Display pixel, display apparatus having an image pixel and method of manufacturing display device
    1.
    发明申请
    Display pixel, display apparatus having an image pixel and method of manufacturing display device 有权
    显示像素,具有图像像素的显示装置和制造显示装置的方法

    公开(公告)号:US20060164566A1

    公开(公告)日:2006-07-27

    申请号:US10538166

    申请日:2003-12-06

    IPC分类号: G02F1/136

    摘要: In a pixel for displays capable of simplifying manufacturing process, a display apparatus having a simplified pixel structure and a method of manufacturing a cost competitive display device, a display pixel includes a channel layer, first to third signal lines, first and second insulating layers and a pixel electrode. The first signal line is formed on the first insulating layer. The first insulating layer insulates the channel layer from the first signal line. The second insulating layer insulates the first signal line from the second and third signal lines, and includes contact holes. The second and third signal lines are connected to the channel layer through the contact holes. The pixel electrode including indium zinc oxide is formed on the identical layer with the first and second signal lines, and disposed on the second insulating layer. Therefore, manufacturing process is simplified and manufacturing time is reduced.

    摘要翻译: 在能够简化制造工艺的显示器的像素中,具有简化的像素结构的显示装置和制造成本竞争力的显示装置的方法,显示像素包括沟道层,第一至第三信号线,第一和第二绝缘层,以及 像素电极。 第一信号线形成在第一绝缘层上。 第一绝缘层使通道层与第一信号线绝缘。 第二绝缘层使第一信号线与第二和第三信号线绝缘,并且包括接触孔。 第二和第三信号线通过接触孔连接到沟道层。 包括氧化铟锌的像素电极形成在与第一和第二信号线相同的层上,并且设置在第二绝缘层上。 因此,制造工序简化,制造时间缩短。

    Display pixel, display apparatus having an image pixel and method of manufacturing display device
    2.
    发明授权
    Display pixel, display apparatus having an image pixel and method of manufacturing display device 有权
    显示像素,具有图像像素的显示装置和制造显示装置的方法

    公开(公告)号:US07920220B2

    公开(公告)日:2011-04-05

    申请号:US10538166

    申请日:2003-12-06

    IPC分类号: G02F1/136

    摘要: In a pixel for displays capable of simplifying manufacturing process, a display apparatus having a simplified pixel structure and a method of manufacturing a cost competitive display device, a display pixel includes a channel layer, first to third signal lines, first and second insulating layers and a pixel electrode. The first signal line is formed on the first insulating layer. The first insulating layer insulates the channel layer from the first signal line. The second insulating layer insulates the first signal line from the second and third signal lines, and includes contact holes. The second and third signal lines are connected to the channel layer through the contact holes. The pixel electrode including indium zinc oxide is formed on the identical layer with the first and second signal lines, and disposed on the second insulating layer. Therefore, manufacturing process is simplified and manufacturing time is reduced.

    摘要翻译: 在能够简化制造工艺的显示器的像素中,具有简化的像素结构的显示装置和制造成本竞争力的显示装置的方法,显示像素包括沟道层,第一至第三信号线,第一和第二绝缘层,以及 像素电极。 第一信号线形成在第一绝缘层上。 第一绝缘层使通道层与第一信号线绝缘。 第二绝缘层使第一信号线与第二和第三信号线绝缘,并且包括接触孔。 第二和第三信号线通过接触孔连接到沟道层。 包括氧化铟锌的像素电极形成在与第一和第二信号线相同的层上,并且设置在第二绝缘层上。 因此,制造工序简化,制造时间缩短。

    Ion implanting apparatus and method for implanting ions
    3.
    发明授权
    Ion implanting apparatus and method for implanting ions 有权
    离子注入装置和离子注入方法

    公开(公告)号:US07791048B2

    公开(公告)日:2010-09-07

    申请号:US11970755

    申请日:2008-01-08

    申请人: Deok-Hoi Kim Chung Yi

    发明人: Deok-Hoi Kim Chung Yi

    IPC分类号: G21K5/10

    摘要: In an ion implanting apparatus and a method for implanting ions are provided. The ion implanting apparatus includes an ion source part, a substrate holding part, a beam current adjusting part, a doping quantity measuring part, and an ion beam control part. The ion source part generates an ion beam. The ion beam is irradiated onto the substrate and the ions are implanted into the substrate. The beam current adjusting part is disposed between the ion source part and the substrate holding part, to adjust a beam current. The doping quantity measuring part is disposed on substantially the same surface as the substrate, to measure ion doping quantity. The ion beam control part is connected to the doping quantity measuring part, to control the ion source part and the beam current adjusting part.

    摘要翻译: 提供离子注入装置和用于注入离子的方法。 离子注入装置包括离子源部,基板保持部,光束电流调整部,掺杂量测量部和离子束控制部。 离子源部分产生离子束。 将离子束照射到衬底上,并将离子注入到衬底中。 光束电流调节部分设置在离子源部分和衬底保持部分之间,以调节光束电流。 掺杂量测量部件设置在与基板基本相同的表面上,以测量离子掺杂量。 离子束控制部分连接到掺杂量测量部分,以控制离子源部分和束电流调节部分。

    THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    5.
    发明申请
    THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    薄膜晶体管基板及其制造方法

    公开(公告)号:US20080197356A1

    公开(公告)日:2008-08-21

    申请号:US12021079

    申请日:2008-01-28

    申请人: Deok-Hoi KIM Chung Yi

    发明人: Deok-Hoi KIM Chung Yi

    摘要: A thin film transistor (TFT) substrate and a method of manufacturing the same in which the surface of a data pattern is implanted with ions to increase the adhesion force with a passivation layer formed by a subsequent process. The TFT substrate includes: an active layer having a channel region formed of a semiconductor and source and drain regions doped with impurities; a data pattern formed on the active layer and including source and drain electrodes, the surface of which is implanted with ions to increase hydrophobicity and roughness; a passivation layer formed on the data pattern and including a pixel contact hole exposing a portion of the drain electrode; and a pixel electrode formed on the passivation layer and connected to the drain electrode through the pixel contact hole, and a method of manufacturing the same.

    摘要翻译: 一种薄膜晶体管(TFT)基板及其制造方法,其中数据图案的表面用离子注入以通过随后的工艺形成的钝化层增加附着力。 TFT基板包括:具有由半导体形成的沟道区域和掺杂有杂质的源极和漏极区域的有源层; 形成在有源层上并包括源极和漏极的数据图案,其表面上注入离子以增加疏水性和粗糙度; 钝化层,其形成在所述数据图案上并且包括暴露所述漏电极的一部分的像素接触孔; 以及形成在钝化层上并通过像素接触孔连接到漏电极的像素电极及其制造方法。

    DISPLAY DEVICES AND METHODS OF MANUFACTURING DISPLAY DEVICES
    7.
    发明申请
    DISPLAY DEVICES AND METHODS OF MANUFACTURING DISPLAY DEVICES 审中-公开
    显示装置和制造显示装置的方法

    公开(公告)号:US20130001565A1

    公开(公告)日:2013-01-03

    申请号:US13326637

    申请日:2011-12-15

    IPC分类号: H01L51/50 H01L51/40

    摘要: A display device includes a gate line, a switching device, a first electrode, an organic light emitting structure and a second electrode. The gate line may include a first conductive layer pattern and a second conductive layer pattern. The first conductive layer pattern may extend along a first direction and the second conductive layer pattern may extend along a second direction. The switching device may be connected to the gate line. The first electrode may be electrically connected to the switching device. The organic light emitting structure may be disposed on the first electrode. The second electrode may be disposed on the organic light emitting structure.

    摘要翻译: 显示装置包括栅极线,开关器件,第一电极,有机发光结构和第二电极。 栅极线可以包括第一导电层图案和第二导电层图案。 第一导电层图案可以沿着第一方向延伸,并且第二导电层图案可以沿着第二方向延伸。 开关器件可以连接到栅极线。 第一电极可以电连接到开关装置。 有机发光结构可以设置在第一电极上。 第二电极可以设置在有机发光结构上。

    METHOD OF MANUFACTURING THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING FLAT PANEL DISPLAY USING THE SAME
    8.
    发明申请
    METHOD OF MANUFACTURING THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING FLAT PANEL DISPLAY USING THE SAME 审中-公开
    制造薄膜晶体管的方法和使用其制造平板显示器的方法

    公开(公告)号:US20110281384A1

    公开(公告)日:2011-11-17

    申请号:US12960744

    申请日:2010-12-06

    IPC分类号: H01L33/42 H01L21/84

    摘要: A method of manufacturing a thin film transistor (TFT) and a method of manufacturing a flat panel display (FPD) using the same. A metal layer made out of Mo having no etch selectivity with a semiconductor layer so that a source electrode, a drain electrode, and an activation layer may be produced using a single mask in a single etch step. The metal layer and the semiconductor layer are simultaneously etched to form the source electrode, the drain electrode, and the activation layer, of a same width so that the area occupied by the TFT may be minimized. When the TFT is applied to the FPD, the maximal aperture ratio of pixels may be obtained and the FPD may be manufactured using only four masks.

    摘要翻译: 一种制造薄膜晶体管(TFT)的方法和使用其制造平板显示器(FPD)的方法。 由Mo制成的金属层与半导体层不具有蚀刻选择性,从而在单个蚀刻步骤中可以使用单个掩模制造源电极,漏电极和活化层。 同时蚀刻金属层和半导体层以形成相同宽度的源电极,漏电极和激活层,使得TFT占据的面积可以最小化。 当TFT施加到FPD时,可以获得像素的最大孔径比,并且可以仅使用四个掩模来制造FPD。

    Touch Screen Panel and Fabrication Method Thereof
    9.
    发明申请
    Touch Screen Panel and Fabrication Method Thereof 有权
    触摸屏面板及其制作方法

    公开(公告)号:US20110227839A1

    公开(公告)日:2011-09-22

    申请号:US12898005

    申请日:2010-10-05

    IPC分类号: G06F3/041 H01J9/24

    CPC分类号: G06F3/044 G06F2203/04111

    摘要: A touch screen panel including: a transparent substrate that incorporate a display region and a non-display region; first sensing patterns that are arranged in a first direction and include first sensing cells and first connection parts; second sensing patterns that are arranged in a second direction and include second sensing cells and second connection parts; an insulating layer that is formed on each of the second connection parts in an island shape; the second sensing cells contact the ends of exposed second connection parts; a plurality of first sensing cells that are arranged on the display region in the first direction intersecting with the second direction; connection parts that connect the adjacent first sensing cells to each other; and metal patterns that are formed in the non-display region and are connected to each of the sensing cells disposed at the ends of the display region.

    摘要翻译: 一种触摸屏面板,包括:包含显示区域和非显示区域的透明基板; 第一感测图案,其布置在第一方向上并且包括第一感测单元和第一连接部分; 第二感测图案,其布置在第二方向上并且包括第二感测单元和第二连接部分; 绝缘层,其形成在岛状的每个所述第二连接部上; 第二感测单元接触暴露的第二连接部分的端部; 多个第一感测单元,其布置在与第二方向相交的第一方向上的显示区域上; 将相邻的第一感测单元彼此连接的连接部件; 以及形成在非显示区域中并连接到设置在显示区域的端部的每个感测单元的金属图案。