Cleaning organic residues from EUV optics and masks
    2.
    发明授权
    Cleaning organic residues from EUV optics and masks 失效
    从EUV光学和掩模中清除有机残留物

    公开(公告)号:US08764905B1

    公开(公告)日:2014-07-01

    申请号:US13827611

    申请日:2013-03-14

    IPC分类号: C25F1/00

    摘要: A method and system for cleaning lithography components including contacting a substrate having residue including organic compounds and graphitic carbon deposited on a surface thereof with hydrogen peroxide vapor. The hydrogen peroxide vapor is irradiated with electromagnetic radiation having a wavelength in the range of 100 nm to 350 nm forming hydroxyl radicals. The hydroxyl radicals react with the residue to remove the residue from the surface of the substrate.

    摘要翻译: 一种用于清洁光刻部件的方法和系统,包括使具有残余物的基底(包括有机化合物)和沉积在其表面上的石墨碳与过氧化氢蒸气接触。 用波长在100nm至350nm范围内的电磁辐射照射过氧化氢蒸气,形成羟基。 羟基自由基与残留物反应以从基底表面除去残余物。

    IMMERSION LITHOGRAPHY USING HAFNIUM-BASED NANOPARTICLES
    3.
    发明申请
    IMMERSION LITHOGRAPHY USING HAFNIUM-BASED NANOPARTICLES 失效
    使用基于铌的纳米粒子进行沉积光刻

    公开(公告)号:US20090213346A1

    公开(公告)日:2009-08-27

    申请号:US12035963

    申请日:2008-02-22

    IPC分类号: G03B27/42 G03C5/04

    摘要: Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or equal to about 15 nanometers. The apparatus includes the composition of matter, a light source, a platform for supporting a work piece, and a lens element. The method includes providing a light source, providing a lens element between the light source and a work piece, providing the composition of matter between the lens element and the work piece, and exposing the work piece to light provided by the light source by passing light from the light source through the lens element and the composition of matter to the work piece.

    摘要翻译: 适用于例如浸没光刻的物质的方法,装置和组成。 物质的组成包括直径小于或等于约15纳米的二氧化铪纳米颗粒。 该装置包括物质的组成,光源,用于支撑工件的平台和透镜元件。 该方法包括提供光源,在光源和工件之间提供透镜元件,在透镜元件和工件之间提供物质的组成,并将工件暴露于由光源提供的光中,通过光 从光源通过透镜元件和物质的组成到工件。

    Rapid screening test for smith-lemli-opitz syndrome
    4.
    发明授权
    Rapid screening test for smith-lemli-opitz syndrome 失效
    史密斯综合征快速筛查试验

    公开(公告)号:US5629210A

    公开(公告)日:1997-05-13

    申请号:US458199

    申请日:1995-06-02

    IPC分类号: G01N33/92 B01D59/44

    摘要: A rapid screening test was used to distinguish between blood of normal infants and that of individuals having the Smith-Lemli-Opitz Syndrome (SLO). Blood was spotted on filter paper and analyzed with no extractions or separations. The method comprises the steps of vaporizing a cholesterol containing organic sample, ionizing the vaporized sample, detecting fragment ions of said vaporized ionized sample, and determining the intensity ratio of said fragment ions for cholesterol/7-dehydrocholesterol in the sample. The method includes performing the analysis by time-of-flight secondary ion mass spectrometry without derivation or chemical steps.

    摘要翻译: 使用快速筛选试验来区分正常婴儿的血液和具有史密斯 - 莱米 - 奥itz综合征(SLO)的患者的血液。 在滤纸上发现血液,并进行分析,无需提取或分离。 该方法包括蒸发含胆固醇的有机样品,电离蒸发的样品,检测所述蒸发的电离样品的碎片离子,以及确定样品中所述碎片离子对胆固醇/ 7-脱氢胆固醇的强度比。 该方法包括通过飞行时间次级离子质谱法进行分析,而无需推导或化学步骤。

    METHOD FOR MAKING SOFT PELLICLES
    6.
    发明申请
    METHOD FOR MAKING SOFT PELLICLES 失效
    制作软胶囊的方法

    公开(公告)号:US20090110895A1

    公开(公告)日:2009-04-30

    申请号:US12249416

    申请日:2008-10-10

    IPC分类号: B32B27/00 B29C35/08

    摘要: The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm and 193 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.

    摘要翻译: 本发明一般涉及半导体光刻领域。 更具体地,涉及与157nm和193nm软膜相关的方法,组合物和装置以及全氟化聚合物在产生薄膜中的用途。

    Synthesis of Graphene Films Cycloalkanes
    9.
    发明申请
    Synthesis of Graphene Films Cycloalkanes 审中-公开
    石墨烯膜的合成环烷烃

    公开(公告)号:US20120132516A1

    公开(公告)日:2012-05-31

    申请号:US12955500

    申请日:2010-11-29

    申请人: Paul A. Zimmerman

    发明人: Paul A. Zimmerman

    摘要: This invention provides, but is not limited to, methods for synthesizing graphene film from liquid hydrocarbons using deep ultraviolet light. Specifically, methods for synthesizing a graphene film from an alicyclic- or liquid aromatic-hydrocarbon are presented. Methods for forming a graphene film comprising a dopant are also presented.

    摘要翻译: 本发明提供但不限于使用深紫外光从液体烃合成石墨烯膜的方法。 具体地说,提出了从脂环族或液态芳族烃合成石墨烯膜的方法。 还提出了用于形成包含掺杂剂的石墨烯膜的方法。

    Immersion lithography using hafnium-based nanoparticles
    10.
    发明授权
    Immersion lithography using hafnium-based nanoparticles 失效
    使用铪基纳米粒子进行浸渍光刻

    公开(公告)号:US08134684B2

    公开(公告)日:2012-03-13

    申请号:US12035963

    申请日:2008-02-22

    IPC分类号: G03B27/42

    摘要: Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or equal to about 15 nanometers. The apparatus includes the composition of matter, a light source, a platform for supporting a work piece, and a lens element. The method includes providing a light source, providing a lens element between the light source and a work piece, providing the composition of matter between the lens element and the work piece, and exposing the work piece to light provided by the light source by passing light from the light source through the lens element and the composition of matter to the work piece.

    摘要翻译: 适用于例如浸没光刻的物质的方法,装置和组成。 物质的组成包括直径小于或等于约15纳米的二氧化铪纳米颗粒。 该装置包括物质的组成,光源,用于支撑工件的平台和透镜元件。 该方法包括提供光源,在光源和工件之间提供透镜元件,在透镜元件和工件之间提供物质的组成,并将工件暴露于由光源通过光提供的光 从光源通过透镜元件和物质的组成到工件。