PUMP APPARATUS AND SUBSTRATE TREATING APPARATUS

    公开(公告)号:US20180061676A1

    公开(公告)日:2018-03-01

    申请号:US15679631

    申请日:2017-08-17

    Abstract: A drive mechanism deforms two diaphragms to perform alternate increase and decrease in volume of a supply chamber. At this time, the two diaphragms are provided for the single supply chamber. This leads to possibility of suction and feed out of a desired amount of liquid even with limited deformation of the diaphragms. In addition, the two diaphragms achieve suppression in deformation thereof upon suction and feed out of a desired amount of liquid. This allows selection of the diaphragms each with a short stroke, yielding suppressed stagnation and quality degradation of the liquid.

    NOZZLE STANDBY DEVICE AND SUBSTRATE TREATING APPARATUS

    公开(公告)号:US20170128962A1

    公开(公告)日:2017-05-11

    申请号:US15344933

    申请日:2016-11-07

    CPC classification number: B05B3/02 B05B12/02 B05B15/555 H01L21/6715

    Abstract: A first feed section supplies a solvent from a first discharge opening formed in a side surface of a nozzle receiving portion. A cylindrical drain flow path is attached to a bottom surface of the nozzle receiving portion. The drain flow path drains at least a coating solution dispensed from a nozzle placed in the nozzle receiving portion. The drain flow path has a second feed section for adjusting a drain flow rate of the solvent flowing from the nozzle receiving portion and passing through the drain flow path. With the second feed section adjusting the drain flow rate when the solvent flows through the drain flow path, although an inside diameter of the drain flow path is set larger than a diameter of a nozzle dispenser opening, the solvent can be collected stably in the nozzle receiving portion, whereby the solvent can easily be sucked into a nozzle tip.

    PROCESSING LIQUID SUPPLYING APPARATUS AND METHOD OF CONTROLLING PROCESSING LIQUID SUPPLYING APPARATUS

    公开(公告)号:US20180046083A1

    公开(公告)日:2018-02-15

    申请号:US15556517

    申请日:2016-02-12

    CPC classification number: G03F7/30 G03F7/162 G03F7/3021 H01L21/027

    Abstract: Provided downstream of an on-off valve are a needle and a diaphragm that cooperates with the needle. The needle is driven by a motor. A controller causes the motor to move the diaphragm cooperating with the needle for increasing a volume of a flow path downstream of the on-off valve. Accordingly, this allows suck back, leading to prevention of drips of the processing liquid. In addition, the controller causes the motor to move the needle for regulating the flow rate of the processing liquid when the on-off valve is opened. This facilitates flow regulation of the processing liquid by the motor which is current1y made by the operator's sense. Moreover, since prevention of the drips of the processing liquid as well as the flow regulation of the processing liquid are performable with the same motor, a needless configuration is omittable to achieve space saving.

    SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
    6.
    发明申请
    SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD 审中-公开
    基板处理装置和基板处理方法

    公开(公告)号:US20160271655A1

    公开(公告)日:2016-09-22

    申请号:US15070588

    申请日:2016-03-15

    CPC classification number: H01L21/67051 B08B3/02 B08B2203/0264 H01L21/6715

    Abstract: Disclosed is a substrate treating apparatus including a substrate holder, a rotating drive unit, a treatment liquid supplying unit, an exterior cup, and an interior cup. The interior cup is movable between a collection position where the interior cup collects the treatment liquid and a retracting position where the exterior cup collects the treatment liquid, and includes an interior cup main body with an annular contour, a liquid outlet in the interior cup main body for draining the treatment liquid in the interior cup main body, and an exhaust port in the interior cup main body for exhausting gas in the interior cup main body. The exterior cup includes an exterior cup main body with an annular contour, a liquid outlet in the exterior cup main body for draining the treatment liquid in the exterior cup main body, and an exhaust port in the exterior cup main body for exhausting gas in the exterior cup main body.

    Abstract translation: 公开了一种基板处理装置,其包括基板保持件,旋转驱动单元,处理液供给单元,外部杯和内部杯。 内杯可在内杯收集处理液的收集位置和外杯收集处理液的收缩位置之间移动,并且包括具有环形轮廓的内杯主体,内杯主体中的液体出口 用于排出内杯主体中的处理液的主体,以及用于排出内杯主体中的气体的内杯主体中的排气口。 外杯包括具有环形轮廓的外杯主体,外杯主体中的液体出口,用于排出外杯主体中的处理液,以及外杯主体中的排气口, 外杯主体。

    LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

    公开(公告)号:US20200264512A1

    公开(公告)日:2020-08-20

    申请号:US16780943

    申请日:2020-02-04

    Abstract: A development liquid is discharged from a development liquid nozzle having one discharge port extending continuously in one direction to the substrate. The development liquid nozzle is fixed such that the development liquid is supplied to a reference straight line on an upper surface of the substrate, and is fixed such that a liquid receiving region that receives the development liquid on the upper surface of the substrate extends in a direction inclined with respect to the reference straight line, the reference straight line passing through a rotational center of the substrate. The development liquid nozzle is moved in a direction of the reference straight line. The liquid receiving region has one end and another end. The other end is located farther away from the rotational center of the substrate than the one end, and is located farther downstream in the rotation direction of the substrate than the one end.

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