-
1.发明授权Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers 失效通过与乙烯基醚反应通过羟基封闭增加成像光致抗蚀剂的差异溶解度的方法
公开(公告)号：US5719003A
公开(公告)日：1998-02-17
申请号：US534565
申请日：1995-09-27
申请人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
发明人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
IPC分类号： G03F7/004 , C09D7/12 , G03F7/022 , G03F7/033 , G03F7/039 , H01L21/027 , H05K3/06 , G03F7/023 , G03F7/38
CPC分类号： G03F7/022
摘要： A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
摘要翻译： 一种光致抗蚀剂组合物，其包含多羟基醇的碱溶性树脂和邻萘醌二叠氮磺酸酯。 光致抗蚀剂的特征在于在光活性化合物上具有至少一部分游离羟基被酸不稳定的封闭基团封端，在裂解时产生氢氧化物。
-
2.发明授权Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers 失效具有通过与乙烯基醚反应通过羟基封闭改善的差异溶解度的光致抗蚀剂组合物
公开(公告)号：US5641604A
公开(公告)日：1997-06-24
申请号：US583223
申请日：1996-01-04
申请人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
发明人： Roger F. Sinta , Daniel Y. Pai , Timothy G. Adams
IPC分类号： G03F7/004 , C09D7/12 , G03F7/022 , G03F7/033 , G03F7/039 , H01L21/027 , H05K3/06 , G03F7/023
CPC分类号： G03F7/022
摘要： A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
摘要翻译： 一种光致抗蚀剂组合物，其包含多羟基醇的碱溶性树脂和邻 - 萘醌二叠氮磺酸酯。 光致抗蚀剂的特征在于在光活性化合物上具有至少一部分游离羟基被酸不稳定的封闭基团封端，在裂解时产生氢氧化物。
-
公开(公告)号：US5858605A
公开(公告)日：1999-01-12
申请号：US812676
申请日：1997-03-08
申请人： Roger F. Sinta , Daniel Y. Pai
发明人： Roger F. Sinta , Daniel Y. Pai
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.
-
公开(公告)号：US5627010A
公开(公告)日：1997-05-06
申请号：US228187
申请日：1994-04-15
IPC分类号： C08G59/40 , C08G59/00 , C08L63/00 , G03F7/004 , G03F7/038 , H05K3/28 , G03C1/73 , G03F7/031 , G03F7/032
CPC分类号： G03F7/038 , G03F7/0045
摘要： A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.
摘要翻译： 辐射敏感组合物，使用所述组合物的方法和用所述组合物涂覆的基材。 可光成像组合物包含光碱产生剂化合物，树脂粘合剂和能够在碱存在下交联的材料。 在优选的方面，本发明提供一种负性水性可显影的可光成像组合物，其包含光碱产生剂化合物，优选为酚类聚合物的树脂粘合剂，包含一种或多种将经历碱引发交联的活性基团的交联剂， 和固化剂。
-
公开(公告)号：US5917024A
公开(公告)日：1999-06-29
申请号：US27168
申请日：1998-02-20
申请人： Roger F. Sinta , Daniel Y. Pai
发明人： Roger F. Sinta , Daniel Y. Pai
IPC分类号： G03F7/022 , H01L21/027 , C07C245/10
CPC分类号： G03F7/022
摘要： A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.
摘要翻译： 包含碱溶性树脂和邻萘醌二叠氮磺酸酯与乙烯基醚的反应产物的光致抗蚀剂组合物。 在使用中，光致抗蚀剂的特征在于使碱溶性树脂上的至少一部分羟基与光活性化合物反应，然后通过酸生成而解封。
-
公开(公告)号：US5384229A
公开(公告)日：1995-01-24
申请号：US879598
申请日：1992-05-07
CPC分类号： G03F7/039 , G03F7/164 , Y10S430/106 , Y10S430/111 , Y10S524/901
摘要： The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-clearable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.
摘要翻译： 本发明提供可光成像的组合物，方法和制品。 特别地，本发明提供了一种方法，其包括将可光成像组合物的涂层电泳施加到导电表面上，所述组合物包含含有一个或多个光致酸不稳定基团的材料。 本发明的可光成像组合物优选包含光致酸产生剂，含有一种或多种可酸性的官能团的材料和含有一种或多种官能团的载体树脂，所述官能团可被或被处理为至少部分电离 。
-
7.发明授权Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether 失效包含碱溶性树脂，醌二叠氮化合物和乙烯基醚的光致抗蚀剂组合物
公开(公告)号：US5648194A
公开(公告)日：1997-07-15
申请号：US510709
申请日：1995-08-03
申请人： Daniel Y. Pai , Robert E. Hawkins
发明人： Daniel Y. Pai , Robert E. Hawkins
CPC分类号： G03F7/0226
摘要： A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition.
摘要翻译： 包含碱溶性树脂，邻萘醌二叠氮磺酸酯光敏化合物和乙烯基醚化合物的光致抗蚀剂组合物。 邻萘醌二叠氮磺酸酯部分地被乙烯基醚组合物替代，以降低光活性化合物的浓度，同时增加组合物的感光速度。
-
公开(公告)号：US5262280A
公开(公告)日：1993-11-16
申请号：US862343
申请日：1992-04-02
IPC分类号： C08G59/68 , C08G59/00 , C09D163/00 , C09D163/08 , G03F7/004 , G03F7/027 , G03F7/038 , H05K3/18 , H05K3/28 , G03C1/73 , G03C5/16
CPC分类号： G03F7/038 , G03F7/0045 , H05K3/287 , Y02P20/582 , Y10T428/24917
摘要： Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions of the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.
-
公开(公告)号：US5691395A
公开(公告)日：1997-11-25
申请号：US274099
申请日：1994-07-12
IPC分类号： C08G59/68 , C08G59/00 , C09D163/00 , C09D163/08 , G03F7/004 , G03F7/027 , G03F7/038 , H05K3/18 , H05K3/28 , B32B3/10 , C08F2/50 , C08J7/04
CPC分类号： G03F7/038 , G03F7/0045 , H05K3/287 , Y02P20/582 , Y10T428/24917
摘要： Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions of the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.
摘要翻译： 辐射敏感组合物，使用组合物的方法和包含该组合物的制品。 本发明的可光成像组合物包含辐射敏感组分，树脂粘合剂和包含一个或多个内部环氧基团的聚丁二烯。 在优选的方面，本发明的组合物还包含交联剂如三聚氰胺或环氧化物质，或其混合物。
-
公开(公告)号：US5314789A
公开(公告)日：1994-05-24
申请号：US770016
申请日：1991-10-01
申请人： Robert E. Hawkins , Daniel Y. Pai
发明人： Robert E. Hawkins , Daniel Y. Pai
IPC分类号： C25D13/06 , C09D5/44 , G03F7/004 , G03F7/027 , G03F7/032 , G03F7/038 , G03F7/16 , G03F7/30 , H05K3/00 , H05K3/06 , G03C1/73
CPC分类号： G03F7/164 , C09D5/44 , G03F7/032 , G03F7/038 , Y10S430/136
摘要： The invention provides radiation sensitive compositions that comprise an amphoteric polymer, the polymer comprising at least two distinct carrier groups so that the polymer is positively polarized or negatively polarized upon treatment with an acid or base, respectively, enabling the compositions to be electrodeposited either anaphoretically or cataphoretically. Employing this amphoteric polymer in a radiation sensitive composition also allows the use of either an acid or base solution to image and remove the deposited composition irrespective of whether the composition was applied cataphoretically or anaphoretically. The compositions of the invention are also suitably formulated as liquid coating compositions or used to form dry film resists.
摘要翻译： 本发明提供了包含两性聚合物的辐射敏感组合物，该聚合物包含至少两个不同的载体基团，使得聚合物分别在用酸或碱处理时被正极化或负极化，使得组合物可以电吸附或电沉积 阴道地 在辐射敏感组合物中使用该两性聚合物还允许使用酸或碱溶液来成像和除去沉积的组合物，而不管组合物是用阴离子还是阴离子施用。 本发明的组合物也适当地配制成液体涂料组合物或用于形成干膜抗蚀剂。
-
-
-
-
-
-
-
-
-
搜索结果
13 条记录 (耗时 0.021 秒)
