中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

26 records (took 0.015 seconds)

    Production of electrodes
    3.
    发明授权
    Production of electrodes 失效
    生产电极

    公开(公告)号：US5856046A

    公开(公告)日：1999-01-05

    申请号：US700852

    申请日：1996-08-21

    Applicant: Peter Heilmann ,  Helmut Steininger

    Inventor： Peter Heilmann ,  Helmut Steininger

    IPC: H01M4/139 ,  H01M4/74 ,  H01M4/75

    CPC classification number: H01M4/139 ,  H01M4/04 ,  H01M4/0402 ,  H01M4/0404 ,  H01M4/0409 ,  H01M4/0411 ,  H01M4/0414 ,  H01M4/0435 ,  H01M2004/028

    Abstract: Electrodes suitable for electrochemical cells are produced bya) applying a mixture comprising.alpha.) a solid III which can reversibly take up or release lithium ions in an electrochemical reaction and.beta.) a binder IV, or a compound which can be converted into a binder IV, to an electrically conductive support V by means of a coating apparatus II with essentially linear relative motion (R) of the support V relative to the coating apparatus II in such a way that an uncoated zone remains on the support V at each of the two margins of the coating apparatus II running parallel to the relative motion (R) andb) cutting the support V at an angle of from 5 to 85 degrees to the normal to the direction of relative motion (R) to give essentially parrallel strips.

    Abstract translation: 适用于电化学电池的电极通过以下方法制备：a）施加包含α）在电化学反应中可逆地吸收或释放锂离子的固体III和β）粘合剂IV或可转化成粘合剂IV的化合物的混合物 通过涂覆装置II与支撑件V相对于涂覆装置II具有基本上线性的相对运动（R）的导电支撑件V，使得在两个部件中的每一个处的支撑件V上保持未涂覆区域 涂覆装置II的平行于相对运动（R）的边缘和b）以相对于相对运动（R）的方向垂直于5至85度的角度切割支撑件V，以给出基本上的平行条带。

    Magnetic recording medium and the production thereof
    5.
    发明授权
    Magnetic recording medium and the production thereof 失效
    磁记录介质及其制作

    公开(公告)号：US5585139A

    公开(公告)日：1996-12-17

    申请号：US355300

    申请日：1994-12-12

    Applicant: Helmut Steininger ,  Peter Heilmann

    Inventor： Helmut Steininger ,  Peter Heilmann

    IPC: G11B5/66 ,  C23C14/20 ,  C23C14/24 ,  G11B5/64 ,  G11B5/65 ,  G11B5/73 ,  G11B5/85

    CPC classification number: C23C14/24 ,  C23C14/20 ,  G11B5/85

    Abstract: The magnetic recording medium consists essentially of a polymeric substrate, a coherent, magnetic thin metal film applied to the surface of the substrate by a PVD method and, if required, a protective layer formed on the thin metal film. In order to achieve a large residual induction component in the plane of the film, in particular high residual induction in the transverse direction, the thin metal film contains a noble gas or noble gas mixture, preferably argon. During the coating of the polymeric substrate with the magnetic metal or with the magnetic alloy, the noble gas is fed directly and preferably tangentially to the substrate surface at a specific noble gas flow of from 1.0.multidot.10.sup.4 to 6.0.multidot.10.sup.4. In the plane of the thin metal film, the ratio of residual induction in the longitudinal direction to that in the transverse direction is from about 0.9 to about 1.8.

    Abstract translation: 磁记录介质基本上由聚合物基底，通过PVD方法施加到基底表面的相干的磁性薄金属膜，如果需要，在薄金属膜上形成保护层。 为了在膜的平面中实现大的残留感应成分，特别是在横向上的高残留感应，薄金属膜含有惰性气体或惰性气体混合物，优选氩。 在用磁性金属或与磁性合金涂覆聚合物基材期间，惰性气体以1.0×10 4至6.0×10 4的特定惰性气体流直接且优选地切向地加到基材表面上。 在薄金属膜的平面中，纵向上的残留感应与横向上的残留感应比为约0.9至约1.8。

    Production of a thin x-ray amorphous aluminum nitride or aluminum silicon nitride film on a surface
    7.
    发明授权
    Production of a thin x-ray amorphous aluminum nitride or aluminum silicon nitride film on a surface 失效
    在表面上生产薄的x射线无定形氮化铝或氮化铝铝膜

    公开(公告)号：US4957604A

    公开(公告)日：1990-09-18

    申请号：US300975

    申请日：1989-01-24

    Applicant: Helmut Steininger

    Inventor： Helmut Steininger

    IPC: C23C14/00 ,  C23C14/06 ,  C23C14/34 ,  G02B6/122 ,  G11B7/243 ,  G11B7/253 ,  G11B7/2536 ,  G11B7/257 ,  G11B7/2578 ,  G11B11/105 ,  H01L21/318

    CPC classification number: H01L21/318 ,  C23C14/0036 ,  C23C14/0641 ,  G02B6/122 ,  G11B11/10589 ,  G11B11/10593 ,  G11B7/2578 ,  G11B2007/24306 ,  G11B2007/25706 ,  G11B2007/25708 ,  G11B2007/2571 ,  G11B2007/25713 ,  G11B7/2536

    Abstract: A thin X-ray amorphous aluminum nitride or aluminum silicon nitride film is produced on a surface by vaporization of aluminum or of aluminum and silicon by reactive sputtering or reactive magnetron sputtering under reduced pressure in a process gas atmosphere, so that a sputter gas results, and deposition of the aluminum nitride or of the aluminum silicon nitride from the sputter gas onto the said surface, resulting in the said thin X-ray amorphous aluminum nitride or aluminum silicon nitride film, by a process in which the said process gas atmosphere consists essentially of nitrogen and argon and one or more further noble gases selected from the group consisting of neon, krypton and xenon, the volume ratio of argon to the further noble gases being from 2:1 to 100:1 and the volume ratio of the further noble gases to nitrogen being from 2:1 to 10:1.

    Abstract translation: 通过在处理气体气氛中的减压下的反应溅射或反应性磁控溅射在铝或铝和硅的蒸发下在表面上产生薄的X射线无定形氮化铝或氮化铝膜，从而产生溅射气体， 以及将氮化铝或氮化铝铝从溅射气体沉积到所述表面上，通过其中所述工艺气体气氛基本上组成的方法产生所述薄X射线无定形氮化铝或氮化铝膜 的氮气和氩气以及一种或多种选自氖气，氪气和氙气的惰性气体，氩气与另外的惰性气体的体积比为2:1至100:1，另外的贵金属的体积比为 气体与氮气的比例为2：1至10：1。

    Carrier for the manufacture of abrasion-resistant catalysts, process for the production of the carrier and catalyst deposited on the carrier
    10.
    发明授权
    Carrier for the manufacture of abrasion-resistant catalysts, process for the production of the carrier and catalyst deposited on the carrier 失效
    用于制造耐磨催化剂的载体，用于生产沉积在载体上的载体和催化剂的方法

    公开(公告)号：US4703028A

    公开(公告)日：1987-10-27

    申请号：US763436

    申请日：1985-08-06

    Applicant: Helmut Steininger

    Inventor： Helmut Steininger

    IPC: B01J35/10 ,  B01J37/02 ,  B01J37/34 ,  C23C14/06 ,  B01J21/02 ,  B01J21/04 ,  B01J21/06

    CPC classification number: B01J37/34 ,  B01J37/0215 ,  B01J37/0238 ,  C23C14/06

    Abstract: A carrier for abrasion-resistant catalysts having a surface coated with high-fusion oxides, nitrides and/or carbides of at least one transition metal, or boron, of aluminum and/or of silicon or of combination of these compounds. The coating is carried out using physical vapor deposition techniques, such as evaporating coating ion plating or cathode sputtering. The layer thus produced consists of individual structures, such as stems and/or columns having different elevations which together produce a porous layer serving as an intermediate layer for the subsequent deposition of the catalytic material.

    Abstract translation: PCT No.PCT / EP84 / 00394 Sec。 371日期1985年8月6日 102（e）日期1985年8月6日PCT提交1984年12月8日PCT公布。 第WO85 / 02557号公报 1985年6月20日，1985年。一种用于耐磨催化剂的载体，其具有涂覆有至少一种过渡金属或硼的铝，和/或硅的高熔点氧化物，氮化物和/或碳化物的表面或者 这些化合物。 涂层使用物理气相沉积技术进行，例如蒸镀涂层离子镀或阴极溅射。 由此产生的层由单独的结构构成，例如具有不同高度的杆和/或柱，它们一起产生用作随后沉积催化材料的中间层的多孔层。

Patent Agency Ranking