METHOD FOR IMPROVED DIELECTRIC PERFORMANCE
    2.
    发明申请
    METHOD FOR IMPROVED DIELECTRIC PERFORMANCE 审中-公开
    改进电介质性能的方法

    公开(公告)号:US20080044986A1

    公开(公告)日:2008-02-21

    申请号:US11465575

    申请日:2006-08-18

    IPC分类号: H01L21/477

    摘要: A method of decreasing the density of dielectric interface traps in an integrated circuit device. In accordance with the teachings of the present invention, the method includes providing a semiconductor substrate, processing the semiconductor substrate to form an integrated circuit device, such as a field effect transistor including forming a dielectric layer, and heating the dielectric layer in an atmosphere comprising at least one gaseous halogen compound.

    摘要翻译: 一种降低集成电路器件中介质界面阱的密度的方法。 根据本发明的教导,所述方法包括提供半导体衬底,处理半导体衬底以形成集成电路器件,例如包括形成电介质层的场效应晶体管,以及在包括 至少一种气态卤素化合物。