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    Sulphonium Salt Initiators
    1.
    发明申请
    Sulphonium Salt Initiators 有权
    锍盐引发剂

    公开(公告)号：US20090208872A1

    公开(公告)日：2009-08-20

    申请号：US11922444

    申请日：2006-06-21

    Applicant: Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    Inventor： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    IPC: G03F7/20 ,  G03F7/004 ,  C07D209/88 ,  C07C321/30

    CPC classification number: C07D209/88 ,  B33Y70/00 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/038 ,  Y10S430/122

    Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.

    Abstract translation: 式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C1-C20亚烷基或C2-C20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

    Sulphonium salt initiators
    3.
    发明授权
    Sulphonium salt initiators 有权
    锍盐引发剂

    公开(公告)号：US07901867B2

    公开(公告)日：2011-03-08

    申请号：US11922444

    申请日：2006-06-21

    Applicant: Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    Inventor： Jean-Pierre Wolf ,  Attila Latika ,  Jean-Luc Birbaum ,  Stephan Ilg ,  Pascal Hayoz

    IPC: G03F7/004 ,  G03F7/30 ,  C07C381/12

    CPC classification number: C07D209/88 ,  B33Y70/00 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/038 ,  Y10S430/122

    Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.

    Abstract translation: 式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

    Heat-sensitive coating compositions based on resorcinyl triazine derivatives
    5.
    发明授权
    Heat-sensitive coating compositions based on resorcinyl triazine derivatives 有权
    基于间苯二酚三嗪衍生物的热敏涂料组合物

    公开(公告)号：US08865620B2

    公开(公告)日：2014-10-21

    申请号：US12529718

    申请日：2008-03-05

    Applicant: Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    Inventor： Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    IPC: B41M5/333 ,  C09D5/26 ,  C08K5/3492 ,  C09D7/00

    CPC classification number: B41M5/3335 ,  B41M5/3336 ,  C08K5/3492 ,  C09D5/26 ,  C09D7/41 ,  Y10T428/24802

    Abstract: The present invention provides heat-sensitive coating compositions, which comprise a color developer of formula (1) or mixtures thereof wherein R1 can be hydrogen, C1-20-alkyl, C3-8-cycloalkyl, C2-10-alkenyl, aryl or SO3H, and R2 and R3 can be the same or different and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8, SR9, SO3H or COOR10 and R4 and R5 can be the same or different, and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8 or SR9, R6, R7, R8, R9 and R10 can be the same or different and can be hydrogen, C1-30-alkyl, C3-8-cycloalkyl, C2-10-alkenyl or aryl, wherein C1-20-alkyl can be unsubstituted or substituted with one or more C3-8-cycloalkyl, C2-10-alkenyl, phenyl, halogen, OR11, NR12R13, SR14, SO3H or COOR15, and aryl can be unsubstituted or substituted with one or more halogen, C1-10-alkyl, halogenated C1-10-alkyl, C3-8-cycloalkyl C2-10-alkenyl, phenyl, OR11, NR12R13, SR14, SO3H or COOR15, wherein R11, R12, R13, R14 and R15 can be the same or different and can be hydrogen, C1-10-alkyl, C3-8-cycloalkyl or C2-10-alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain color developers.

    Abstract translation: 本发明提供热敏涂料组合物，其包含式（1）的显色剂或其混合物，其中R 1可以是氢，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基或SO 3 H ，R2和R3可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8，SR 9，SO 3 H或COOR 10和 R4和R5可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8或SR 9，R 6，R 7，R 8 ，R 9和R 10可以相同或不同，并且可以是氢，C 1-30 - 烷基，C 3-8 - 环烷基，C 2-10 - 烯基或芳基，其中C 1-20 - 烷基可以是未取代的或被一个或多个 C 3-8 - 环烷基，C 2-10 - 烯基，苯基，卤素，OR 11，NR 12 R 13，SR 14，SO 3 H或COOR 15，芳基可以是未被取代的或被一个或多个卤素取代，C 1-10烷基，卤代C 1-10 - 烷基，C 3-8 - 环烷基C2-10 - 烯基，苯基，OR11，NR12R13，SR14，SO3H或COOR15，其中 在R 11，R 12，R 13，R 14和R 15可以相同或不同，可以是氢，C 1-10 - 烷基，C 3-8 - 环烷基或C 2-10 - 烯基，一种制备这些组合物的方法， 涂覆这些组合物的基材，用这些组合物涂布的基材，使用这些组合物制备标记的基材的方法，通过后一方法获得的标记的底物和某些显色剂。

    HEAT-SENSITIVE COATING COMPOSITIONS BASED ON RESORCINYL TRIAZINE DERIVATIVES
    7.
    发明申请
    HEAT-SENSITIVE COATING COMPOSITIONS BASED ON RESORCINYL TRIAZINE DERIVATIVES 有权
    基于间苯二酚衍生物的热敏涂料组合物

    公开(公告)号：US20110311786A1

    公开(公告)日：2011-12-22

    申请号：US12529718

    申请日：2008-03-05

    Applicant: Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    Inventor： Allan Francis Cunningham ,  Thomas Ehlis ,  Jean-Luc Birbaum ,  Pascal Hayoz ,  Kamalesh Pai Fondekar

    IPC: B41M5/28 ,  C08K5/3492 ,  B05D3/06 ,  C09D129/04 ,  C09D109/08 ,  B05D3/02 ,  C07D251/24 ,  C09D133/08

    CPC classification number: B41M5/3335 ,  B41M5/3336 ,  C08K5/3492 ,  C09D5/26 ,  C09D7/41 ,  Y10T428/24802

    Abstract: The present invention provides heat-sensitive coating compositions, which comprise a colour developer of formula (1) or mixtures thereof wherein R can be hydrogen, C1-20-alkyl, C3-8-cycloalkyl, C2-10-alkenyl, aryl or SO3H, and R2 and R3 can be the same or different and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8, SR9, SO3H or COOR10 and R4 and R5 can be the same or different, and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8 or SR9, R6, R7, R8, R9 and R10 can be the same or different and can be hydrogen, C1-30-alkyl, C3-8-cycloalkyl, C2-10-alkenyl or aryl, wherein C1-20-alkyl can be unsubstituted or substituted with one or more C3-8-cycloalkyl, C2-10-alkenyl, phenyl, halogen, OR11, NR12R13, SR14, SO3H or COOR15, and aryl can be unsubstituted or substituted with one or more halogen, C1-10-alkyl, halogenated C1-10-alkyl, C3-8-cycloalkyl C2-10-alkenyl, phenyl, OR11, NR12R13, SR14, SO3H or COOR15, wherein R11, R12, R13, R14 and R15 can be the same or different and can be hydrogen, C1-10-alkyl, C3-8-cycloalkyl or C2-10-alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain colour developers.

    Abstract translation: 本发明提供热敏涂料组合物，其包含式（1）的显色剂或其混合物，其中R可以是氢，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基或SO 3 H ，R2和R3可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8，SR 9，SO 3 H或COOR 10和 R4和R5可以相同或不同，可以是氢，卤素，C 1-20烷基，C 3-8 - 环烷基，C 2-10 - 烯基，芳基，OR 6，NR 7 R 8或SR 9，R 6，R 7，R 8 ，R 9和R 10可以相同或不同，并且可以是氢，C 1-30 - 烷基，C 3-8 - 环烷基，C 2-10 - 烯基或芳基，其中C 1-20 - 烷基可以是未取代的或被一个或多个 C 3-8 - 环烷基，C 2-10 - 烯基，苯基，卤素，OR 11，NR 12 R 13，SR 14，SO 3 H或COOR 15，芳基可以是未被取代的或被一个或多个卤素取代，C 1-10烷基，卤代C 1-10 - 烷基，C 3-8 - 环烷基C2-10 - 烯基，苯基，OR11，NR12R13，SR14，SO3H或COOR15，其中 在R 11，R 12，R 13，R 14和R 15可以相同或不同，可以是氢，C 1-10 - 烷基，C 3-8 - 环烷基或C 2-10 - 烯基，一种制备这些组合物的方法， 涂覆这些组合物的基材，用这些组合物涂布的基材，使用这些组合物制备标记的基材的方法，通过后一方法获得的标记的底物和某些显色剂。

    Process for the production of strongly adherent coatings
    8.
    发明授权
    Process for the production of strongly adherent coatings 有权
    生产强粘附涂层的方法

    公开(公告)号：US08414982B2

    公开(公告)日：2013-04-09

    申请号：US11792747

    申请日：2005-12-12

    Applicant: Pascal Hayoz ,  Stephan Ilg

    Inventor： Pascal Hayoz ,  Stephan Ilg

    IPC: C08F4/00

    CPC classification number: C07D295/185 ,  B05D3/0446 ,  B05D3/06 ,  B05D3/067 ,  B05D3/08 ,  B05D3/14 ,  B05D3/144 ,  B05D7/04 ,  C07C51/412 ,  C07C69/738 ,  C07C225/22 ,  C07C235/80 ,  C07C323/62 ,  C07F9/54 ,  C08F2/50 ,  C07C59/06

    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.

    Abstract translation: 本发明涉及一种用于在无机或有机基底上生产强粘附涂层的方法，其中在第一步骤中，a）使低温等离子体，电晕放电或火焰作用于无机或有机基底上， 在第二步中b）将一种或多种限定的光引发剂或含有至少一种烯键式不饱和基团的单体，或上述物质的溶液，悬浮液或乳液的限定的光引发剂或混合物，优选常压下施用于 无机或有机衬底，第三步骤c）使用合适的方法，将上述物质用电磁波干燥和/或照射，并且任选地在第四步骤d）中，将预处理施加到另外的涂层上。

    Sulphonium Salt Initiators
    9.
    发明申请
    Sulphonium Salt Initiators 有权
    锍盐引发剂

    公开(公告)号：US20090197987A1

    公开(公告)日：2009-08-06

    申请号：US12226116

    申请日：2007-04-04

    Applicant: Pascal Hayoz ,  Stephan Ilg

    Inventor： Pascal Hayoz ,  Stephan Ilg

    IPC: C07C319/02 ,  C08F2/50

    CPC classification number: C09D11/101 ,  B33Y70/00 ,  C07C319/20 ,  C07C381/12 ,  C09D5/033 ,  C09D5/08 ,  G03F7/0045 ,  C07C323/22

    Abstract: Compounds of the formula (I), L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L′3 and L′5 or L″3 and L″5 together denote a single bond, provided that the respective X, X′ or X″ is not a single bond; and/or L3 and L5, L′3 and L′5 or L″3 and L″5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L′1 and L′3, L′1 and L′, L′5 and L′7, L″1 and L″3, L″1 and L″, or L″5 and L″7, together denote an organic linking group; provided that at least one of L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 is other than hydrogen; X, X′ and X″ independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.

    Abstract translation: 式（I），L，L'，L“，L1，L'1，L''1，L2，L'2，L''2，L3，L'3，L''3， L4，L'4，L''4，L5，L'5，L''5，L6，L'6，L''6，L7，L'7，L''7，L8，L'8和 彼此独立地是氢或有机取代基; 和/或成对L3和L5，L'3和L'5或L''3和L''5中的一个或多个一起表示单键，条件是各自的X，X'或X“不是 单一债券 和/或L3和L5，L'3和L'5或L''3和L''5一起表示有机连接基团; 和/或一对或多个L1和L3，L1和L，L5和L7，L'1和L'3，L'1和L'，L'5和L'7，L'1和L “3”，“1”和“L”，或“5”和“7”表示有机连接基团; 条件是L，L'，L“，L1，L'1，L''1，L2，L'2，L''2，L3，L'3，L'3， L'4，L''4，L 5，L'5，L''5，L 6，L'6，L''6，L 7，L'7，L''7，L8，L'8和L' '8不是氢; X，X'和X“彼此独立是单键，CRaRbO，S，NRc或NCORc; R a，R b和R c彼此独立地是氢或有机取代基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

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