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公开(公告)号：US20230380254A1
公开(公告)日：2023-11-23
申请号：US18191250
申请日：2023-03-28
发明人： Sungsoon IM , Jong Kyu KIM , Hyeon Woong HWANG , Jeong Hyeon PARK , Heemin PARK , Seungyong SONG , Duckjung LEE
CPC分类号： H10K71/80 , H10K71/162
摘要： A method for manufacturing a display device includes providing a donor substrate including a first base substrate and an organic material layer disposed on the first base substrate, etching the organic material layer to form an etched organic material layer using a laser device, providing a display substrate including a second base substrate and a plurality of first electrodes disposed on the second base substrate, aligning the donor substrate and the display substrate such that the etched organic material layer faces the plurality of first electrodes, and transferring the etched organic material layer to the display substrate using an energy generation device.
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公开(公告)号：US20240324433A1
公开(公告)日：2024-09-26
申请号：US18380440
申请日：2023-10-16
发明人： Jeongkuk KIM , Arong KIM , Youngmin MOON , Youngho PARK , Heemin PARK , Sungsoon IM , Wonje CHO , Junho JO
CPC分类号： H10K71/166 , C23C14/042 , H10K71/233
摘要： An apparatus for manufacturing a display device includes a chamber, a mask assembly disposed in the chamber and facing a display substrate, a magnetic force portion which is disposed in the chamber and applies magnetic force to the mask assembly, and a deposition source which is disposed in the chamber, faces the mask assembly and supplies a deposition material so that the deposition material passes through the mask assembly and is deposited on the display substrate, where the mask assembly includes a first mask layer in which a first mask opening is defined, and a second mask layer which is disposed on the first mask layer and in which a second mask opening overlapping the first mask opening is defined, where the second mask layer includes a 2-1st mask portion, and a 2-2nd mask portion protruding from the 2-1st mask portion toward the display substrate.
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公开(公告)号：US20230028524A1
公开(公告)日：2023-01-26
申请号：US17777394
申请日：2020-07-23
发明人： Sungsoon IM , Minho MOON
摘要： A mask includes a mask frame including a first opening part; a first mask disposed on the mask frame and including a second opening part overlapping the first opening part in a plan view; a second mask including a mesh part having a mesh shape overlapping the second opening part in a plan view and disposed on the first mask; and a fixing part disposed on the second mask and extending along an edge of the second mask to surround the mesh part.
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公开(公告)号：US20170029957A1
公开(公告)日：2017-02-02
申请号：US15091913
申请日：2016-04-06
发明人： Youngmin MOON , Sungsoon IM , Minho MOON , Soonchul CHANG
IPC分类号： C23F1/00
CPC分类号： B23K26/384 , B23K26/0093 , B23K26/40 , B23K2103/26 , C23C14/042 , G03F7/004 , H01L21/02063 , H01L21/76804 , H01L51/0011
摘要： A method of manufacturing a mask includes forming a first hole in a base material using a laser, the first hole penetrating through the base material from a first surface to a second surface different than the first surface, and expanding the first hole using an etchant to form a second hole.
摘要翻译： 制造掩模的方法包括：使用激光在基材中形成第一孔，所述第一孔从第一表面贯穿所述基材，与第一表面不同的第二表面，并且使用蚀刻剂使所述第一孔膨胀至 形成第二个洞。
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5.发明公开公开(公告)号：US20230167538A1
公开(公告)日：2023-06-01
申请号：US18160155
申请日：2023-01-26
发明人： Taesung KIM , Yunjong YEO , Hyunmin CHO , Jihee SON , Sungsoon IM
CPC分类号： C23C14/042 , H10K71/166 , H10K59/12
摘要： A method of manufacturing a mask, includes forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer, etching the organic material layer to form a mask sheet including through holes, removing the hard mask on the mask sheet, forming a conductive material layer on the mask sheet, and etching the conductive material layer to form a conductive layer.
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公开(公告)号：US20170198383A1
公开(公告)日：2017-07-13
申请号：US15218526
申请日：2016-07-25
发明人： Soonchul CHANG , Seungyong SONG , Sungsoon IM , Kyuhwan HWANG , Minho MOON , Youngmin MOON
摘要： A mask assembly, a method of manufacturing thereof, and an apparatus including the same are provided. The mask assembly includes a mask sheet. The mask sheet includes a pattern portion having openings, and a welding portion connected to the pattern portion. The welding portion has a particle size different from a particle size of the pattern portion.
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7.发明申请DEPOSITION MASK, METHOD OF MANUFACTURING DEPOSITION MASK, AND METHOD OF MANUFACTURING DISPLAY APPARATUS 有权沉积掩模，制造沉积掩模的方法和制造显示装置的方法公开(公告)号：US20160145762A1
公开(公告)日：2016-05-26
申请号：US14947714
申请日：2015-11-20
发明人： Sungsoon IM , Kyu H. HWANG , Jaesik KIM , Minho MOON , Youngmin MOON , Soonchul CHANG , Taewook KANG
CPC分类号： C25D1/10 , B05B12/20 , B05C21/005 , H01L51/0011
摘要： A deposition mask including a mask body including a plurality of pattern holes; a plurality of protrusions protruding from the mask body; and a plurality of grooves formed in the mask body. A grain size of the mask body is in arrange of about 10 μm to about 1000 μm, and a difference between a maximum height of the plurality of protrusions and a maximum height of the plurality of grooves is equal to or less than 0.5 μm.
摘要翻译： 1.一种沉积掩模，包括具有多个图形孔的掩模体; 从所述面罩主体突出的多个突起; 以及形成在面罩主体中的多个凹槽。 掩模体的晶粒尺寸为约10μm至约1000μm，并且多个突起的最大高度与多个凹槽的最大高度之间的差等于或小于0.5μm。
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公开(公告)号：US20210277512A1
公开(公告)日：2021-09-09
申请号：US17025850
申请日：2020-09-18
发明人： Taesung KIM , Yunjong YEO , Hyunmin CHO , Jihee SON , Sungsoon IM
摘要： A method of manufacturing a mask, includes forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer, etching the organic material layer to form a mask sheet including through holes, removing the hard mask on the mask sheet, forming a conductive material layer on the mask sheet, and etching the conductive material layer to form a conductive layer.
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公开(公告)号：US20200152876A1
公开(公告)日：2020-05-14
申请号：US16563619
申请日：2019-09-06
发明人： In-bae KIM , Minho MOON , Youngho PARK , Sungsoon IM
摘要： Provided is a mask assembly including a mask sheet including a pattern part with at least one opening part, and a welding part connected to the pattern part, and a mask frame with the mask sheet mounted thereon and welded to the welding part. The mask sheet includes a first surface configured to fact the mask frame and a second surface opposite to the first surface. The welding part includes a hatching area in which a surface roughness of the second surface is larger than that of the second surface in the pattern part.
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公开(公告)号：US20180337334A1
公开(公告)日：2018-11-22
申请号：US15724082
申请日：2017-10-03
发明人： Jeongkuk KIM , Youngmin MOON , Sungsoon IM , Kyuhwan HWANG
摘要： A method of manufacturing a deposition mask includes forming a coating layer on a surface of a mask substrate, irradiating a laser beam onto the coating layer to form pattern openings in the mask substrate, and removing a residual film of the coating layer.
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