公开(公告)号：US5498619A

公开(公告)日：1996-03-12

申请号：US243235

申请日：1994-05-16

申请人： Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideshi Shimizu ,  Akira Mizuchi

发明人： Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideshi Shimizu ,  Akira Mizuchi

IPC分类号： C07D261/08 ,  C07D261/10 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06 ,  A61K31/435 ,  C07D213/34

CPC分类号： C07D261/10 ,  C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06

摘要： Aminoketone derivative compounds containing a heterocyclic ring bonded to an aminoketone moiety and useful as effective ingredients of centrally acting muscle relaxants and pollakiurea curing agents.(+)3-phenyl-5-[2-(1-pyrrolidinylmethyl)butyryl]isoxazole, which has a more remarkable central muscle relaxant action as compared with its racemic modification, can be effectively separated from the racemic modification using optically active 10-camphorsulfonic acid as the agent for the optical resolution.

摘要翻译： 含有与氨基酮部分结合的杂环的氨基酮衍生物化合物，可用作中枢作用的肌肉松弛剂和藜芦脲固化剂的有效成分。 （+）3-苯基-5- [2-（1-吡咯烷基甲基）丁酰基]异恶唑与其外消旋修饰相比具有更显着的中枢肌肉松弛作用，可以使用光学活性的10- 樟脑磺酸作为光学拆分剂。

公开(公告)号：US5602160A

公开(公告)日：1997-02-11

申请号：US423208

申请日：1995-04-17

申请人： Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideshi Shimizu ,  Akira Mizuchi

发明人： Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideshi Shimizu ,  Akira Mizuchi

IPC分类号： C07D261/08 ,  C07D261/10 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06 ,  A61K31/38 ,  A61K31/42 ,  A61K31/425

CPC分类号： C07D261/10 ,  C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06

摘要： Aminoketone derivative compounds containing a heterocyclic ring bonded to an aminoketone moiety and useful as effective ingredients of centrally acting muscle relaxants and pollakiurea curing agents.(+)3-phenyl-5-[2-(1-pyrrolidinylmethyl)butyryl] isoxazole, which has a more remarkable central muscle relaxant action as compared with its racemic modification, can be effectively separated from the racemic modification using optically active 10-camphorsulfonic acid as the agent for the optical resolution.

摘要翻译： 含有与氨基酮部分结合的杂环的氨基酮衍生物化合物，可用作中枢作用的肌肉松弛剂和藜芦素固化剂的有效成分。 （+）3-苯基-5- [2-（1-吡咯烷基甲基）丁酰基]异恶唑与其外消旋修饰相比具有更显着的中枢肌肉松弛作用，可以使用光学活性的10- 樟脑磺酸作为光学拆分剂。

公开(公告)号：US5338857A

公开(公告)日：1994-08-16

申请号：US839434

申请日：1992-02-24

申请人： Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Akira Mizuchi ,  Hideshi Shimizu

发明人： Norio Ohto ,  Kazutoshi Horikomi ,  Akira Matsubara ,  Hideki Tanada ,  Kazuya Sakai ,  Seitaro Kajiya ,  Akira Mizuchi ,  Hideshi Shimizu

IPC分类号： C07D261/08 ,  C07D261/10 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06 ,  A61K31/42

CPC分类号： C07D261/10 ,  C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04 ,  C07D413/04 ,  C07D413/06 ,  C07D417/06

摘要： Aminoketone derivative compounds containing a heterocyclic ring bonded to an aminoketone moiety and useful as effective ingredients of centrally acting muscle relaxants and pollakiurea curing agents.(+)3-phenyl-5-[2-(1-pyrrolidinylmethyl)butyryl]isoxazole, which has a more remarkable central muscle relaxant action as compared with its racemic modification, can be effectively separated from the racemic modification using optically active 10-camphorsulfonic acid as the agent for the optical resolution.

摘要翻译： 含有与氨基酮部分结合的杂环的氨基酮衍生物化合物，可用作中枢作用的肌肉松弛剂和藜芦脲固化剂的有效成分。 （+）3-苯基-5- [2-（1-吡咯烷基甲基）丁酰基]异恶唑与其外消旋修饰相比具有更显着的中枢肌肉松弛作用，可以使用光学活性的10- 樟脑磺酸作为光学拆分剂。

公开(公告)号：US5112841A

公开(公告)日：1992-05-12

申请号：US661981

申请日：1991-02-28

申请人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Akira Mizuchi ,  Kazutoshi Horikomi ,  Takuma Ohtsu

发明人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Akira Mizuchi ,  Kazutoshi Horikomi ,  Takuma Ohtsu

IPC分类号： A61K31/42 ,  A61K31/425 ,  A61P25/08 ,  C07D413/14 ,  C07D417/14

CPC分类号： C07D413/14 ,  C07D417/14

摘要： Described herein are imidazole derivatives having a specific structure and satisfactory as antiepileptics from the standpoint of the strength of action, prolonged action and side effects as well as their preparation processes.

公开(公告)号：US5194606A

公开(公告)日：1993-03-16

申请号：US734490

申请日：1991-07-23

申请人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

发明人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

IPC分类号： C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04

CPC分类号： C07D275/02 ,  C07D261/08 ,  C07D261/20 ,  C07D275/04

摘要： Novel aminoketones useful as central muscle relaxants and their preparation processes are disclosed. The disclosed processes are novel processes which do not use any heavy metal in view of the facts that their products are will be used as drugs and which require no complex purification step such as liberation of the aminoketones from their hydrochlorides or the like.

摘要翻译： 公开了用作中枢肌肉松弛剂的新型氨基酮及其制备方法。 所公开的方法是鉴于其产物将被用作药物并且不需要复杂的纯化步骤如氨基酮从其盐酸盐等中解离的事实，不使用任何重金属的新方法。

公开(公告)号：US5055585A

公开(公告)日：1991-10-08

申请号：US647633

申请日：1991-01-31

申请人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

发明人： Akira Matsubara ,  Kazuya Sakai ,  Hideki Tanada ,  Hironori Komatsu

IPC分类号： C07D261/08 ,  C07D261/20 ,  C07D275/02 ,  C07D275/04

CPC分类号： C07D275/02 ,  C07D261/08 ,  C07D261/20 ,  C07D275/04

摘要： Novel aminoketones useful as central muscle relaxants and their preparation processes are disclosed. The disclosed processes are novel processes which do not use any heavy metal in view of the facts that their products are will be used as drugs and which require no complex purification step such as liberation of the aminoketones from their hydrochlorides or the like.

公开(公告)号：US5969138A

公开(公告)日：1999-10-19

申请号：US961221

申请日：1997-10-30

申请人： Naruyoshi Mita ,  Hiroshi Nagase ,  Hajime Iizuka ,  Takahisa Oguchi ,  Kazuya Sakai ,  Kazutoshi Horikomi ,  Takaichi Miwa ,  Shinji Takahashi

发明人： Naruyoshi Mita ,  Hiroshi Nagase ,  Hajime Iizuka ,  Takahisa Oguchi ,  Kazuya Sakai ,  Kazutoshi Horikomi ,  Takaichi Miwa ,  Shinji Takahashi

IPC分类号： A61K31/496 ,  C07D207/26 ,  C07D207/27 ,  C07D241/02

CPC分类号： C07D207/27 ,  A61K31/496

摘要： Since a compound represented by general formula (1), its pharmaceutically acceptable salt and a hydrate of the pharmaceutically acceptable salt have high antipsychotic activity, they may be used as an active ingredient for preparation of an antipsychotic. ##STR1## Also provided are an optical resolution method of the above compound and an intermediate for preparation of the compound.

摘要翻译： 由于由通式（1）表示的化合物，其药学上可接受的盐和药学上可接受的盐的水合物具有高抗精神病活性，因此它们可以用作制备抗精神病药的活性成分。 还提供了上述化合物和制备该化合物的中间体的光学拆分方法。

公开(公告)号：US20130177841A1

公开(公告)日：2013-07-11

申请号：US13823206

申请日：2011-09-29

申请人： Kazuya Sakai ,  Masahiro Hashimoto ,  Takeyuki Yamada

发明人： Kazuya Sakai ,  Masahiro Hashimoto ,  Takeyuki Yamada

IPC分类号： G03F1/50

CPC分类号： G03F1/50 ,  G03F1/38

摘要： Provided is a mask blank that is improved in adhesion of a thin film for forming a transfer pattern to a resist, thus capable of suppressing the occurrence of collapse, chipping, or the like of a formed resist pattern. The mask blank has, on a transparent substrate 1, a thin film 2 which is for forming a transfer pattern and is made of a material containing a metal. The thin film 2 has a surface modified layer in the form of an oxide film containing a hydrocarbon. The surface modified layer of the thin film 2 can be formed by, for example, causing a highly concentrated ozone gas and an unsaturated hydrocarbon gas to act on the thin film.

摘要翻译： 提供了一种掩模坯料，其提高了用于将形成转印图案的薄膜粘合到抗蚀剂上，从而能够抑制所形成的抗蚀剂图案的崩溃，碎裂等的发生。 掩模坯料在透明基板1上具有用于形成转印图案并由含有金属的材料制成的薄膜2。 薄膜2具有含有烃的氧化膜形式的表面改性层。 薄膜2的表面改性层可以通过例如使高度浓缩的臭氧气体和不饱和烃气体作用于薄膜而形成。

公开(公告)号：US08221941B2

公开(公告)日：2012-07-17

申请号：US12647808

申请日：2009-12-28

申请人： Toshiyuki Suzuki ,  Masahiro Hashimoto ,  Kazunori Ono ,  Ryo Ohkubo ,  Kazuya Sakai

发明人： Toshiyuki Suzuki ,  Masahiro Hashimoto ,  Kazunori Ono ,  Ryo Ohkubo ,  Kazuya Sakai

IPC分类号： G03F1/22

CPC分类号： G03F1/32

摘要： A thin film made of a material containing a metal and silicon is formed on a light-transmissive substrate. Then, a treatment is performed to modify a main surface of the thin film in advance so that when exposure light having a wavelength of 200 nm or less is accumulatively irradiated on a thin film pattern of a photomask to be produced by patterning the thin film, the transfer characteristic of the thin film pattern does not change more than a predetermined degree. This treatment is performed by carrying out, for example, a heat treatment in an atmosphere containing oxygen at 450° C. to 900° C.

摘要翻译： 在透光性基板上形成由含有金属和硅的材料构成的薄膜。 然后，进行处理以预先修改薄膜的主表面，使得当将具有200nm或更小的波长的曝光光累积地照射到通过对薄膜进行图案化而制造的光掩模的薄膜图案上时， 薄膜图案的转印特性不会超过预定的程度。 该处理通过例如在450℃〜900℃的含氧气氛中进行热处理来进行。

公开(公告)号：US09091934B2

公开(公告)日：2015-07-28

申请号：US13995751

申请日：2011-12-22

申请人： Kazuya Sakai ,  Masahiro Hashimoto

发明人： Kazuya Sakai ,  Masahiro Hashimoto

IPC分类号： G03F1/50 ,  H01L21/3065 ,  G03F1/46 ,  H01L21/308 ,  H01L21/3213 ,  G03F1/82

CPC分类号： G03F1/50 ,  G03F1/46 ,  G03F1/82 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3213 ,  H01L21/32136

摘要： Provided is a method of manufacturing a mask blank that is improved in cleaning resistance to ozone cleaning or the like, thus capable of preventing degradation of the mask performance due to the cleaning. The method is for manufacturing a mask blank having, on a substrate, a thin film which is formed at its surface with an antireflection layer made of a material containing a transition metal, and carries out a treatment of causing a highly concentrated ozone gas with a concentration of 50 to 100 vol % to act on the antireflection layer to thereby form a surface modified layer comprising a strong oxide film containing an oxide of the transition metal at a surface of the antireflection layer.

摘要翻译： 提供了一种制造掩模坯料的方法，该掩模坯料具有改进的耐臭氧清洁等的清洁性能，因此能够防止由于清洁而引起的掩模性能的劣化。 该方法用于制造掩模坯料，其在基板上具有在其表面形成有由含有过渡金属的材料制成的抗反射层的薄膜，并进行使高浓度的臭氧气体与 浓度为50〜100体积％，从而形成表面改性层，该表面改性层包含在抗反射层的表面含有过渡金属的氧化物的强氧化物膜。