摘要:
Disclosed is an aqueous chromium deposition solution containing chromium in the trivalent state, from which a bright decorative chromium plate can be advantageously formed. The chromium deposition solution contains (a) a water-soluble trivalent chromium salt; (b) at least one compound selected from unsubstituted and amino- or hydroxy-substituted carboxylic acids and salts thereof; (c) a water-soluble aluminum salt, and; (d) ammonium ion.
摘要:
An image printing apparatus is capable of printing an image at various resolutions, such as 300- and 360-dpi systems. To drive a printhead at a printing position corresponding to the resolution of printing data, information on whether to discharge ink separately in the forward and return passes of the printhead is stored in the storage area of a RAM in advance in correspondence with the main scanning position of the printhead. Data (0 or 1) stored in the RAM is read out by using, as a RAM address input, a count value output from a printhead position detection unit that represents the current position of the printhead. Only when the readout data is 1, a printing position pulse is generated to print an image at an arbitrary resolution. By setting ink discharge positions separately in the forward and return passes, an image can be printed at a high precision.
摘要:
An ITO sintered body according to the present invention has a density thereof of between 90 and 100% and a sintering particle size of between 1 and 20 .mu.m. A proportion of (In.sub.0.6 Sn.sub.0.4).sub.2 O.sub.3 in the ITO sintered body is 10% or below. Such an ITO sintered body is manufactured by mixing an indium oxide powder, whose BET surface area is between 15 and 30 m.sup.2 /g, a BET size/a crystallite size is 2 or below, and an average primary particle size is between 0.03 and 0.1 .mu.m, with tin oxide whose BET surface area is 3 m.sup.2 /g or below, and then by sintering the mixture.
摘要翻译:本发明的ITO烧结体的密度为90〜100%,烧结体的粒径为1〜20μm。 ITO烧结体中(In 0.6 Sn 0.4)2 O 3的比例为10%以下。 这种ITO烧结体通过混合BET表面积为15〜30m 2 / g,BET大小/微晶尺寸为2以下的氧化铟粉末,平均一次粒径为0.03〜0.1 μm,其BET表面积为3m 2 / g以下的氧化锡,然后烧结该混合物。
摘要:
An exposure apparatus for performing exposure processing for a plurality of substrates in accordance with a plurality of jobs, including a first job and a second job to be performed subsequent to the first job, each of the jobs having predetermined operations and exposure parameters necessary for the exposure processing set in advance. The apparatus includes a switching device for switching from the first job to the second job during or after a period of exposure by a final shot of a final substrate of the plurality of substrates, to be exposed in accordance with the first job, and before the exposed final substrate is unloaded from a position at which the final substrate is exposed.
摘要:
An exposure apparatus exposes a substrate to a pattern on a reticle in accordance with a job transferred to the apparatus proper and by executing predetermined calibration processing. The apparatus has a function which, when a job and a reticle used in exposure of a substrate in a current lot are the same as a job and a reticle that were used in exposure of a substrate in a preceding lot, bypasses re-transfer of a job to the apparatus proper and/or the calibration processing in regard to exposure of the current lot.
摘要:
A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination.
摘要:
A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination.
摘要:
A sharpness conversion part is provided in a print inspection apparatus and performs an average-masking operation to weaken a sharpness of object image data to be inspected and that of reference image data. After that, a differential value between these data is acquired. With this operation, an inspection for printing is performed by using image data of which the difference is distinguishable by human's visual property, not considering an invisible differential value which is caused by pixel displacement in subpixel order, and it is therefore possible to efficiently obtain a print inspection result with an accuracy almost as high as that by visual inspection. Thus, a print inspection apparatus can be provided, which is capable of correctly extracting difference to be detected by visual check.
摘要:
A manganeses oxide is provided which is represented by the general formula A.sub.x Mn.sub.2 O.sub.4.nH.sub.2 O, where A is Zn, Mg, Ca, or Co; and if A is Zn, 0
摘要:
An image forming apparatus includes an image forming unit and a main body. The image forming unit is detachably mounted in a main body of the image forming apparatus and has at least a developing device for storing a predetermined developer for forming a desired image. A sensor circuit generates a detection signal upon detection of the state of the developer in the developing device. A connecting section outputs the detection signal to the main body. A transmitting section has a single portion to be connected and transmits, to the main body side, the detection signal and a signal representing a mounting state of the image forming unit, which is generated in accordance with a coupling state of the connecting section with respect to the single portion. A discriminating circuit has a single input terminal for receiving a signal from the single portion of the transmitting section, and discriminates the state of the developer in the developing device and a mounting state of the image forming unit with respect to the main body on the basis of the state of the signal input to the input terminal.