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    Accurate measurement of layer dimensions using XRF
    3.
    发明授权
    Accurate measurement of layer dimensions using XRF 有权
    使用XRF精确测量层的尺寸

    公开(公告)号：US07804934B2

    公开(公告)日：2010-09-28

    申请号：US12272050

    申请日：2008-11-17

    申请人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    发明人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    IPC分类号： G01N23/223 ,  G01T1/36

    CPC分类号： G01B15/02 ,  G01N23/223 ,  G01N2223/076 ,  H01L22/12

    摘要： A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.

    摘要翻译： 用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。 测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。 在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。

    Automated selection of X-ray reflectometry measurement locations
    5.
    发明授权
    Automated selection of X-ray reflectometry measurement locations 有权
    自动选择X射线反射测量位置

    公开(公告)号：US07649978B2

    公开(公告)日：2010-01-19

    申请号：US12232259

    申请日：2008-09-12

    申请人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    发明人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    IPC分类号： G01B15/02

    CPC分类号： G01N23/201 ,  G01N2223/052

    摘要： The computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective location. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected location.

    摘要翻译： 用于检查样品的计算机实现的方法包括在样品的表面上限定多个位置，用X射线照射每个位置处的表面，并测量X射线的角度分布， 响应于光束从表面发射，以产生相应的多个X射线光谱。 分析X射线光谱以产生各自的相应的品质因数，表明在相应位置处的X射线光谱的测量质量。 响应于品质因数从多个位置中选择一个或多个位置，并且使用在所选择的位置处测量的X射线光谱来估计样品的性质。

    ACCURATE MEASUREMENT OF LAYER DIMENSIONS USING XRF
    7.
    发明申请
    ACCURATE MEASUREMENT OF LAYER DIMENSIONS USING XRF 有权
    使用XRF精确测量层数

    公开(公告)号：US20090074137A1

    公开(公告)日：2009-03-19

    申请号：US12272050

    申请日：2008-11-17

    申请人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    发明人： Dileep Agnihotri ,  Jeremy O'Dell ,  Isaac Mazor ,  Boris Yokhin

    IPC分类号： G01N23/223

    CPC分类号： G01B15/02 ,  G01N23/223 ,  G01N2223/076 ,  H01L22/12

    摘要： A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.

    摘要翻译： 用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。 测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。 在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。

    Accurate measurement of layer dimensions using XRF
    8.
    发明申请
    Accurate measurement of layer dimensions using XRF 审中-公开
    使用XRF精确测量层的尺寸

    公开(公告)号：US20080049895A1

    公开(公告)日：2008-02-28

    申请号：US11889337

    申请日：2007-08-10

    申请人： Dileep Agnihotri ,  Jeremy O'Dell

    发明人： Dileep Agnihotri ,  Jeremy O'Dell

    IPC分类号： G01N23/223

    CPC分类号： G01N23/223 ,  G01B15/02 ,  G01N2223/076 ,  H01L22/12

    摘要： A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.

    摘要翻译： 用于检查样品的方法包括引导激发光束撞击平面样品的区域，该平面样品的区域包括具有垂直于样品平面的侧壁的特征，该侧壁在其上具有薄膜。 测量响应于激发光束从样品发射的X射线荧光强度（XRF），并且基于强度来评估侧壁上的薄膜的厚度。 在另一种方法中，使用XRF来评估样品的表面层中的凹陷的宽度和抛光后沉积在凹部中的材料的厚度。

    X-ray reflectometry of thin film layers with enhanced accuracy
    9.
    发明授权
    X-ray reflectometry of thin film layers with enhanced accuracy 有权

    公开(公告)号：US07130376B2

    公开(公告)日：2006-10-31

    申请号：US11297837

    申请日：2005-12-07

    申请人： David Berman ,  Alex Dikopoltsev ,  Dileep Agnihotri

    发明人： David Berman ,  Alex Dikopoltsev ,  Dileep Agnihotri

    IPC分类号： G01T1/36 ,  G01N23/201

    CPC分类号： G01B15/02 ,  G01N23/20

    摘要： A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.