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公开(公告)号：US11488728B2
公开(公告)日：2022-11-01
申请号：US17179221
申请日：2021-02-18
摘要： A compact, simpler, more economical ICF target chamber and reactor design that maintains a low internal pressure, sub-atmospheric, and very small neutron flux on any pressure bearing vessel or steam generating mechanism. The present invention reduces radiant target emission towards the nearest wall of the hohlraum wall and/or sleeve material so that the radiation from target burn exits the end of the hohlraum through a wall material sufficiently thick to contain the target drive radiation, but becomes transparent to the target emitted radiation. The compact converter contains the energy released by the ICF target and converts it into usable heat to create steam. It also converts the excess neutrons, from the ICF target, into tritium. This is then collected with the unburnt fuel tritium.
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公开(公告)号：US11488729B2
公开(公告)日：2022-11-01
申请号：US17192748
申请日：2021-03-04
摘要： A confinement chamber for Inertial Confinement Fusion (ICF) may include a closed hohlraum and ICF target wherein the ICF target may comprise a central spherical fuel region, inner shell, outer fuel region, outer shell, and propellant region. A multitude of cylindrical beam channels may penetrate the entire thickness of the hohlraum. At the end of each cylindrical beam channel, where they exit the hohlraum, is a hemispherical cavity. Centered in the curvature of each cavity, and coaxial with each beam channel is a gold foam radiator. By layering materials or grading the density of a material in the propellant region of the closed hohlraum ICF target, the pressure profile on the outer shell may be tailored.
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公开(公告)号：US09287011B2
公开(公告)日：2016-03-15
申请号：US13068667
申请日：2011-05-17
摘要： Cylindrical inertial confinement fusion reaction chambers are disclosed according to some embodiments of the invention. These chambers can include neutron moderating/absorbing material, radiation absorbing material, and debris collection material. These chambers can also include various injection ports, nozzles, beam ports, sacrificial layers, absorbers, coolant systems, etc. These chambers can be used with directional and/or omni-directional targets.
摘要翻译： 根据本发明的一些实施例公开了圆柱惯性约束聚变反应室。 这些室可以包括中子调节/吸收材料，辐射吸收材料和碎屑收集材料。 这些腔室还可以包括各种注射口，喷嘴，射束端口，牺牲层，吸收器，冷却剂系统等。这些腔室可以与定向和/或全方位的靶标一起使用。
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4.发明授权公开(公告)号：US07846624B2
公开(公告)日：2010-12-07
申请号：US11676959
申请日：2007-02-20
CPC分类号： G03F9/7023 , G03B27/68 , G03F7/70083 , G03F7/70191 , G03F7/705 , G03F7/70633 , G03F7/70641
摘要： An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer several times. The resulting exposure patterns are measured with a conventional overlay tool. The overlay data is processed with a slope-shift algorithm for the simultaneous determination of both focus and source telecentricity as a function of field position. Additionally, methods for ameliorating metrology induced effects and methods for producing precision Bossung curves are also described. This Abstract is provided for the sole purpose of complying with the Abstract requirement rules, it shall not be used to interpret or to limit the scope or the meaning of the claims.
摘要翻译： 描述了用于光刻步进机和扫描仪同时确定焦距和光源瞄准误差的装置和方法。 包含专门设计用于使用孔板执行光源或出射光瞳划分的盒装盒测试结构的定制阵列的掩模版被暴露在抗蚀剂涂覆的晶片上多次。 所得到的曝光图案用传统的覆盖工具测量。 覆盖数据用斜率移位算法处理，用于同时确定作为场位置的函数的焦点和源远心。 此外，还描述了用于改善计量学诱导效应的方法和用于产生精确Bossung曲线的方法。 本摘要仅用于遵守抽象要求规则，不得用于解释或限制权利要求的范围或含义。
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5.发明授权公开(公告)号：US07671979B2
公开(公告)日：2010-03-02
申请号：US10833557
申请日：2004-04-28
IPC分类号： G01B9/00
CPC分类号： G03F7/70483
摘要： A technique for the determination of dynamic lens field curvature uniquely associated with a photolithographic scanner is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a photolithographic scanner. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that determines the dynamic lens field curvature (ZDLC) perpendicular to the scanning direction in an absolute sense. Furthermore, the effects of wafer flatness, wafer surface non-uniformity, and stage error are considered. The ZDLC information can be used to improve lithographic modeling, overlay modeling, and advanced process control techniques related to scanner stage dynamics.
摘要翻译： 描述了用于确定与光刻扫描仪唯一相关联的动态透镜场曲率的技术。 使用光刻扫描仪在抗蚀剂涂覆的硅晶片上进行一系列光刻曝光。 光刻曝光产生了以独特的方式相对于彼此移位的聚焦基准阵列。 所得到的测量被馈送到绝对意义上决定垂直于扫描方向的动态透镜场曲率（ZDLC）的计算机算法。 此外，考虑了晶片平坦度，晶片表面不均匀性和阶段误差的影响。 ZDLC信息可用于改进与扫描仪阶段动力学相关的光刻建模，叠加建模和高级过程控制技术。
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公开(公告)号：US07286208B2
公开(公告)日：2007-10-23
申请号：US11170414
申请日：2005-06-28
CPC分类号： G03F7/70091 , G03B27/522 , G03F1/44 , G03F7/706 , G03F9/7076
摘要： An in-situ interferometer includes an image modifying optic that produces light ray bundles. The light ray bundles are projected onto a reticle with a plurality of measurement fiducials encoded onto a face of the reticle. The measurement fiducials are exposed onto a sensing plane and their locations measured. Aberrations in the projection system are determined from the measurements of the exposed reticles.
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7.发明授权Apparatus, method of measurement, and method of data analysis for correction of optical system 失效仪器，测量方法，以及光学系统校正数据分析方法
公开(公告)号：US5828455A
公开(公告)日：1998-10-27
申请号：US813742
申请日：1997-03-07
CPC分类号： G03F7/706
摘要： A reticle consisting of a multiplicity of small openings corresponding to separate and distinguishable points is put in the reticle plane. This reticle is imaged down through an opening O in aperture plate AP. A corresponding multiplicity of spots are created at the image plane of the optical system. These spots have spot centroids relative to the original separate and distinguishable points in the reticle. These points, however, are deviated from their diffraction limited positions by the average of grad .phi.(u)) over the corresponding ray bundle. The opening O in the aperture plate samples a discrete portion of the entrance pupil. With points spread out over an area of size 2*NAo*za, ray bundles with chief rays covering the entire entrance pupil will be projected down to image plane IP. The above outlined procedure is extended to analyzing the wavefront at a multiplicity of field points over the entire lens train. The process includes using an aperture plate AP consisting of a multiplicity of openings O. Each opening O is centered underneath a neighborhood of points that is accepted into the entrance pupil of the imaging objective. Points passing through all openings O will produce in the wafer plane a number of spot arrays corresponding to the number of openings O. The totality of all the arrays of spots whose centroids can be measured and reconstructed yields an aberrated wavefront .phi.(u;x) at a number of discrete field points x.
摘要翻译： 将由对应于分离和可区分的多个小开口组成的掩模版放在掩模版平面中。 该光罩通过孔板AP中的开口O向下成像。 在光学系统的像平面上产生相应的多个斑点。 这些斑点相对于光罩中的原始分离和可区分的点具有斑点质心。 然而，这些点在相应的光束上偏离了其衍射受限位置的平均分数Phi（u））。 孔板中的开口O对入射光瞳的离散部分进行采样。 随着点扩展到2 * NAo * za的区域，覆盖整个入口瞳孔的主光线的光束将被投影到图像平面IP。 上述概述的程序扩展到在整个透镜列上的多个场点处分析波前。 该过程包括使用由多个开口O组成的孔板AP。每个开口O居中在接收到成像物镜的入射光瞳的点附近。 穿过所有开口O的点将在晶片平面中产生与开口数目O相对应的多个点阵列。可以测量和重建质心的所有阵列的总数产生像差波前phi（u; x） 在多个离散场点x处。
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公开(公告)号：US5699185A
公开(公告)日：1997-12-16
申请号：US332665
申请日：1994-11-01
CPC分类号： H05K3/0026 , B23K26/042 , B23K26/066 , B23K26/067 , B23K26/082 , B23K26/384 , B23K26/40 , B23K26/402 , G02B5/188 , G03H1/0005 , B23K2203/04 , B23K2203/42 , B23K2203/52 , G03H2001/0094 , G03H2222/33 , G03H2222/36 , H05K2203/056 , H05K2203/107
摘要： The apparatus for machining and material processing includes an excimer laser and a Fresnel zone plate array (FZP) positioned parallel to the workpiece, with the distance between the FZP and the workpiece being the focal length of the FZP. For each hole to be formed on the workpiece a corresponding Fresnel zone is patterned onto the FZP. Each Fresnel zone may be patterned directly centered over the desired hole location or in high density patterns it may be located off-center from the hole with deflection being accomplished by the formation of finer circular arcs on the side of the Fresnel zone opposite the desired direction of deflection. A beam scanner is included to provide a more uniform illumination of the FZP by the laser beam. The scanning eliminates non-uniformity of intensity. The alignment mechanism uses a helium-neon laser, the beam from the which is projected onto a surface relief grating on the workpiece. The reflected light from the surface relief grating is filtered to create interference fringes which, when aligned, provide maximum light intensity projected through a transmission grating on the Fresnel zone plate.
摘要翻译： 用于加工和材料加工的装置包括准分子激光器和平行于工件定位的菲涅耳带状平板阵列（FZP），FZP和工件之间的距离是FZP的焦距。 对于要在工件上形成的每个孔，将相应的菲涅尔区域图案化到FZP上。 每个菲涅尔区域可以直接以所需孔位置为中心图案，或以高密度图案形成图案，其可以位于离开孔的偏心处，偏转通过在菲涅尔区域的与期望方向相反的一侧上形成更细圆弧来实现 的偏转。 包括光束扫描器以通过激光束提供更均匀的FZP照明。 扫描消除了强度的不均匀性。 对准机构使用氦氖激光器，其中投影到工件上的表面浮雕光栅上的光束。 来自表面起伏光栅的反射光被过滤以产生干涉条纹，当对准时，其提供通过菲涅耳带板上的透射光栅投射的最大光强度。
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公开(公告)号：US5523543A
公开(公告)日：1996-06-04
申请号：US303334
申请日：1994-09-09
CPC分类号： G01J1/4257 , B23K26/0622 , B23K26/382 , B23K26/384 , B23K26/40 , B23K26/402 , B23K26/705 , B23K2203/172 , B23K2203/42 , B23K2203/50
摘要： The laser ablation control system and method described is active in starting laser ablation, continuing laser ablation and finally tuning laser ablation in view of product output. First, it provides a means of generating initial settings for laser ablation tool operation utilizing the high predictability of ablation on substrates of known composition. Second, it provides real time monitoring and control of the laser output in terms of the characteristics important to the system performance as it relates to the abalation process. Third, it entails statistical analysis of the photo ablated pattern with correspondent adjustment to abalation parameters. Most importantly, these elements are continuously combined to achieve optimized performance monitored during the ablation process.
摘要翻译： 所描述的激光烧蚀控制系统和方法在起动激光烧蚀，继续激光烧蚀以及最终根据产品输出调谐激光烧蚀方面是有效的。 首先，它提供了一种利用已知组成的基底上的消融的高可预测性来产生用于激光消融工具操作的初始设置的手段。 其次，它可以根据与系统性能相关的特征对激光输出进行实时监测和控制，因为它与曝气过程有关。 第三，需要统计分析照片消融模式，并对相应的参数进行调整。 最重要的是，这些元件被连续组合以实现在消融过程中监测的优化性能。
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公开(公告)号：US5094536A
公开(公告)日：1992-03-10
申请号：US609816
申请日：1990-11-05
IPC分类号： B23Q1/03 , G03F7/20 , H01L21/00 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67288 , B23Q1/032 , G03F7/703 , G03F7/707 , H01L21/681 , H01L21/6875
摘要： The deformable wafter chuck system includes a base with a recess having a diameter slightly smaller than the diameter of the wafer to be held. The base may have one or more orifices or channels running therethrough for distributing a vacuum to secure the wafer to the chuck, or it may have a plurality of clips attached at the rim of the chuck for holding the wafer. Attached to the chuck within the recess is a plurality of distortive actuators, such as piezoelectric crystals, which cause the wafer to be selectively deformed to assume arbitrary shapes, cancelling the warpage of the wafer to permit reduced distortion of the projected pattern. An interferometer system is included to combine light reflected from the wafer surface with a portion of incoming light modulated by a mask or reticle, thereby forming an interference pattern. The interference pattern is sued by a computer to determine warpage-induced distortions to activate the actuators to provide realtime correction of wafer flatness and also permits adjustment of depth of focus by varying heights of portions of the wafer.
摘要翻译： 可变形的夹头卡盘系统包括具有凹部的基部，凹部的直径略小于要保持的晶片的直径。 底座可以具有一个或多个穿过其中的孔或通道，用于分配真空以将晶片固定到卡盘，或者其可以具有附接在卡盘的边缘处的多个夹子用于保持晶片。 在凹部内的卡盘附近是多个变形致动器，例如压电晶体，其使得晶片选择性地变形成任意形状，消除了晶片的翘曲，从而减小了投影图案的变形。 包括干涉仪系统以将从晶片表面反射的光与由掩模或掩模版调制的入射光的一部分组合，从而形成干涉图案。 干扰图案由计算机起诉以确定翘曲引起的失真以激活致动器以提供晶片平坦度的实时校正，并且还允许通过改变晶片部分的高度来调节焦深。
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