公开(公告)号：US6071751A

公开(公告)日：2000-06-06

申请号：US123265

申请日：1998-07-28

申请人： Robert M. Wallace ,  Kenneth C. Harvey

发明人： Robert M. Wallace ,  Kenneth C. Harvey

IPC分类号： H01L21/28 ,  H01L21/30 ,  H01L29/76

CPC分类号： H01L21/28176 ,  H01L21/3003

摘要： Channel-hot-carrier reliability can be improved by deuterium sintering. However, the benefits obtained by deuterium sintering can be greatly reduced or destroyed by thermal processing steps which break Si--H and Si--D bonds. A solution is to increase the deuterium concentration near the interface to avoid subsequent depletion of deuterium due to diffusion. By using a rapid quench of a sintered wafer, the deuterium concentration near the interface is increased, because the rapid quench impedes the ability of the deuterium to diffuse away from the gate oxide interface.

摘要翻译： 通过氘烧结可以提高通道 - 热载体的可靠性。 然而，通过破坏Si-H和Si-D键的热处理步骤可以大大减少或破坏氘烧结获得的好处。 解决方案是增加界面附近的氘浓度，以避免由于扩散导致氘的后续耗尽。 通过使用烧结晶片的快速骤冷，界面附近的氘浓度增加，因为快速淬火阻止氘从栅极氧化物界面扩散的能力。

公开(公告)号：US09997325B2

公开(公告)日：2018-06-12

申请号：US12460462

申请日：2009-07-16

申请人： Jimmy W. Hosch ,  Matthew J. Goeckner ,  Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  P.L. Stephan Thamban

发明人： Jimmy W. Hosch ,  Matthew J. Goeckner ,  Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  P.L. Stephan Thamban

IPC分类号： H01J37/06 ,  H01J37/32

CPC分类号： H01J37/06 ,  H01J37/32935 ,  H01J37/32972

摘要： The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam.

公开(公告)号：US06326274B2

公开(公告)日：2001-12-04

申请号：US09788248

申请日：2001-02-15

申请人： Timothy A. Rost ,  Kenneth C. Harvey

发明人： Timothy A. Rost ,  Kenneth C. Harvey

IPC分类号： H01L21336

CPC分类号： H01L21/3003 ,  H01L21/263 ,  H01L21/28176 ,  H01L21/28273

摘要： A method of fabricating a semiconductor device wherein there is provided a semiconductor substrate, preferably of silicon, having a gate insulator thereover, preferably of silicon dioxide, forming a junction, preferably a silicon/silicon dioxide interface, and a gate electrode, preferably of doped polysilicon, over the partially fabricated device. Deuterium is implanted into the structure and the deuterium is caused to diffuse through the device. The device fabrication is then completed.

摘要翻译： 一种制造半导体器件的方法，其中提供了半导体衬底，优选硅，其上具有栅极绝缘体，优选二氧化硅，形成结，优选硅/二氧化硅界面，以及优选掺杂的栅电极 多晶硅，在部分制造的器件上。 将氘注入结构中，使氘扩散通过该装置。 然后完成设备制造。

公开(公告)号：US20090103081A1

公开(公告)日：2009-04-23

申请号：US12151449

申请日：2008-05-06

申请人： Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  John Douglas Corless

发明人： Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  John Douglas Corless

IPC分类号： G01J1/10

CPC分类号： G01J3/443 ,  G01J3/28 ,  G01J2003/2866

摘要： The present invention is directed to a system and method for radiometric calibration of spectroscopy equipment utilized in fault detection and process monitoring. Initially, a reference spectrograph is calibrated to a local primary standard (a calibrated light source with known spectral intensities and traceable to a reference standard). Other spectrographs are then calibrated from the reference spectrograph rather than the local primary calibration standard. This is accomplished by viewing a light source with both the reference spectrograph and the spectrograph to be calibrated. The output from the spectrograph to be calibrated is compared to the output of the reference spectrograph and then adjusted to match that output. The present calibration process can be performed in two stages, the first with the spectrographs calibrated to the reference spectrograph and then are fine tuned to a narrow band light source at the plasma chamber. Alternatively, the reference spectrograph can be calibrated to the local primary standard while optically coupled to the plasma chamber. There, the local primary standard calibration light source is temporarily positioned within the plasma chamber, or in a light chamber disposed along the interior of the chamber for calibrating the reference spectrograph. Other spectrographs can be calibrated to the reference spectrograph while coupled to the plasma chamber with the local primary standard calibration light source, thereby calibrating every component in the entire optical path to the reference spectrograph.

摘要翻译： 本发明涉及用于故障检测和过程监测中的光谱设备的辐射校准的系统和方法。 最初，将参考光谱仪校准为局部主要标准（具有已知光谱强度且可追溯到参考标准的校准光源）。 然后从参考光谱仪而不是本地主要校准标准校准其他光谱仪。 这是通过用参考光谱仪和要校准的光谱仪来观察光源来实现的。 将要校准的光谱仪的输出与参考光谱仪的输出进行比较，然后进行调整以匹配该输出。 本校准过程可以分两个阶段执行，第一阶段是用参考光谱仪校准的光谱仪，然后在等离子体腔室内对窄带光源进行微调。 或者，参考光谱仪可以被校准为局部初级标准，同时光学耦合到等离子体室。 在那里，局部主标准校准光源临时定位在等离子体室内，或者沿着室内设置的光室中，用于校准参考光谱仪。 当使用本地主要标准校准光源耦合到等离子体室时，可以将其他光谱仪校准为参考光谱仪，从而将整个光学路径中的每个分量校准到参考光谱仪。

公开(公告)号：US06291984B1

公开(公告)日：2001-09-18

申请号：US09470149

申请日：1999-12-22

申请人： Vincent W. C. Wong ,  Chris Turl ,  William W. Oldfield ,  Kenneth C. Harvey

发明人： Vincent W. C. Wong ,  Chris Turl ,  William W. Oldfield ,  Kenneth C. Harvey

IPC分类号： G01R1500

CPC分类号： G01R21/10 ,  G01R21/12

摘要： A dual mode power meter provides a first operation mode in the square law operating range of the diode, and a second mode in the square law region as well as the transition and linear operating ranges of the diode. The power meter includes multiple diodes. A manifold made up of power dividers distributes a signal input to the power meter to the diodes. A different attenuation is provided to each diode so that the square law operating range for each diode covers a different power range. By selecting the appropriate diode output for power measurements in the first mode, the overall square law operating range for the power meter will be greater than a power meter using a single diode. The power meter further includes a memory map of voltage vs. power in the square law, transition and linear regions of a diode measured for an unmodulated CW input for the second operation mode. The map of voltage vs. power enables power to be measured faster in the second mode for unmodulated CW signals provided to the power meter which are beyond the square law operating region for the diodes of the power meter.

摘要翻译： 双模功率计在二极管的平方律工作范围内提供第一种工作模式，在平方律区域提供第二种模式以及二极管的过渡和线性工作范围。 功率计包括多个二极管。 由功率分配器组成的歧管将功率计的信号输入分配给二极管。 每个二极管提供不同的衰减，使得每个二极管的平方律工作范围覆盖不同的功率范围。 通过在第一种模式下选择合适的功率测量二极管输出，功率计的总平方律工作范围将大于使用单个二极管的功率计。 功率计还包括对于第二操作模式的未调制的CW输入测量的二极管的平方律，二极管的过渡和线性区域中的电压vs.功率的存储器映射。 电压与功率的映射使得能够在第二模式下对提供给功率计的未调制CW信号进行测量，这些信号超出功率计二极管的平方律运算区域。

公开(公告)号：US4555122A

公开(公告)日：1985-11-26

申请号：US442320

申请日：1982-11-17

申请人： Kenneth C. Harvey

发明人： Kenneth C. Harvey

IPC分类号： B62K3/00 ,  B62K21/00

CPC分类号： B62K3/002 ,  B62K21/00

摘要： A novel scooter-like device enables the user to employ body movements similar to those used in skiing to cause the vehicle to traverse hills, including grass-covered slopes, through pivotally, longitudinally and arcuately slidably linking angular movement of the front locomotion mechanism relative to the longitudinal axis of a fixed central platform to the rear locomotion mechanism in tracking relationship, and in a region under the central portion of the platform.

摘要翻译： 一种新型的踏板车装置使得用户能够采用类似于在滑雪中使用的身体运动，以使车辆通过枢转地，纵向地和弧形地可滑动地连接前运动机构的角运动相对于 固定的中心平台的纵向轴线与后运动机构的跟踪关系，以及平台中心部分下的区域。

公开(公告)号：US08125633B2

公开(公告)日：2012-02-28

申请号：US12151449

申请日：2008-05-06

申请人： Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  John Douglas Corless

发明人： Mike Whelan ,  Andrew Weeks Kueny ,  Kenneth C. Harvey ,  John Douglas Corless

IPC分类号： G01J3/00

CPC分类号： G01J3/443 ,  G01J3/28 ,  G01J2003/2866

摘要： The present invention is directed to a system and method for radiometric calibration of spectroscopy equipment utilized in fault detection and process monitoring. Initially, a reference spectrograph is calibrated to a local primary standard (a calibrated light source with known spectral intensities and traceable to a reference standard). Other spectrographs are then calibrated from the reference spectrograph rather than the local primary calibration standard. This is accomplished by viewing a light source with both the reference spectrograph and the spectrograph to be calibrated. The output from the spectrograph to be calibrated is compared to the output of the reference spectrograph and then adjusted to match that output. The present calibration process can be performed in two stages, the first with the spectrographs calibrated to the reference spectrograph and then are fine tuned to a narrow band light source at the plasma chamber. Alternatively, the reference spectrograph can be calibrated to the local primary standard while optically coupled to the plasma chamber. There, the local primary standard calibration light source is temporarily positioned within the plasma chamber, or in a light chamber disposed along the interior of the chamber for calibrating the reference spectrograph. Other spectrographs can be calibrated to the reference spectrograph while coupled to the plasma chamber with the local primary standard calibration light source, thereby calibrating every component in the entire optical path to the reference spectrograph.

摘要翻译： 本发明涉及用于故障检测和过程监测中的光谱设备的辐射校准的系统和方法。 最初，将参考光谱仪校准为局部主要标准（具有已知光谱强度且可追溯到参考标准的校准光源）。 然后从参考光谱仪而不是本地主要校准标准校准其他光谱仪。 这是通过用参考光谱仪和要校准的光谱仪来观察光源来实现的。 将要校准的光谱仪的输出与参考光谱仪的输出进行比较，然后进行调整以匹配该输出。 本校准过程可以分两个阶段执行，第一阶段是用参考光谱仪校准的光谱仪，然后在等离子体腔室内对窄带光源进行微调。 或者，参考光谱仪可以被校准为局部初级标准，同时光学耦合到等离子体室。 在那里，局部主标准校准光源临时定位在等离子体室内，或者沿着室内设置的光室中，用于校准参考光谱仪。 当使用本地主要标准校准光源耦合到等离子体室时，可以将其他光谱仪校准为参考光谱仪，从而将整个光学路径中的每个分量校准到参考光谱仪。

公开(公告)号：US07630859B2

公开(公告)日：2009-12-08

申请号：US11799516

申请日：2007-05-01

申请人： Kenneth C. Harvey

发明人： Kenneth C. Harvey

IPC分类号： G06F11/30 ,  G06F17/40

CPC分类号： G01J5/02 ,  G01J5/0007 ,  G01J5/026 ,  G01J5/04 ,  G01J5/08 ,  G01J5/0859 ,  G01J5/0875 ,  G01J5/0893 ,  G01N21/15 ,  G01N21/359 ,  G01N21/55 ,  G01N21/73 ,  G01N2021/151 ,  G01N2021/8411

摘要： The present invention is directed to a method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment. One or more clouded viewport windows are obtained for testing, in which the clouding results from exposure to the reactive environment. The clouding typically appears as a coating film on the test windows. The clouded viewport windows are analyzed for one or more spectral regions having good transmission. The threshold level of light transmission is determined by the particular application in which the window is used. The spectral regions of good transmission are evaluated for their usefulness with a particular algorithm that will use the spectral data in a production environment. Spectral regions that cannot be evaluated using the subject algorithm are eliminated from consideration. Spectral regions that can be evaluated using the subject algorithm and exhibit low absorption are selected for monitoring in the production environment.

摘要翻译： 本发明涉及一种用于减少在反应环境中的视口窗口上的窗云影响的方法和装置。 获得一个或多个云端视口窗口，用于测试，其中由于暴露于反应性环境而导致的混浊。 云层通常在测试窗口上显示为涂层膜。 分析具有良好透射的一个或多个光谱区域的云层视口窗口。 光透射的阈值水平由使用窗口的特定应用决定。 使用将在生产环境中使用光谱数据的特定算法来评估良好传输的光谱区域的有用性。 考虑不了使用主题算法评估的光谱区域。 选择可以使用主题算法评估并显示低吸收的光谱区域用于在生产环境中进行监测。

公开(公告)号：US07339682B2

公开(公告)日：2008-03-04

申请号：US11066933

申请日：2005-02-25

申请人： Arun Ananth Aiyer ,  Mark A. Meloni ,  Kenneth C. Harvey ,  Andrew Weeks Kueny

发明人： Arun Ananth Aiyer ,  Mark A. Meloni ,  Kenneth C. Harvey ,  Andrew Weeks Kueny

IPC分类号： G01B9/02

CPC分类号： G01B11/0641

摘要： The present invention is directed to a heterodyne reflectometer system and method for obtaining highly accurate phase shift information from heterodyned optical signals, from which extremely accurate film depths can be calculated. A linearly polarized light comprised of two linearly polarized components that are orthogonal to each other, with split optical frequencies, is directed toward a film causing one of the optical polarization components to lag behind the other due to an increase in the optical path in the film for that component. A pair of detectors receives the beam reflected from the film layer and produces a measurement signal, and the beam prior to incidence on the film layer and generates a reference signal, respectively. The measurement signal and reference signal are analyzed by a phase detector for phase shift. The detected phase shift is then fed into a thickness calculator for film thickness results. A grating interferometer may be included with the heterodyne reflectometer system with a grating, which diffracts the reflected beam into zeroth- and first-order bands, which are then detected by separate detectors. A detector receives the zeroth-order beam and generates another measurement signal. Another detector receives the first-order beam and generates a grating signal. The measurement signal from the grating and reference signal may be analyzed by a phase detector for phase shift, which is related to the thickness of the film. Conversely, either measurement signal may be analyzed with the grating signal by a phase detector for detecting a grating phase shift. The refractive index for the film may be calculated from grating phase shift and the heterodyne phase shift. The updated refractive index is then used for calculating thickness.

摘要翻译： 本发明涉及一种外差反射计系统和方法，用于从外差光信号中获得高精度的相移信息，从而可以计算出非常精确的胶片深度。 由分裂的光学频率彼此正交的两个线性偏振分量组成的线性偏振光指向一个薄膜，导致光学偏振分量之一由于膜中光路的增加而落后于另一个 为该组件。 一对检测器接收从膜层反射的光束并产生测量信号，并且在入射到膜层之前分别产生参考信号。 测量信号和参考信号由相位检测器分析。 然后将检测到的相移馈送到用于膜厚度结果的厚度计算器中。 光栅干涉仪可以与带有光栅的外差反射计系统一起包含，该光栅将反射光束衍射成零级和一级带，然后由单独的检测器检测。 检测器接收零级光束并产生另一测量信号。 另一个检测器接收一阶光束并产生光栅信号。 来自光栅和参考信号的测量信号可以通过用于相移的相位检测器进行分析，这与膜的厚度有关。 相反，可以通过用于检测光栅相移的相位检测器用光栅信号来分析测量信号。 膜的折射率可以通过光栅相移和外差相移来计算。 然后更新的折射率用于计算厚度。

公开(公告)号：US06830939B2

公开(公告)日：2004-12-14

申请号：US10232987

申请日：2002-08-28

申请人： Kenneth C. Harvey ,  Jimmy W. Hosch ,  Neal B. Gallagher ,  Barry M. Wise

发明人： Kenneth C. Harvey ,  Jimmy W. Hosch ,  Neal B. Gallagher ,  Barry M. Wise

IPC分类号： H01L21302

CPC分类号： H01J37/32935 ,  G01N21/73 ,  H01J37/32963

摘要： The present invention is directed to a system, method and software product for creating a predictive model of the endpoint of etch processes using Partial Least Squares Discriminant Analysis (PLS-DA). Calibration data is collected from a calibration wafer using optical emission spectroscopy (OES). The data may be non-periodic or periodic with time and periodic signals may be sampled synchronously or non-synchronously. The OES data is arranged in a spectra matrix X having one row for each data sample. The OES data is processed depending upon whether or not it is synchronous. Synchronous data is arranged in an unfolded spectra matrix X having one row for each period of data samples. A previewed endpoint signal is plotted using wavelengths known to exhibit good endpoint characteristics. Regions of stable intensity values in the endpoint plot that are associated with either the etch region or the post-etch region are identified by sample number. An X-block is created from the processed OES data samples associated with the two regions of stable intensity values. Non-periodic OES data and asynchronously sampled periodic OES data are arranged in a X-block by one sample per row. Synchronously sampled periodic OES data are arranged in the X-block by one period per row. A y-block is created by assigning a discriminate variable value of “1” to OES samples associated with the class, i.e. the etch, and assigning a discriminate value of “0” to all samples not in the class, i.e. the post-etch. A b-vector is regressed from the X- and y-blocks using PLS and is used with the appropriate algorithm for processing real-time OES data from a production etch process for detecting an endpoint.