Abstract:
A semiconductor device includes a fin structure which vertically protrudes from a substrate and extends in a first direction parallel to a top surface of the substrate. The fin structure includes a lower pattern and an active pattern vertically protruding from a top surface of the lower pattern. The top surface of the lower pattern includes a flat portion substantially parallel to the top surface of the substrate. The lower pattern includes a first sidewall extending in the first direction and a second sidewall extending in a second direction crossing the first direction. The first sidewall is inclined relative to the top surface of the substrate at a first angle greater than a second angle corresponding to the second sidewall that is inclined relative to the top surface of the substrate.
Abstract:
The semiconductor memory device includes first group dies including at least one buffer die, and second group dies including a plurality of memory dies stacked on the first group dies and conveying data through a plurality of TSV lines. Here, at least one of the plurality of memory dies includes a first type ECC circuit which generates transmission parity bits using transmission data to be transmitted to the first group die, and the buffer die includes a second type ECC circuit which corrects, when a transmission error occurs in the transmission data received through the plurality of TSV lines, the transmission error using the transmission parity bits and generates error-corrected data.