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公开(公告)号:US20230274952A1
公开(公告)日:2023-08-31
申请号:US18049954
申请日:2022-10-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: WONSU LEE , Kimoon LEE , Seungjum LEE , Jong san CHANG , Joungwoo HAN
IPC: H01L21/67 , H05H1/24 , F23C13/00 , F23J15/04 , F23J15/06 , F23J15/08 , B01D53/14 , B01D53/18 , B01D53/86 , B01D53/32 , B01D53/75 , B01D45/16
CPC classification number: H01L21/67017 , H05H1/2406 , F23C13/00 , F23J15/04 , F23J15/06 , F23J15/08 , B01D53/1493 , B01D53/1406 , B01D53/1431 , B01D53/18 , B01D53/869 , B01D53/32 , B01D53/75 , B01D45/16 , H05H2245/17 , H05H2242/10 , F23J2219/40 , F23G2204/201 , F23G2202/60 , B01D2252/103 , B01D2259/818
Abstract: A gas treatment system includes a first scrubber, a regenerative catalytic oxidizer (RCO) that treats gas that passes through the first scrubber, a second scrubber that treats the gas that passed through the regenerative catalytic oxidizer, and a dielectric barrier discharge (DBD) plasma reactor that treats the gas that passed through the second scrubber. The regenerative catalytic oxidizer includes a two-bed regenerative catalytic reactor.
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公开(公告)号:US20230173462A1
公开(公告)日:2023-06-08
申请号:US18073293
申请日:2022-12-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Joungwoo HAN , Minkee CHOI , Seongyun RYU , Jongsan CHANG , Myungwon OH , Seungjun LEE
CPC classification number: B01J23/10 , B01J27/02 , B01J21/04 , B01J37/0221 , B01J37/0236 , B01J37/0009 , B01J37/088 , B01J37/03 , B01D53/8662 , B01D2257/2066 , B01D2255/20792 , B01D2255/2063
Abstract: A catalyst for decomposing perfluorinated compounds includes an alumina carrier, at least one metal carried on the alumina carrier and selected from the group consisting of Zn, Ni, W, Zr, Ti, Ga, Nb, Co, Mo, V, Cr, Mn, Fe, and Cu, S carried on the alumina carrier, and rare-earth metals carried on the alumina carrier.
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