或支链C 1 -C 6烷基或-OC 1 -C 1 -C 6烷基， 6个烷基残基; R 5是H或PG-Y-R 2 -X-; R 6是H或PG-Y-R 2 -X-; PG是可聚合基团; X不存在，O或S; Y不存在，O，S，酯，酰胺或氨基甲酸酯基; 具有至少一个PG-Y-R 2 -X基团的双酰基氧化膦和如果R 2不存在X和/或Y不存在。

    Surface-modified fillers
    9.
    发明申请
    Surface-modified fillers 有权

    公开(公告)号：US20060247329A1

    公开(公告)日：2006-11-02

    申请号：US11292578

    申请日：2005-12-02

    申请人： Norbert Moszner ,  Simone Klapdohr ,  Ulrich Salz ,  Jorg Zimmermann ,  Volker Rheinberger

    发明人： Norbert Moszner ,  Simone Klapdohr ,  Ulrich Salz ,  Jorg Zimmermann ,  Volker Rheinberger

    IPC分类号： A61K6/08 ,  A61K6/083

    CPC分类号： A61K6/083 ,  A61K6/0017 ,  A61K6/0023 ,  A61K6/0073 ,  A61K6/093 ,  Y10T428/29 ,  C08L33/14 ,  C08L43/02 ,  C08L83/06

    摘要： Filler which is surface-modified with a compound of the formula [(PG)—R1—Z]n—SP—[Y—R2—(AG)]m, in which AG is —COOH, —P(═O)(OH)2, —O—P(═O)(OH)2, —SO2OH, —SiR3R4X, or a chelating group; R1 is a C1-C3 alkylene group or cyclopropylene group or is absent; R2 is a C1-C10 alkylene group or is absent; R3 is a C1-C8 alkyl group, chlorine or OR5; R4 is a C1-C8 alkyl group, phenyl, chlorine or OR5; R5 is a C1-C6 alkyl group; X is OR5 or chlorine; Y is O, S, CO—NH, O—CO—NH, NH—CO—NH or is absent, Y being absent if R2 is absent; Z is O, S, CO—NR6, O—CO—NH, NH—CO—NH or is absent, R6 being H or C1-C6 alkyl; PG is a radically polymerizable group of the formula in which R9 is H, C1-C3 alkyl, C1-C3 hydroxyalkyl or COOR10; R10 is H, C1-C10 alkyl, 1,6-dimethylphenyl or mesityl; R11 is H or phenyl; m is 1 or 2; n is 1, 2, 3 or 4; SP is absent or is an (n+m)-valent linear or branched aliphatic C1-C30 radical, in which the carbon chain can be interrupted by O, S, CO—NH, O—CO—NH or NH—CO—NH, an (n+m)-valent aromatic C6-C18 radical, an (n+m)-valent cycloaliphatic C3-C18 radical or an (n+m)-valent heterocyclic C3-C18 radical, where the radicals can be substituted or unsubstituted; in which, if AG is a silyl radical of the formula —SiR3R4X and PG is a vinyl group of the formula H2C═CH—, R1 and Z are not absent simultaneously.