Producing a substrate having high surface-area texturing
    2.
    发明申请
    Producing a substrate having high surface-area texturing 有权
    生产具有高表面积纹理的基材

    公开(公告)号:US20050242059A1

    公开(公告)日:2005-11-03

    申请号:US11092540

    申请日:2005-03-29

    摘要: A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High surface-area textured substrates, in particular, miniaturized planar analysis devices having high surface-area textured features, prepared by the methods disclosed herein, are also provided. A method by which the high surface-area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.

    摘要翻译: 提供了一种用于使用从底物中减去或添加来自衬底的材料或将其添加到衬底表面的方法来制备衬底的高表面积纹理的方法。 在一个实施例中,该方法是一种减法光刻方法,其涉及将激光可烧蚀基底(例如聚合物或陶瓷基底)暴露于激光。 可以使用掩模来限定入射在基板上的光的图案。 还提供了通过本文公开的方法制备的高表面积纹理化衬底,特别是具有高表面积纹理特征的小型化平面分析器件。 还提供了高表面积纹理基板或小型平面分析装置作为可以从其复制的副本的主体的方法。