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公开(公告)号：US08764905B1
公开(公告)日：2014-07-01
申请号：US13827611
申请日：2013-03-14
IPC分类号： C25F1/00
CPC分类号： C11D11/0047 , C11D7/06 , C11D11/0041 , G03F7/423
摘要： A method and system for cleaning lithography components including contacting a substrate having residue including organic compounds and graphitic carbon deposited on a surface thereof with hydrogen peroxide vapor. The hydrogen peroxide vapor is irradiated with electromagnetic radiation having a wavelength in the range of 100 nm to 350 nm forming hydroxyl radicals. The hydroxyl radicals react with the residue to remove the residue from the surface of the substrate.
摘要翻译： 一种用于清洁光刻部件的方法和系统，包括使具有残余物的基底（包括有机化合物）和沉积在其表面上的石墨碳与过氧化氢蒸气接触。 用波长在100nm至350nm范围内的电磁辐射照射过氧化氢蒸气，形成羟基。 羟基自由基与残留物反应以从基底表面除去残余物。
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2.发明申请PROCESS AND MATERIAL FOR PREVENTING DELETERIOUS EXPANSION OF HIGH ASPECT RATIO COPPER FILLED THROUGH SILICON VIAS (TSVS) 审中-公开用于防止通过硅酮（TSVS）填充的高比例铜的去除膨胀的方法和材料公开(公告)号：US20140117559A1
公开(公告)日：2014-05-01
申请号：US13997577
申请日：2012-03-30
申请人： Paul A. Zimmerman , Scott B. Clendenning , Patricio E. Romero , Paul B. Fischer , Robert Edgeworth
发明人： Paul A. Zimmerman , Scott B. Clendenning , Patricio E. Romero , Paul B. Fischer , Robert Edgeworth
IPC分类号： H01L23/64 , H01L21/768
CPC分类号： H01L21/76898 , H01L21/02181 , H01L21/02189 , H01L21/02194 , H01L21/02205 , H01L21/0228 , H01L21/76831 , H01L21/76837 , H01L21/76841 , H01L21/76871 , H01L21/76879 , H01L23/481 , H01L23/60 , H01L23/642 , H01L25/0657 , H01L2224/16146 , H01L2225/06513 , H01L2225/06544
摘要： Techniques are disclosed for forming through-silicon vias (TSVs) implementing a negative thermal expansion (NTE) material such as zirconium tungstate (ZrW2O8) or hafnium tungstate (HfW2O8). In some cases, the NTE material is disposed between the substrate and conductive core material of the TSV and serves to offset, at least in part, the coefficient of thermal expansion (CTE) mismatch there between, thus reducing heat-induced stresses and/or protrusion (pumping) of the conductive core material. The NTE material also may protect against leakage, voltage breakdown, and/or diffusion of the conductive core material. Furthermore, the NTE material may reduce radial stresses in high-aspect-ratio TSVs. In some cases, techniques disclosed herein may improve TSV reliability, enhance three-dimensional integration, and/or enhance performance in three-dimensional integrated circuits and/or other three-dimensional packages. Other embodiments which can employ techniques described herein will be apparent in light of this disclosure.
摘要翻译： 公开了形成实现负热膨胀（NTE）材料如钨酸锆（ZrW2O8）或钨酸铪（HfW2O8）的穿硅通孔（TSV）的技术。 在一些情况下，NTE材料设置在TSV的衬底和导电芯材之间，并且用于至少部分地抵消其间的热膨胀系数（CTE）失配，从而减少热诱导的应力和/或 突出（泵送）导电芯材料。 NTE材料还可以防止导电芯材料的泄漏，电压击穿和/或扩散。 此外，NTE材料可以降低高纵横比TSV中的径向应力。 在一些情况下，本文公开的技术可以提高三维集成电路和/或其他三维封装中的TSV可靠性，增强三维集成和/或增强性能。 根据本公开，可以使用本文描述的技术的其它实施例将是显而易见的。
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公开(公告)号：US20090213346A1
公开(公告)日：2009-08-27
申请号：US12035963
申请日：2008-02-22
申请人： Paul A. Zimmerman , Jeffrey Byers , Carita Simons
发明人： Paul A. Zimmerman , Jeffrey Byers , Carita Simons
CPC分类号： G03F7/2041 , B82Y30/00 , C01G27/02 , C01P2004/64 , C01P2006/60 , G03F7/0043
摘要： Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or equal to about 15 nanometers. The apparatus includes the composition of matter, a light source, a platform for supporting a work piece, and a lens element. The method includes providing a light source, providing a lens element between the light source and a work piece, providing the composition of matter between the lens element and the work piece, and exposing the work piece to light provided by the light source by passing light from the light source through the lens element and the composition of matter to the work piece.
摘要翻译： 适用于例如浸没光刻的物质的方法，装置和组成。 物质的组成包括直径小于或等于约15纳米的二氧化铪纳米颗粒。 该装置包括物质的组成，光源，用于支撑工件的平台和透镜元件。 该方法包括提供光源，在光源和工件之间提供透镜元件，在透镜元件和工件之间提供物质的组成，并将工件暴露于由光源提供的光中，通过光 从光源通过透镜元件和物质的组成到工件。
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公开(公告)号：US5629210A
公开(公告)日：1997-05-13
申请号：US458199
申请日：1995-06-02
CPC分类号： G01N33/92 , Y10S436/811 , Y10T436/24 , Y10T436/25375
摘要： A rapid screening test was used to distinguish between blood of normal infants and that of individuals having the Smith-Lemli-Opitz Syndrome (SLO). Blood was spotted on filter paper and analyzed with no extractions or separations. The method comprises the steps of vaporizing a cholesterol containing organic sample, ionizing the vaporized sample, detecting fragment ions of said vaporized ionized sample, and determining the intensity ratio of said fragment ions for cholesterol/7-dehydrocholesterol in the sample. The method includes performing the analysis by time-of-flight secondary ion mass spectrometry without derivation or chemical steps.
摘要翻译： 使用快速筛选试验来区分正常婴儿的血液和具有史密斯 - 莱米 - 奥itz综合征（SLO）的患者的血液。 在滤纸上发现血液，并进行分析，无需提取或分离。 该方法包括蒸发含胆固醇的有机样品，电离蒸发的样品，检测所述蒸发的电离样品的碎片离子，以及确定样品中所述碎片离子对胆固醇/ 7-脱氢胆固醇的强度比。 该方法包括通过飞行时间次级离子质谱法进行分析，而无需推导或化学步骤。
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公开(公告)号：US20110039105A1
公开(公告)日：2011-02-17
申请号：US12583078
申请日：2009-08-13
申请人： Paul A. Zimmerman , Aristeidis Bakandritsos , Michael F. Zettel , Markos Trikeriotis , Robert Rodriguez , Emmanuel P. Giannelis , Woo Jin Bae , Christopher K. Ober
发明人： Paul A. Zimmerman , Aristeidis Bakandritsos , Michael F. Zettel , Markos Trikeriotis , Robert Rodriguez , Emmanuel P. Giannelis , Woo Jin Bae , Christopher K. Ober
IPC分类号： B32B5/16
CPC分类号： C01G25/02 , B82Y30/00 , C01G23/047 , C01G27/00 , C01G27/02 , C01P2002/82 , C01P2004/64 , C01P2004/84 , C01P2006/22 , C01P2006/60 , Y10T428/2991 , Y10T428/2993 , Y10T428/2995 , Y10T428/2996 , Y10T428/2998
摘要： The present invention relates generally to non-aggregating nanoparticles, including ligand capped metal oxide nanoparticles. Methods for their synthesis and methods for their use, for example, for improved immersion lithography processes, are also disclosed.
摘要翻译： 本发明一般涉及非聚集纳米颗粒，包括配体封端的金属氧化物纳米颗粒。 还公开了它们的合成方法及其使用方法，例如用于改进的浸没式光刻工艺。
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公开(公告)号：US20090110895A1
公开(公告)日：2009-04-30
申请号：US12249416
申请日：2008-10-10
CPC分类号： G03F1/62 , H01J2237/3165 , Y10T428/31544
摘要： The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm and 193 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.
摘要翻译： 本发明一般涉及半导体光刻领域。 更具体地，涉及与157nm和193nm软膜相关的方法，组合物和装置以及全氟化聚合物在产生薄膜中的用途。
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公开(公告)号：US07504192B2
公开(公告)日：2009-03-17
申请号：US11015590
申请日：2004-12-17
CPC分类号： G03F1/62 , H01J2237/3165 , Y10T428/31544
摘要： The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm and 193 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.
摘要翻译： 本发明一般涉及半导体光刻领域。 更具体地，涉及与157nm和193nm软膜相关的方法，组合物和装置以及全氟化聚合物在产生薄膜中的用途。
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公开(公告)号：US20150380615A1
公开(公告)日：2015-12-31
申请号：US14317721
申请日：2014-06-27
申请人： Paul A. Zimmerman
发明人： Paul A. Zimmerman
CPC分类号： H01L33/56 , H01L2224/48091 , H01L2224/48465 , H01L2224/73265 , H01L2924/181 , H01L2924/00014 , H01L2924/00012
摘要： Light emitting diode assemblies having transparent covers that exhibit high indexes of refraction adjacent are provided. Covers comprise polymer composites comprising inorganic nanoparticles. Inorganic nanoparticles include nanoparticles of zirconium dioxide, hafnium dioxide, titanium dioxide, and combinations thereof.
摘要翻译： 提供了具有相邻折射率高的透明盖的发光二极管组件。 覆盖物包括包含无机纳米颗粒的聚合物复合材料。 无机纳米颗粒包括二氧化锆，二氧化铪，二氧化钛及其组合的纳米颗粒。
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公开(公告)号：US20120132516A1
公开(公告)日：2012-05-31
申请号：US12955500
申请日：2010-11-29
申请人： Paul A. Zimmerman
发明人： Paul A. Zimmerman
CPC分类号： B01J19/121 , B01J19/123 , B82Y30/00 , B82Y40/00 , C01B32/184
摘要： This invention provides, but is not limited to, methods for synthesizing graphene film from liquid hydrocarbons using deep ultraviolet light. Specifically, methods for synthesizing a graphene film from an alicyclic- or liquid aromatic-hydrocarbon are presented. Methods for forming a graphene film comprising a dopant are also presented.
摘要翻译： 本发明提供但不限于使用深紫外光从液体烃合成石墨烯膜的方法。 具体地说，提出了从脂环族或液态芳族烃合成石墨烯膜的方法。 还提出了用于形成包含掺杂剂的石墨烯膜的方法。
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公开(公告)号：US08134684B2
公开(公告)日：2012-03-13
申请号：US12035963
申请日：2008-02-22
发明人： Paul A. Zimmerman , Jeffrey Byers
IPC分类号： G03B27/42
CPC分类号： G03F7/2041 , B82Y30/00 , C01G27/02 , C01P2004/64 , C01P2006/60 , G03F7/0043
摘要： Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or equal to about 15 nanometers. The apparatus includes the composition of matter, a light source, a platform for supporting a work piece, and a lens element. The method includes providing a light source, providing a lens element between the light source and a work piece, providing the composition of matter between the lens element and the work piece, and exposing the work piece to light provided by the light source by passing light from the light source through the lens element and the composition of matter to the work piece.
摘要翻译： 适用于例如浸没光刻的物质的方法，装置和组成。 物质的组成包括直径小于或等于约15纳米的二氧化铪纳米颗粒。 该装置包括物质的组成，光源，用于支撑工件的平台和透镜元件。 该方法包括提供光源，在光源和工件之间提供透镜元件，在透镜元件和工件之间提供物质的组成，并将工件暴露于由光源通过光提供的光 从光源通过透镜元件和物质的组成到工件。
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