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    MULTI-ELEMENT FILTER ARRANGEMENT AND METHODS
    1.
    发明申请
    MULTI-ELEMENT FILTER ARRANGEMENT AND METHODS 有权
    多元滤波器布置和方法

    公开(公告)号：US20060283160A1

    公开(公告)日：2006-12-21

    申请号：US11278153

    申请日：2006-03-31

    申请人： Philip Johnson ,  David Webb ,  Paul Booth ,  David Carlson

    发明人： Philip Johnson ,  David Webb ,  Paul Booth ,  David Carlson

    IPC分类号： B01D46/00

    CPC分类号： B01D29/21 ,  B01D29/232 ,  B01D29/54 ,  B01D46/0012 ,  B01D46/0024 ,  B01D46/2414 ,  B01D2201/0415 ,  B01D2201/0461 ,  B01D2201/295 ,  B01D2201/298 ,  B01D2265/06

    摘要： A filter element includes a first, outer tubular construction of filter media defining a first open filter interior; a second, inner tuber construction of filter media defining a second open filter interior; the second construction of filter media being located within the first open filter interior and being radially spaced from the first construction of filter media; and the second open filter interior defines an unfiltered fluid channel. A plastic inner liner is within the first open filter interior to support the first construction of filter media. A plastic outer liner is within the first open filter interior to support the second construction of filter media. A filtered fluid channel is defined between the inner liner and the outer liner. A brace arrangement is between the first and second tubular constructions. The brace arrangement can include a spring, a plurality of gussets, or a solid spacer.

    摘要翻译： 过滤元件包括限定第一开放过滤器内部的过滤介质的第一外部管状结构; 第二内部块状结构的过滤介质限定第二开放过滤器内部; 过滤介质的第二结构位于第一开放过滤器内部并且与过滤介质的第一结构径向间隔开; 并且第二开放过滤器内部限定未过滤的流体通道。 塑料内衬在第一开放过滤器内部，以支持过滤介质的第一结构。 塑料外层衬垫位于第一开放过滤器内部，以支持过滤介质的第二结构。 过滤的流体通道限定在内衬和外衬套之间。 支架装置位于第一和第二管状结构之间。 支架装置可以包括弹簧，多个角撑板或固体间隔件。

    METHOD, APPARATUS AND COMPUTER PROGRAM PRODUCT FOR SUGGESTING IMPERFECT TIMES FOR CYCLICAL APPOINTMENTS
    5.
    发明申请
    METHOD, APPARATUS AND COMPUTER PROGRAM PRODUCT FOR SUGGESTING IMPERFECT TIMES FOR CYCLICAL APPOINTMENTS 审中-公开
    方法，设备和计算机程序产品，用于建议循环任务的不正确时间

    公开(公告)号：US20120221369A1

    公开(公告)日：2012-08-30

    申请号：US13034153

    申请日：2011-02-24

    申请人： Kent Braatem ,  David Carlson

    发明人： Kent Braatem ,  David Carlson

    IPC分类号： G06Q10/00 ,  G06Q50/00

    CPC分类号： G06Q10/06

    摘要： A method for developing cost-effective pathways for treatment using an evidence-based approach may include enabling suggestions of imperfect times for cyclical appointments may include receiving availability information defining available periods for a healthcare related asset, receiving appointment parameters defining a number and frequency of recurring appointments to be scheduled, determining, via processing circuitry, periods of overlap between the available periods and the appointment parameters, and determining an inconsistent schedule pattern based on the periods of overlap. A corresponding computer program product and apparatus are also provided.

    摘要翻译： 使用基于证据的方法开发用于治疗的成本效益途径的方法可以包括实现周期性约会的不完美时间的建议可以包括接收定义与保健相关资产的可用时段的可用性信息，接收定义重复次数和频率的约定参数 通过处理电路确定可用时间段与预约参数之间的重叠周期，以及基于重叠周期来确定不一致的调度模式。 还提供了相应的计算机程序产品和装置。

    AERIAL ROOF ESTIMATION SYSTEM AND METHOD
    6.
    发明申请
    AERIAL ROOF ESTIMATION SYSTEM AND METHOD 有权
    AERIAL屋顶估计系统和方法

    公开(公告)号：US20100179787A2

    公开(公告)日：2010-07-15

    申请号：US12148439

    申请日：2008-04-17

    申请人： Chris Pershing ,  David Carlson

    发明人： Chris Pershing ,  David Carlson

    IPC分类号： G01B13/20

    CPC分类号： G06Q30/0206 ,  G06Q10/00 ,  G06Q30/0283 ,  G06Q40/08 ,  G06Q50/16

    摘要： A system that allows the remote measurement of the size, geometry, pitch and orientation of the roof sections of a building and then uses the information to provide an estimate to repair or replace the roof, or to install equipment thereon. The system includes an aerial image file database that shows aerial images of buildings in a designated area according to address. The slope and orientation images are typically oblique perspective views and top plan views of the buildings in the area. The system also includes an image analysis and calibration feature that enables the viewer to closely estimate the size, geometry and orientation of the building's roof sections. The information can then be used to prepare a cost estimate for the repair or replacement of the roof or installation of roof equipment. By simply inputting the potential customer's address, the company is able to determine the size, geometry, pitch and orientation of the roof sections of the building at that address, and then quickly provide an accurate estimate to the customer.

    摘要翻译： 允许远程测量建筑物屋顶部分的尺寸，几何形状，俯仰和方向的系统，然后使用该信息来提供对屋顶的修理或更换或在其上安装设备的估计。 该系统包括一个航空图像文件数据库，根据地址显示指定区域内的建筑物的空中图像。 倾斜和定向图像通常是该区域的建筑物的倾斜透视图和俯视图。 该系统还包括图像分析和校准功能，使得观看者可以仔细估计建筑物屋顶部分的尺寸，几何形状和方向。 然后可以使用这些信息来准备屋顶设备的屋顶或安装的修理或更换的成本估算。 通过简单地输入潜在客户的地址，公司能够确定该地址的建筑物屋顶部分的尺寸，几何形状，倾斜度和方向，然后快速为客户提供准确的估计。

    METHODS AND APPARATUS FOR INSITU ANALYSIS OF GASES IN ELECTRONIC DEVICE FABRICATION SYSTEMS
    8.
    发明申请
    METHODS AND APPARATUS FOR INSITU ANALYSIS OF GASES IN ELECTRONIC DEVICE FABRICATION SYSTEMS 有权
    电子设备制造系统气体分析方法与装置

    公开(公告)号：US20080022751A1

    公开(公告)日：2008-01-31

    申请号：US11830832

    申请日：2007-07-30

    申请人： David Carlson ,  Satheesh Kuppurao

    发明人： David Carlson ,  Satheesh Kuppurao

    IPC分类号： G01N33/00 ,  E03B5/00

    CPC分类号： G01N33/0016 ,  Y10T137/85978

    摘要： Systems and methods are disclosed that include adjusting a pressure level of a sample gas in a testing chamber, for example, using a pressurized inert reference gas, and determining a composition of the adjusted sample gas. By adjusting the pressure level of the sample gas, the composition of the sample gas may be determined more accurately than otherwise possible. Numerous other aspects are disclosed.

    摘要翻译： 公开了一种系统和方法，其包括调节测试室中的样品气体的压力水平，例如使用加压的惰性参考气体，以及确定经调节的样品气体的组成。 通过调整样品气体的压力水平，可以比其它方法更准确地确定样品气体的组成。 公开了许多其他方面。

    Low temperature epitaxial growth of silicon-containing films using close proximity UV radiation
    9.
    发明授权
    Low temperature epitaxial growth of silicon-containing films using close proximity UV radiation 有权
    使用接近紫外线辐射的含硅薄膜的低温外延生长

    公开(公告)号：US07262116B2

    公开(公告)日：2007-08-28

    申请号：US11401578

    申请日：2006-04-10

    申请人： Kaushal K. Singh ,  David Carlson ,  Manish Hemkar ,  Satheesh Kuppurao ,  Randhir Thakur

    发明人： Kaushal K. Singh ,  David Carlson ,  Manish Hemkar ,  Satheesh Kuppurao ,  Randhir Thakur

    IPC分类号： H01L21/20

    CPC分类号： H01L21/0262 ,  C23C16/482 ,  C30B25/105 ,  C30B29/06 ,  H01L21/02381 ,  H01L21/02532 ,  H01L21/02639 ,  H01L21/02661

    摘要： A method of preparing a clean substrate surface for blanket or selective epitaxial deposition of silicon-containing and/or germanium-containing films. In addition, a method of growing the silicon-containing and/or germanium-containing films, where both the substrate cleaning method and the film growth method are carried out at a temperature below 750° C., and typically at a temperature from about 700° C. to about 500° C. The cleaning method and the film growth method employ the use of radiation having a wavelength ranging from about 310 nm to about 120 nm in the processing volume in which the silicon-containing film is grown. Use of this radiation in combination with particular partial pressure ranges for the reactive cleaning or film-forming component species enable the substrate cleaning and epitaxial film growth at temperatures below those previously known in the industry.

    摘要翻译： 一种制备用于覆盖或选择性外延沉积含硅和/或含锗膜的清洁衬底表面的方法。 此外，生长含硅和/或含锗膜的方法，其中基板清洗方法和膜生长方法都在低于750℃的温度下进行，通常在约700℃的温度下进行 ℃至约500℃。清洁方法和膜生长方法在其中生长含硅膜的处理体积中使用波长为约310nm至约120nm的辐射。 将该辐射与用于反应性清洁或成膜组分物质的特定分压范围的组合的使用使得能够在低于工业以前已知的温度下进行基材清洗和外延膜生长。