公开(公告)号：US20150357026A1

公开(公告)日：2015-12-10

申请号：US14826911

申请日：2015-08-14

Applicant: Renesas Electronics Corporation

Inventor： Kenichi OSADA ,  Koichiro ISHIBASHI ,  Yoshikazu SAITOH ,  Akio NISHIDA ,  Masaru NAKAMICHI ,  Naoki KITAI

IPC: G11C11/412 ,  G11C11/418 ,  H01L27/11

CPC classification number: G11C11/412 ,  G11C11/40 ,  G11C11/413 ,  G11C11/418 ,  H01L21/823475 ,  H01L21/823493 ,  H01L21/823814 ,  H01L21/82385 ,  H01L27/088 ,  H01L27/092 ,  H01L27/105 ,  H01L27/1052 ,  H01L27/11 ,  H01L27/1104 ,  H01L27/1116 ,  H03K19/0016

Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.

Abstract translation: 在最新的工艺中，栅极隧道泄漏电流增加，因此需要减小由用于蜂窝电话的电池驱动的LSI中的栅极隧道泄漏电流，并且需要在 待机模式处于低漏电流。 在半导体集成电路器件中，逻辑和存储电路的接地源电极线保持在有源模式的接地电位，并且在未选择待机模式下保持在比地电位高的电压。 可以减少栅极漏电流而不破坏数据。

公开(公告)号：US20150155031A1

公开(公告)日：2015-06-04

申请号：US14323064

申请日：2014-07-03

Applicant: Renesas Electronics Corporation

Inventor： Kenichi OSADA ,  Koichiro ISHIBASHI ,  Yoshikazu SAITOH ,  Akio NISHIDA ,  Masaru NAKAMICHI ,  Naoki KITAI

IPC: G11C11/412

CPC classification number: G11C11/412 ,  G11C11/40 ,  G11C11/413 ,  G11C11/418 ,  H01L21/823475 ,  H01L21/823493 ,  H01L21/823814 ,  H01L21/82385 ,  H01L27/088 ,  H01L27/092 ,  H01L27/105 ,  H01L27/1052 ,  H01L27/11 ,  H01L27/1104 ,  H01L27/1116 ,  H03K19/0016

Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.

Abstract translation: 在最新的工艺中，栅极隧道泄漏电流增加，因此需要减小由用于蜂窝电话的电池驱动的LSI中的栅极隧道泄漏电流，并且需要在 待机模式处于低漏电流。 在半导体集成电路器件中，逻辑和存储电路的接地源电极线保持在有源模式的接地电位，并且在未选择待机模式下保持在比地电位高的电压。 可以减少栅极漏电流而不破坏数据。

公开(公告)号：US20140312406A1

公开(公告)日：2014-10-23

申请号：US14173074

申请日：2014-02-05

Applicant: Renesas Electronics Corporation

Inventor： Masao INOUE ,  Yoshiki MARUYAMA ,  Akio NISHIDA ,  Yorinobu KUNIMUNE ,  Kota FUNAYAMA

IPC: H01L29/49 ,  H01L29/423 ,  H01L21/28

CPC classification number: H01L29/4925 ,  H01L21/0245 ,  H01L21/02488 ,  H01L21/02502 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/28035 ,  H01L21/28176 ,  H01L21/28273 ,  H01L29/42324 ,  H01L29/4916 ,  H01L29/66825

Abstract: To control a grain growth on laminated polysilicon films, a method of manufacturing a semiconductor device is provided. The method includes: forming a first polysilicon film (21) on a substrate (10); forming an interlayer oxide layer (22) on a surface of the first polysilicon film (21); forming a second polysilicon film (23) in contact with the interlayer oxide layer (22) above the first polysilicon film (21); and performing annealing at a temperature higher than a film formation temperature of the first and second polysilicon films in a gas atmosphere containing nitrogen, after formation of the second polysilicon film (23).

Abstract translation: 为了控制层叠多晶硅膜上的晶粒生长，提供了制造半导体器件的方法。 该方法包括：在衬底（10）上形成第一多晶硅膜（21）; 在所述第一多晶硅膜（21）的表面上形成层间氧化物层（22）; 形成与第一多晶硅膜（21）上方的层间氧化物层（22）接触的第二多晶硅膜（23）。 在形成第二多晶硅膜（23）之后，在含氮气体气氛中，在高于第一和第二多晶硅膜的成膜温度的温度下进行退火。