摘要:
A method of fabricating an integrated device on a substrate with an exposed surface region is disclosed. One embodiment provides introducing a first component into the exposed surface region of the substrate. A material is provided on the exposed surface region. The material on the exposed surface region is cured and the first component release from the exposed surface region of the substrate.
摘要:
A method of decreasing the density of dielectric interface traps in an integrated circuit device. In accordance with the teachings of the present invention, the method includes providing a semiconductor substrate, processing the semiconductor substrate to form an integrated circuit device, such as a field effect transistor including forming a dielectric layer, and heating the dielectric layer in an atmosphere comprising at least one gaseous halogen compound.
摘要:
An integrated circuit, which is formed on a semiconductor substrate and which comprises front-end-of-line processed electronic elements and a back-end-of-line processed wiring on top of the electronic elements. The wiring interconnects the electronic elements. The integrated circuit further comprises a highly UV-absorbing layer between the electronic elements and the wiring.
摘要:
For contacting a silicon solar cell a pre-processed silicon substrate with a frontside and a backside is provided. Then, aluminum is deposited on the backside of the pre-processed silicon substrate, wherein aluminum-free regions remain on the backside. Then, a silver-free layer suitable for soldering on the backside of the silicon substrate is deposited so that the silver-free layer suitable for soldering covers at least the aluminum-free regions on the backside.
摘要:
For contacting a silicon solar cell a pre-processed silicon substrate with a frontside and a backside is provided. Then, aluminum is deposited on the backside of the pre-processed silicon substrate, wherein aluminum-free regions remain on the backside. Then, a silver-free layer suitable for soldering on the backside of the silicon substrate is deposited so that the silver-free layer suitable for soldering covers at least the aluminum-free regions on the backside.