公开(公告)号：US11869778B2

公开(公告)日：2024-01-09

申请号：US17137233

申请日：2020-12-29

Applicant: SEMES CO., LTD.

Inventor： Seungtae Yang ,  Gi Hun Choi ,  Buyoung Jung ,  Gui Su Park

IPC: H01L21/67 ,  B08B3/12 ,  B08B3/08 ,  H01L21/687 ,  C02F9/00 ,  C02F1/00 ,  C02F1/36 ,  C02F1/48

CPC classification number: H01L21/67051 ,  B08B3/08 ,  B08B3/12 ,  C02F9/00 ,  H01L21/68764 ,  C02F1/001 ,  C02F1/36 ,  C02F1/484

Abstract: An apparatus for processing a substrate includes a housing, a support unit that supports the substrate in the housing, a nozzle that dispenses a processing liquid onto the substrate, and a liquid supply unit that supplies the processing liquid to the nozzle. The liquid supply unit includes a container having a storage space in which the processing liquid is stored, a liquid supply tube through which the processing liquid flows from the container to the nozzle, and an ultrasonic-wave application member that applies ultrasonic waves to the processing liquid before the processing liquid is supplied to the nozzle. The ultrasonic-wave application member includes a liquid reservoir having an interior space in which a liquid is received and an ultrasonic generator that applies ultrasonic waves to the liquid received in the liquid reservoir. Part of the liquid supply tube is immersed in the liquid received in the liquid reservoir.

公开(公告)号：US20230211261A1

公开(公告)日：2023-07-06

申请号：US17941018

申请日：2022-09-09

Applicant: SEMES CO., LTD.

Inventor： Seong Hyeon KIM ,  Gi Hun Choi ,  Seung Tae Yang ,  So Young Park ,  Kyung Hwan Min

IPC: B01D29/66 ,  B08B3/02 ,  B08B15/00 ,  B01D29/94 ,  B01D29/90

CPC classification number: B01D29/668 ,  B08B3/02 ,  B08B15/00 ,  B01D29/94 ,  B01D29/90

Abstract: The present disclosure provides a substrate processing apparatus capable of stabilizing the particle level when re-supplying a chemical solution. The substrate processing apparatus includes a circulation line connected to a chemical supply unit to circulate a chemical solution, a filter installed in the circulation line to filter particles in the chemical solution, a supply line connected to a first node of the circulation line and configured to supply the chemical solution to the chamber, and a drain line connected, in the circulation line, to a second node located between the filter and the first node, and configured to drain the chemical solution, the apparatus being configured to operate, during a first duration, from when a pump of the chemical supply unit is restarted after the pump had stopped, to drain the chemical solution that passes through the filter.

公开(公告)号：US11658048B2

公开(公告)日：2023-05-23

申请号：US16906392

申请日：2020-06-19

Applicant: SEMES CO., LTD.

Inventor： Seong Soo Lee ,  Buyoung Jung ,  Gi Hun Choi ,  Myung A Jeon ,  Soo Young Park

IPC: H01L21/67 ,  H01L21/673

CPC classification number: H01L21/6715 ,  H01L21/67253 ,  H01L21/67309

Abstract: An apparatus and a method for performing liquid treatment for a substrate are provided. The apparatus for treating the substrate includes a treating container having a treatment space inside the treating container, a substrate support unit to support a substrate in the treatment space, and a liquid supply unit to supply treatment liquid to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle, a supply line to supply the treatment liquid to the nozzle and having a first valve mounted in the supply line, and a discharge line branching from a branch point which is a point downstream of the first valve in the supply line to discharge the treatment liquid from the supply line, and having a second valve mounted in the discharge line. A valve is absent in an area between the branch point and the nozzle, in the supply line.