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公开(公告)号：US11121161B2
公开(公告)日：2021-09-14
申请号：US16295776
申请日：2019-03-07
Applicant: SONY CORPORATION
Inventor： Itaru Oshiyama , Hiroshi Tanaka
Abstract: The present technology relates to a solid state imaging sensor that is possible to suppress the reflection of incident light with a wide wavelength band. A reflectance adjusting layer is provided on the substrate in an incident direction of the incident light with respect to the substrate such as Si and configured to adjust reflection of the incident light on the substrate. The reflectance adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer. The first layer includes a concavo-convex structure provided on the substrate and a material which is filled into a concave portion of the concavo-convex structure and has a refractive index lower than that of the substrate, and the second layer includes a material having a refractive index lower than that of the first layer. It is possible to reduce the reflection on the substrate such as Si by using the principle of the interference of the thin film. Such a technology can be applied to solid state imaging sensors.
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2.发明申请公开(公告)号：US20140293390A1
公开(公告)日：2014-10-02
申请号：US14301950
申请日：2014-06-11
Applicant: Sony Corporation
Inventor： Kazuya Hayashibe , Hiroshi Tanaka , Teppei Imamura
IPC: G02B26/10
CPC classification number: G02B26/101 , G02B5/30 , G02B26/10 , G02B26/105 , G02B27/0172 , G02B2027/015
Abstract: Disclosed herein is an image display apparatus, including: a light source; and a scanning section adapted to scan a light beam emitted from the light source; the scanning section including (a) a first mirror, (b) a first light deflection section, (c) a second mirror, and (d) a second light deflection section; the second light deflection section including an external light receiving face; the second light deflection section having a plurality of translucent films provided in the inside thereof; the translucent films having a light reflectivity R2 at a wavelength of the light beam which satisfies: R2≦k×{(P2/t2)×tan(ζ2)}1/2 where k is a constant higher 0 but lower than 1, P2 an array pitch of the translucent films, t2 a thickness of the second light deflection section, and ζ2 an angle formed between the light emitting face and the translucent films.
Abstract translation: 本文公开了一种图像显示装置，包括：光源; 以及扫描部，其适于扫描从所述光源发射的光束; 所述扫描部分包括（a）第一反射镜，（b）第一光偏转部分，（c）第二反射镜，和（d）第二光偏转部分; 所述第二光偏转部分包括外部光接收面; 所述第二光偏转部具有设置在其内部的多个透光性膜; 半透明膜具有在光束波长处的光反射率R2，其满足：R2＆nlE; k×{（P2 / t2）×tan（ζ2）} 1/2其中k是高于0但小于1的常数，P2 半透明膜的阵列间距，t2是第二光偏转部的厚度，ζ2是在发光面和透光性膜之间形成的角度。
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3.发明授权Substrate processing method, substrate processing apparatus, and storage medium 有权基板处理方法，基板处理装置和存储介质公开(公告)号：US09362106B2
公开(公告)日：2016-06-07
申请号：US13910249
申请日：2013-06-05
Applicant: Sony Corporation , Tokyo Electron Limited
Inventor： Hayato Iwamoto , Yoshiya Hagimoto , Tomoki Tetsuka , Shinichiro Shimomura , Teruomi Minami , Hiroki Sakurai , Hirotaka Maruyama , Yosuke Kawabuchi , Hiroshi Tanaka
IPC: H01L21/461 , H01L21/02 , H01L21/67 , H01L21/306
CPC classification number: H01L21/02019 , H01L21/02052 , H01L21/30608 , H01L21/6708
Abstract: A wafer is held horizontally and rotated by a substrate holding mechanism. An aqueous alkaline solution is supplied to a wafer by a nozzle and caused to flow from a central portion to a peripheral edge portion of the wafer, thereby etching the wafer. An amount of oxygen, which is equal to or more than the amount of oxygen in atmospheric air involved in the aqueous alkaline solution flowing on the wafer, is previously dissolved in the aqueous alkaline solution.
Abstract translation: 晶片被水平地保持并由基板保持机构旋转。 通过喷嘴将水性碱性溶液供给到晶片，并使其从晶片的中心部分流向周边边缘部分，从而蚀刻晶片。 预先将一定量的氧气等于或大于在流过晶片的碱性水溶液中所涉及的大气中的氧气的量，将其溶解在碱性水溶液中。
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公开(公告)号：US20140246797A1
公开(公告)日：2014-09-04
申请号：US14186038
申请日：2014-02-21
Applicant: Sony Corporation
Inventor： Rie Tsubo , Kazuya Hayashibe , Hiroshi Tazawa , Shunichi Kajiya , Hiroshi Tanaka , Toru Yatabe
IPC: B29D11/00
CPC classification number: B29D11/0048 , B29C33/424 , B29C33/56 , B29C43/021 , B29C59/04 , B29C2043/025 , B29C2059/023
Abstract: A transfer mold includes a body, a first layer, and a second layer. The body has a projecting-and-recessed surface. The first layer contains an inorganic material and is disposed on the projecting-and-recessed surface of the body. The second layer contains fluorine and is disposed on a surface of the first layer. The average of hardness values of the projecting-and-recessed surface on which the first and second layers are disposed is 30 Hv or higher.
Abstract translation: 转移模具包括主体，第一层和第二层。 身体有凹凸表面。 第一层包含无机材料并且设置在主体的凹凸表面上。 第二层含有氟并且设置在第一层的表面上。 配置第一层和第二层的突出凹陷表面的硬度值的平均值为30Hv或更高。
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公开(公告)号：US09937675B2
公开(公告)日：2018-04-10
申请号：US14186038
申请日：2014-02-21
Applicant: Sony Corporation
Inventor： Rie Tsubo , Kazuya Hayashibe , Hiroshi Tazawa , Shunichi Kajiya , Hiroshi Tanaka , Toru Yatabe
CPC classification number: B29D11/0048 , B29C33/424 , B29C33/56 , B29C43/021 , B29C59/04 , B29C2043/025 , B29C2059/023
Abstract: A transfer mold includes a body, a first layer, and a second layer. The body has a projecting-and-recessed surface. The first layer contains an inorganic material and is disposed on the projecting-and-recessed surface of the body. The second layer contains fluorine and is disposed on a surface of the first layer. The average of hardness values of the projecting-and-recessed surface on which the first and second layers are disposed is 30 Hv or higher.
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Patent Agency Ranking
公开(公告)号：US09279980B2
公开(公告)日：2016-03-08
申请号：US14301950
申请日：2014-06-11
Applicant: Sony Corporation
Inventor： Kazuya Hayashibe , Hiroshi Tanaka , Teppei Imamura
CPC classification number: G02B26/101 , G02B5/30 , G02B26/10 , G02B26/105 , G02B27/0172 , G02B2027/015
Abstract: Disclosed herein is an image display apparatus, including: a light source; and a scanning section adapted to scan a light beam emitted from the light source; the scanning section including (a) a first mirror, (b) a first light deflection section, (c) a second mirror, and (d) a second light deflection section; the second light deflection section including an external light receiving face; the second light deflection section having a plurality of translucent films provided in the inside thereof; the translucent films having a light reflectivity R2 at a wavelength of the light beam which satisfies: R2≦k×{(P2/t2)×tan(ζ2)}1/2 where k is a constant higher 0 but lower than 1, P2 an array pitch of the translucent films, t2 a thickness of the second light deflection section, and ζ2 an angle formed between the light emitting face and the translucent films.
Abstract translation: 本文公开了一种图像显示装置，包括：光源; 以及扫描部，其适于扫描从所述光源发射的光束; 扫描部分包括（a）第一反射镜，（b）第一光偏转部分，（c）第二反射镜，和（d）第二光偏转部分; 所述第二光偏转部分包括外部光接收面; 所述第二光偏转部具有设置在其内部的多个透光性膜; 半透明膜具有在光束波长处的光反射率R2，其满足：R2＆nlE; k×{（P2 / t2）×tan（ζ2）} 1/2其中k是高于0但小于1的常数，P2 半透明膜的阵列间距，t2是第二光偏转部的厚度，ζ2是在发光面和透光性膜之间形成的角度。
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公开(公告)号：US09709706B2
公开(公告)日：2017-07-18
申请号：US14186097
申请日：2014-02-21
Applicant: Sony Corporation
Inventor： Shunichi Kajiya , Hiroshi Tazawa , Rie Tsubo , Kazuya Hayashibe , Hiroshi Tanaka , Toru Yatabe
CPC classification number: G02B1/118
Abstract: An optical unit having an antireflection function includes a wave surface having a wavelength equal to or shorter than a wavelength of visible light. The wave surface has a curved plane which curves in a recessed shape between an apex portion and a bottom portion of the wave surface. An inflection point of an area of a cross section obtained by cutting through the wave surface in a plane perpendicular to a direction of vibration of the wave surface is positioned toward the bottom portion of the wave surface from a center of the vibration.
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公开(公告)号：US20140247496A1
公开(公告)日：2014-09-04
申请号：US14186097
申请日：2014-02-21
Applicant: Sony Corporation
Inventor： Shunichi Kajiya , Hiroshi Tazawa , Rie Tsubo , Kazuya Hayashibe , Hiroshi Tanaka , Toru Yatabe
IPC: G02B1/11
CPC classification number: G02B1/118
Abstract: An optical unit having an antireflection function includes a wave surface having a wavelength equal to or shorter than a wavelength of visible light. The wave surface has a curved plane which curves in a recessed shape between an apex portion and a bottom portion of the wave surface. An inflection point of an area of a cross section obtained by cutting through the wave surface in a plane perpendicular to a direction of vibration of the wave surface is positioned toward the bottom portion of the wave surface from a center of the vibration.
Abstract translation: 具有抗反射功能的光学单元包括具有等于或短于可见光波长的波长的波面。 波面具有在波面的顶点部分和底部之间以凹陷形状弯曲的弯曲平面。 通过在与波面的振动方向垂直的平面中切割波面而获得的横截面的区域的拐点从振动的中心朝向波面的底部。
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公开(公告)号：US08810481B2
公开(公告)日：2014-08-19
申请号：US13926931
申请日：2013-06-25
Applicant: Sony Corporation
Inventor： Kazuya Hayashibe , Hiroshi Tanaka , Teppei Imamura
IPC: G09G5/00
CPC classification number: G02B26/101 , G02B5/30 , G02B26/10 , G02B26/105 , G02B27/0172 , G02B2027/015
Abstract: Disclosed herein is an image display apparatus, including: a light source; and a scanning section adapted to scan a light beam emitted from the light source; the scanning section including (a) a first mirror, (b) a first light deflection section, (c) a second mirror, and (d) a second light deflection section; the second light deflection section including an external light receiving face; the second light deflection section having a plurality of translucent films provided in the inside thereof; the translucent films having a light reflectivity R2 at a wavelength of the light beam which satisfies: R2≦k×{(P2/t2)×tan(ζ2)}1/2 where k is a constant higher 0 but lower than 1, P2 an array pitch of the translucent films, t2 a thickness of the second light deflection section, and ζ2 an angle formed between the light emitting face and the translucent films.
Abstract translation: 本文公开了一种图像显示装置，包括：光源; 以及扫描部，其适于扫描从所述光源发射的光束; 扫描部分包括（a）第一反射镜，（b）第一光偏转部分，（c）第二反射镜，和（d）第二光偏转部分; 所述第二光偏转部分包括外部光接收面; 所述第二光偏转部具有设置在其内部的多个透光性膜; 半透明膜具有在光束波长处的光反射率R2，其满足：R2＆nlE; k×{（P2 / t2）×tan（ζ2）} 1/2其中k是高于0但小于1的常数，P2 半透明膜的阵列间距，t2是第二光偏转部的厚度，ζ2是在发光面和透光性膜之间形成的角度。
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公开(公告)号：US10263025B2
公开(公告)日：2019-04-16
申请号：US15574558
申请日：2016-05-20
Applicant: SONY CORPORATION
Inventor： Itaru Oshiyama , Hiroshi Tanaka
Abstract: The present technology relates to a solid state imaging sensor that is possible to suppress the reflection of incident light with a wide wavelength band. A reflectance adjusting layer is provided on the substrate in an incident direction of the incident light with respect to the substrate such as Si and configured to adjust reflection of the incident light on the substrate. The reflectance adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer. The first layer includes a concavo-convex structure provided on the substrate and a material which is filled into a concave portion of the concavo-convex structure and has a refractive index lower than that of the substrate, and the second layer includes a material having a refractive index lower than that of the first layer. It is possible to reduce the reflection on the substrate such as Si by using the principle of the interference of the thin film. Such a technology can be applied to solid state imaging sensors.
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