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    Embedding a Secondary Information Signal in a Channel Data Stream
    1.
    发明申请
    Embedding a Secondary Information Signal in a Channel Data Stream 审中-公开
    在信道数据流中嵌入辅助信息信号

    公开(公告)号：US20080317170A1

    公开(公告)日：2008-12-25

    申请号：US10597147

    申请日：2005-01-07

    申请人： Petrus Henricus Cornelius Bentvelsen ,  Willem Marie Julia Marcel Coene

    发明人： Petrus Henricus Cornelius Bentvelsen ,  Willem Marie Julia Marcel Coene

    IPC分类号： H04L25/06

    CPC分类号： G11B20/00579 ,  G11B20/00086 ,  G11B20/1426 ,  G11B2020/1453

    摘要： The present invention relates to a method and a corresponding device for embedding a secondary information signal in a channel data stream of encoded primary information signal. In order to make it more difficult for unauthorized persons or devices to retrieve the location of storage of the secondary information signal or its content itself a device is proposed according to the present invention comprising: an encoder (1) for encoding said primary information signal into a channel data stream, a control unit (3) for controlling the DC content of said channel data stream, a secondary information signal embedding unit (2) for embedding said secondary information signal in said channel data stream by using freedoms in the DC control, and an adaptation unit (4) for adapting the DC control by making non-optimal, arbitrary or random choices of the DC control at a number of locations of said channel data stream.

    摘要翻译： 本发明涉及用于将次要信息信号嵌入编码的主信息信号的信道数据流中的方法和相应装置。 为了使未经授权的人员或设备更难以检索辅助信息信号或其内容本身的存储位置，根据本发明提出了一种设备，包括：编码器（1），用于将所述主信息信号编码成 频道数据流，用于控制所述频道数据流的DC内容的控制单元（3），用于通过使用DC控制中的自由将所述辅助信息信号嵌入在所述频道数据流中的次信息信号嵌入单元（2） 以及适配单元（4），用于通过在所述信道数据流的多个位置处进行DC控制的非最佳，任意或随机的选择来适配DC控制。

    Coder and a Method of Coding For Codes With a Parity-Complementary Word Assignment Having a Constraint of D1=,R=2
    3.
    发明申请
    Coder and a Method of Coding For Codes With a Parity-Complementary Word Assignment Having a Constraint of D1=,R=2 有权
    编码器和编码代码的方法，其中具有约束D1 =，R = 2的奇偶互补字分配

    公开(公告)号：US20090015446A1

    公开(公告)日：2009-01-15

    申请号：US12097570

    申请日：2006-12-08

    申请人： Willem Marie Julia Marcel Coene ,  Andries Pieter Hekstra ,  Hiroyuki Yamagishi ,  Makoto Noda

    发明人： Willem Marie Julia Marcel Coene ,  Andries Pieter Hekstra ,  Hiroyuki Yamagishi ,  Makoto Noda

    IPC分类号： H03M7/00

    CPC分类号： G11B20/1426 ,  G11B20/10055 ,  G11B20/10296 ,  G11B2020/1453 ,  G11B2020/1457 ,  H03M5/145 ,  H03M7/40 ,  H03M13/29 ,  H03M13/31 ,  H03M13/3761 ,  H03M13/3972 ,  H03M13/41

    摘要： Presently known d=1 codes have long trains consisting of consecutive 2T runs and an overall high frequency of occurrence of the shortest 2T runs that reduce the performance of the bit detector By using a code with an MTR constraint of 2 an improvement in the bit detection is achieved. A code constructed in a systematic way that provides an MTR constraint of 2 is presented. A variation of such a code is disclosed where one sub-code is used, where coding states are divided into coding classes and where code words are divided into code word types. Then, for a given sub-code, an code word of type t can be concatenated with an code word of the next sub-code if said subsequent code word of said next sub-code belongs to one of coding states of the coding class with index Tmax+1 t. In the code according to the invention the overall code has the property that the respective channel bit sequences that are encoded from the same message-bit sequence, starting from any possible state of the finite-state-machine, for each of the two values of a DC-control bit, that is part of a given user word have opposite parities for the sequences generated from the starting state up to the state where both encoder paths merge. For the case that the encoder paths do not merge, there is no such constraint. Finally, a new d=1, k=10 sliding-block decodable RLL code is disclosed with the following properties: (i) it has an r=2 constraint which is the lowest MTR value that is compatible with a rate R=⅔; (ii) it enables practical SISO-RLL decoding because of its compact 2-to-3 mapping; and (iii) the new code uses a parity-complementary word assignment4 (PCWA) for DC-control.

    摘要翻译： 目前已知的d = 1代码具有由连续的2T运行组成的长列，并且总体出现最短的2T运行的频率，从而降低位检测器的性能通过使用MTR约束为2的代码，改进了位检测 已完成。 提出了一种以系统方式构建的代码，其提供MTR约束为2的代码。 公开了这样的代码的变型，其中使用一个子代码，其中编码状态被分为编码类别以及代码字被分成代码字类型。 然后，对于给定子码，如果所述下一子码的所述后续码字属于编码类的编码状态之一，则可以将类型t的码字与下一子码的码字连接， 指数Tmax + 1t。 在根据本发明的代码中，总代码具有以下特性：从相同消息比特序列编码的各个信道比特序列，从有限状态机的任何可能状态开始，对于两个值的 作为给定用户字的一部分的DC控制位对于从起始状态直到两个编码器路径合并的状态产生的序列具有相反的奇偶校验。 对于编码器路径不合并的情况，没有这样的限制。 最后，公开了一种新的d = 1，k = 10滑块可解码的RLL码，具有以下特性：（i）它具有r = 2约束，其是与速率R = 2 / 3; （ii）由于其紧凑的2对3映射，它使实用的SISO-RLL解码成为可能; 和（iii）新的代码使用奇偶互补字分配4（PCWA）进行DC控制。

    Coder and a method of coding for codes having a Repeated Maximum Transition Run constraint of 2
    5.
    发明授权
    Coder and a method of coding for codes having a Repeated Maximum Transition Run constraint of 2 失效
    编码器和编码具有重复最大转换运行约束的代码的方法2

    公开(公告)号：US07403138B2

    公开(公告)日：2008-07-22

    申请号：US11575079

    申请日：2005-09-08

    申请人： Willem Marie Julia Marcel Coene

    发明人： Willem Marie Julia Marcel Coene

    IPC分类号： H03M5/00

    CPC分类号： G11B20/1426 ,  G11B2020/1453 ,  H03M5/145

    摘要： Presently known codes have long trains consisting of 2T runs that reduce the performance of the bit detector. By using a code with an RMTR constraint of 2 an improvement in the bit detection is achieved. A code constructed is a systematic way that provides an RMTR constraint of 2 is presented. Several variations of such a code are disclosed where one or more sub-codes are used, where coding states are divided into coding classes and where code words are divided into code word types. Then, for a given sub-code, a code word type t can be concatenated with a code word of the next sub-code if the subsequent code word of the next sub-code belongs to one of coding states of the coding class with index Tmax+1−t.

    摘要翻译： 目前已知的代码具有由2T运行组成的长列车，降低了位检测器的性能。 通过使用RMTR约束为2的代码，实现了位检测的改进。 构建的代码是提供RMTR约束为2的系统方法。 公开了这样的代码的几个变型，其中使用一个或多个子代码，其中编码状态被分为编码类别以及代码字被划分为代码字类型。 然后，对于给定的子代码，如果下一子代码的后续代码字属于具有索引的编码类的编码状态之一，则代码字类型t可以与下一子代码的代码字连接 最大+ 1-t。

    Substrate, an inspection apparatus, and a lithographic apparatus
    7.
    发明授权
    Substrate, an inspection apparatus, and a lithographic apparatus 有权
    基板，检查装置和光刻设备

    公开(公告)号：US09081304B2

    公开(公告)日：2015-07-14

    申请号：US13059408

    申请日：2009-07-09

    申请人： Hendrik Jan Hidde Smilde ,  Willem Marie Julia Marcel Coene

    发明人： Hendrik Jan Hidde Smilde ,  Willem Marie Julia Marcel Coene

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70683 ,  G03F7/70625 ,  G03F7/70633 ,  Y10T428/24802

    摘要： A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced.

    摘要翻译： 用于测量衬底的重叠误差或临界尺寸的目标包括光栅。 在一个示例中，光栅的线相对于目标的边缘以大约45°的角度布置。 因此，光栅反射的衍射级别具有沿其它衍射级所在的线不对准的亚极大值，并且强度与其他衍射级的重叠减小。

    Calibration Method and Apparatus
    8.
    发明申请
    Calibration Method and Apparatus 有权
    校准方法和装置

    公开(公告)号：US20110178785A1

    公开(公告)日：2011-07-21

    申请号：US12973248

    申请日：2010-12-20

    申请人： Patricius Aloysius Jacobus TINNEMANS ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    发明人： Patricius Aloysius Jacobus TINNEMANS ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    IPC分类号： G06F17/10

    CPC分类号： G01N21/93 ,  G01N21/4785 ,  G01N21/4788

    摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.

    摘要翻译： 角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。 不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。 还可以执行参考镜测量。 使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。 建模可以考虑相应周期性目标的对称性。 该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。 极化效应可以在由琼斯微积分或米勒微积分建模中描述。 该建模可以包括基于诸如Zernike多项式的基函数的参数化。

    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
    10.
    发明申请
    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 失效
    检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法

    公开(公告)号：US20110001978A1

    公开(公告)日：2011-01-06

    申请号：US12822422

    申请日：2010-06-24

    申请人： Hendrik Jan Hidde SMILDE ,  Willem Marie Julia Marcel Coene

    发明人： Hendrik Jan Hidde SMILDE ,  Willem Marie Julia Marcel Coene

    IPC分类号： G01N21/47

    CPC分类号： G03F7/70633 ,  G03F7/705 ,  G03F7/70516

    摘要： A method of determining an overlay error between two successive layers produced by a lithographic process on a substrate, including using the lithographic process to form a calibration structure including a periodic structure of the same pitch on each of the layers, such that an overlaid pair of periodic structures is formed, the structures being parallel, but offset relative to each other by an overlay amount. A spectrum produced by directing a beam of radiation onto the calibration structure is measured and compared with one or more modeled spectra so as to determine values of the grating parameters for the calibration structure from the measured spectrum. The lithographic process is used to form further overlaid periodic structures on the same or one or more subsequent substrates, the determined grating parameter values for the calibration structure being used to determine overlay amounts for the further overlaid periodic structures.

    摘要翻译： 一种确定由光刻工艺在衬底上产生的两个连续层之间的重叠误差的方法，包括使用光刻工艺形成包括在每个层上的相同间距的周期性结构的校准结构，使得重叠的一对 形成周期性结构，结构是平行的，但是相对于彼此偏移了重叠量。 测量通过将辐射束引导到校准结构上产生的光谱，并将其与一个或多个建模光谱进行比较，以便根据测量的光谱确定校准结构的光栅参数的值。 光刻工艺用于在相同或一个或多个后续衬底上形成进一步覆盖的周期性结构，所确定的校准结构的光栅参数值用于确定进一步覆盖的周期性结构的重叠量。