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    Process for the production of strongly adherent coatings
    1.
    发明授权
    Process for the production of strongly adherent coatings 有权
    生产强粘附涂层的方法

    公开(公告)号：US08414982B2

    公开(公告)日：2013-04-09

    申请号：US11792747

    申请日：2005-12-12

    申请人： Pascal Hayoz ,  Stephan Ilg

    发明人： Pascal Hayoz ,  Stephan Ilg

    IPC分类号： C08F4/00

    CPC分类号： C07D295/185 ,  B05D3/0446 ,  B05D3/06 ,  B05D3/067 ,  B05D3/08 ,  B05D3/14 ,  B05D3/144 ,  B05D7/04 ,  C07C51/412 ,  C07C69/738 ,  C07C225/22 ,  C07C235/80 ,  C07C323/62 ,  C07F9/54 ,  C08F2/50 ,  C07C59/06

    摘要： The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.

    摘要翻译： 本发明涉及一种用于在无机或有机基底上生产强粘附涂层的方法，其中在第一步骤中，a）使低温等离子体，电晕放电或火焰作用于无机或有机基底上， 在第二步中b）将一种或多种限定的光引发剂或含有至少一种烯键式不饱和基团的单体，或上述物质的溶液，悬浮液或乳液的限定的光引发剂或混合物，优选常压下施用于 无机或有机衬底，第三步骤c）使用合适的方法，将上述物质用电磁波干燥和/或照射，并且任选地在第四步骤d）中，将预处理施加到另外的涂层上。

    Sulphonium Salt Initiators
    2.
    发明申请
    Sulphonium Salt Initiators 有权
    锍盐引发剂

    公开(公告)号：US20090208872A1

    公开(公告)日：2009-08-20

    申请号：US11922444

    申请日：2006-06-21

    申请人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    发明人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C07D209/88 ,  C07C321/30

    CPC分类号： C07D209/88 ,  B33Y70/00 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/038 ,  Y10S430/122

    摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.

    摘要翻译： 式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C1-C20亚烷基或C2-C20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

    Sulphonium Salt Initiators
    3.
    发明申请
    Sulphonium Salt Initiators 有权
    锍盐引发剂

    公开(公告)号：US20090197987A1

    公开(公告)日：2009-08-06

    申请号：US12226116

    申请日：2007-04-04

    申请人： Pascal Hayoz ,  Stephan Ilg

    发明人： Pascal Hayoz ,  Stephan Ilg

    IPC分类号： C07C319/02 ,  C08F2/50

    CPC分类号： C09D11/101 ,  B33Y70/00 ,  C07C319/20 ,  C07C381/12 ,  C09D5/033 ,  C09D5/08 ,  G03F7/0045 ,  C07C323/22

    摘要： Compounds of the formula (I), L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L′3 and L′5 or L″3 and L″5 together denote a single bond, provided that the respective X, X′ or X″ is not a single bond; and/or L3 and L5, L′3 and L′5 or L″3 and L″5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L′1 and L′3, L′1 and L′, L′5 and L′7, L″1 and L″3, L″1 and L″, or L″5 and L″7, together denote an organic linking group; provided that at least one of L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 is other than hydrogen; X, X′ and X″ independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

    摘要翻译： 式（I），L，L'，L“，L1，L'1，L''1，L2，L'2，L''2，L3，L'3，L''3， L4，L'4，L''4，L5，L'5，L''5，L6，L'6，L''6，L7，L'7，L''7，L8，L'8和 彼此独立地是氢或有机取代基; 和/或成对L3和L5，L'3和L'5或L''3和L''5中的一个或多个一起表示单键，条件是各自的X，X'或X“不是 单一债券 和/或L3和L5，L'3和L'5或L''3和L''5一起表示有机连接基团; 和/或一对或多个L1和L3，L1和L，L5和L7，L'1和L'3，L'1和L'，L'5和L'7，L'1和L “3”，“1”和“L”，或“5”和“7”表示有机连接基团; 条件是L，L'，L“，L1，L'1，L''1，L2，L'2，L''2，L3，L'3，L'3， L'4，L''4，L 5，L'5，L''5，L 6，L'6，L''6，L 7，L'7，L''7，L8，L'8和L' '8不是氢; X，X'和X“彼此独立是单键，CRaRbO，S，NRc或NCORc; R a，R b和R c彼此独立地是氢或有机取代基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

    Sulphonium salt initiators
    8.
    发明授权
    Sulphonium salt initiators 有权
    锍盐引发剂

    公开(公告)号：US08067643B2

    公开(公告)日：2011-11-29

    申请号：US12226116

    申请日：2007-04-04

    申请人： Pascal Hayoz ,  Stephan Ilg

    发明人： Pascal Hayoz ,  Stephan Ilg

    IPC分类号： C07C381/00 ,  C08F2/50

    CPC分类号： C09D11/101 ,  B33Y70/00 ,  C07C319/20 ,  C07C381/12 ,  C09D5/033 ,  C09D5/08 ,  G03F7/0045 ,  C07C323/22

    摘要： Compounds of the formula (I), L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L′3 and L′5 or L″3 and L″5 together denote a single bond, provided that the respective X, X′ or X″ is not a single bond; and/or L3 and L5, L′3 and L′5 or L″3 and L″5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L′1 and L′3, L′1 and L′, L′5 and L′7, L″1 and L″3, L″1 and L″, or L″5 and L″7, together denote an organic linking group; provided that at least one of L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 is other than hydrogen; X, X′ and X″ independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

    摘要翻译： 式（I），L，L'，L“，L1，L'1，L”1，L2，L'2，L“2，L3，L'3，L”3，L4，L' 4，L“4，L5，L'5，L”5，L6，L'6，L“6，L7，L'7，L”7，L8，L'8和L“8彼此独立 氢或有机取代基; 和/或成对L3和L5，L'3和L'5或L“3和L”5中的一个或多个一起表示单键，条件是相应的X，X'或X“不是单键 ; 和/或L3和L5，L'3和L'5或L“3和L”5一起表示有机连接基团; 和/或一对或多对L1和L3，L1和L，L5和L7，L'1和L'3，L'1和L'，L'5和L'7，L“1和L” 3，L“1和L”或L“5和L”7一起表示有机连接基团; 只要L，L'，L“，L1，L'1，L”1，L2，L'2，L“2，L3，L'3，L”3，L4， L“4，L5，L'5，L”5，L6，L'6，L“6，L7，L'7，L”7，L8，L'8和L“8不同于氢; X，X'和X“彼此独立是单键，CRaRb O，S，NRc或NCORc; R a，R b和R c彼此独立地是氢或有机取代基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

    Sulphonium salt initiators
    10.
    发明授权
    Sulphonium salt initiators 有权
    锍盐引发剂

    公开(公告)号：US07901867B2

    公开(公告)日：2011-03-08

    申请号：US11922444

    申请日：2006-06-21

    申请人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    发明人： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C381/12

    CPC分类号： C07D209/88 ,  B33Y70/00 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/038 ,  Y10S430/122

    摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.

    摘要翻译： 式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。