公开(公告)号：US20230205078A1

公开(公告)日：2023-06-29

申请号：US17889472

申请日：2022-08-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byunghoon LEE ,  Jin Goo PARK ,  Tae-Gon KIM ,  Sanguk PARK ,  Changyoung JEONG ,  Jinho AHN

IPC: G03F1/82 ,  G03F7/20 ,  B08B7/00 ,  B08B11/02 ,  B08B13/00

CPC classification number: G03F1/82 ,  G03F7/70925 ,  B08B7/0028 ,  B08B11/02 ,  B08B13/00

Abstract: A pellicle cleaning apparatus includes a stage to support a pellicle, a particle remover above the stage, the particle remover being configured to remove a particle from a first surface of a pellicle, and the particle remover including a cantilever, and an adhesive material on a bottom surface of the cantilever, and a pressure controller adjacent to the stage, the pressure controller being configured to control a pressure of a fluid on a second surface of the pellicle.

公开(公告)号：US20190390090A1

公开(公告)日：2019-12-26

申请号：US16364847

申请日：2019-03-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Mun Ja KIM ,  Changyoung JEONG

IPC: C09J129/04 ,  C09J11/06 ,  C09J11/04 ,  C09J179/02 ,  G03F1/64

Abstract: An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water.

公开(公告)号：US20230408905A1

公开(公告)日：2023-12-21

申请号：US18299301

申请日：2023-04-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mun Ja KIM ,  Ki Bong NAM ,  Jin Ho YEO ,  Byungchul YOO ,  Ji Beom YOO ,  Changyoung JEONG

IPC: G03F1/62

CPC classification number: G03F1/62

Abstract: A method of manufacturing a pellicle for an extreme ultraviolet exposure includes forming a graphite-containing layer on a catalyst substrate; surface-treating a first surface of the graphite-containing layer to form a first treatment layer; and forming a first passivation layer on the first treatment layer, wherein the forming of the first treatment layer includes removing a C—O—C bond included in the graphite-containing layer through the surface-treating of the first surface.

公开(公告)号：US20220380643A1

公开(公告)日：2022-12-01

申请号：US17884077

申请日：2022-08-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byungchul YOO ,  Byunghoon LEE ,  Myungjun KIM ,  Jikang KIM ,  Jeonghwan MIN ,  Kyoungchae SEO ,  Changyoung JEONG

IPC: C09J163/00 ,  G03F1/82 ,  G03F1/22 ,  B08B3/04

Abstract: An adhesive for an EUV mask includes an epoxy resin composition in an amount of 50 wt % to 80 wt % based on a total weight of the adhesive, the epoxy resin composition including an epoxy resin, a hardener, a toughening agent, a filler, and a curing accelerator, and an inorganic filler in an amount of 20 wt % to 50 wt % based on the total weight of the adhesive, the inorganic filler including one or more of aluminum hydroxide or calcium carbonate.

公开(公告)号：US20220350256A1

公开(公告)日：2022-11-03

申请号：US17672937

申请日：2022-02-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byunghoon LEE ,  Maenghyo CHO ,  Changyoung JEONG ,  Muyoung KIM ,  Junghwan MOON ,  Sungwoo PARK ,  Hyungwoo LEE

IPC: G03F7/20 ,  G03F7/40 ,  H01L21/027 ,  G05B19/4099 ,  G06F30/25

Abstract: A lithography method using a multiscale simulation includes estimating a shape of a virtual resist pattern for a selected resist based on a multiscale simulation; forming a test resist pattern by performing an exposure process on a layer formed of the selected resist; determining whether an error range between the test resist pattern and the virtual resist pattern is in an allowable range; and forming a resist pattern on a patterning object using the selected resist when the error range is in the allowable range. The multiscale simulation may use molecular scale simulation, quantum scale simulation, and a continuum scale simulation, and may model a unit lattice cell of the resist by mixing polymer chains, a photo-acid generator (PAG), and a quencher.

公开(公告)号：US20230399552A1

公开(公告)日：2023-12-14

申请号：US18236515

申请日：2023-08-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Mun Ja KIM ,  Changyoung JEONG

IPC: C09J129/04 ,  C09J11/06 ,  C09J11/04 ,  G03F1/64 ,  C09J179/02

CPC classification number: C09J129/04 ,  C09J11/06 ,  C09J11/04 ,  G03F1/64 ,  C09J179/02 ,  C08K3/36

Abstract: An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water.

公开(公告)号：US20210389662A1

公开(公告)日：2021-12-16

申请号：US17328008

申请日：2021-05-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwanseok SEO ,  Seongsue KIM ,  Changyoung JEONG

IPC: G03F1/26 ,  G03F1/58

Abstract: A phase shift mask for extreme ultraviolet lithography includes a substrate, a reflective layer on the substrate, a capping layer on the reflective layer, a buffer pattern on the capping layer, the buffer pattern including an opening exposing a surface of the capping layer, and an absorber pattern on the buffer pattern, the absorber pattern including a refractive index less than a refractive index of the buffer pattern and a thickness greater than a thickness of the buffer pattern. The buffer pattern includes a material having an etch selectivity with respect to the absorber pattern and the capping layer.

公开(公告)号：US20210032514A1

公开(公告)日：2021-02-04

申请号：US16801677

申请日：2020-02-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byungchul YOO ,  Byunghoon LEE ,  Myungjun KIM ,  Jikang KIM ,  Jeonghwan MIN ,  Kyoungchae SEO ,  Changyoung JEONG

IPC: C09J163/00 ,  G03F1/22 ,  G03F1/82

Abstract: An adhesive for an EUV mask includes an epoxy resin composition in an amount of 50 wt % to 80 wt % based on a total weight of the adhesive, the epoxy resin composition including an epoxy resin, a hardener, a toughening agent, a filler, and a curing accelerator, and an inorganic filler in an amount of 20 wt % to 50 wt % based on the total weight of the adhesive, the inorganic filler including one or more of aluminum hydroxide or calcium carbonate.

公开(公告)号：US20200225573A1

公开(公告)日：2020-07-16

申请号：US16541895

申请日：2019-08-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jong Keun OH ,  Jin-Sang YOON ,  Byungchul YOO ,  Sunpyo LEE ,  Changyoung JEONG

IPC: G03F1/64 ,  G03F7/20

Abstract: A reticle assembly includes a reticle plate; a reticle pattern provided on the reticle plate; and a pellicle member provided on the reticle pattern and the reticle plate. The pellicle member includes: a pellicle provided on the reticle pattern; and a pellicle frame provided on the reticle plate and surrounding the reticle pattern, and supporting the pellicle to be space apart from the reticle pattern and the reticle plate. A thermal expansion coefficient of the pellicle frame is less than six times of a thermal expansion coefficient of the reticle plate