Method and apparatus for displaying a pointer on an external display

    公开(公告)号:US09600088B2

    公开(公告)日:2017-03-21

    申请号:US14167258

    申请日:2014-01-29

    摘要: The present invention relates to a method of displaying a pointer on an external device sharing an output video with a terminal, and an apparatus thereof. A method of controlling display of a pointer by a terminal so that the pointer is displayed on an external device according to an embodiment of the present invention includes transmitting an output video of the terminal to the external device, if a predetermined request exists; detecting a sensing value according to a input performed on a display area; generating a pointer displaying signal used for displaying a pointer at a position corresponding to a position where the detected sensing value is detected on the external device based on the detected sensing value; and transmitting the generated pointer displaying signal to the external device. According to the present invention, since a pointer is displayed on an external device sharing an output video with a terminal, the user may execute a desired function by looking at the external device, without looking at the terminal.

    ELECTROSTATIC CHUCK AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
    2.
    发明申请
    ELECTROSTATIC CHUCK AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME 有权
    用于处理包括其的基材的静电切割机和装置

    公开(公告)号:US20150170951A1

    公开(公告)日:2015-06-18

    申请号:US14108684

    申请日:2013-12-17

    IPC分类号: H01L21/683 H01J37/32

    摘要: An ESC may include a dielectric layer, an electrode, a pedestal, a heater, an adhesive and a protecting ring. The dielectric layer may be configured to support a substrate. The electrode may be disposed in the dielectric layer and is configured to form plasma over the substrate. The pedestal may be disposed under the dielectric layer. The heater may be disposed between the pedestal and the dielectric layer and is configured to heat the substrate. The adhesive may be disposed between the pedestal and the heater, and between the heater and the dielectric layer. The protecting ring may be configured to surround the adhesive. The protecting ring may include a plasma-resistant material.

    摘要翻译: ESC可以包括电介质层,电极,基座,加热器,粘合剂和保护环。 介电层可以被配置为支撑衬底。 电极可以设置在电介质层中并且被配置为在衬底上形成等离子体。 基座可以设置在介电层下方。 加热器可以设置在基座和电介质层之间,并且被配置为加热基底。 粘合剂可以设置在基座和加热器之间,以及加热器和电介质层之间。 保护环可以被配置为围绕粘合剂。 保护环可以包括耐等离子体材料。

    Electrostatic chuck and apparatus for processing a substrate including the same
    4.
    发明授权
    Electrostatic chuck and apparatus for processing a substrate including the same 有权
    静电吸盘和用于处理包含该衬底的衬底的设备

    公开(公告)号:US09583371B2

    公开(公告)日:2017-02-28

    申请号:US14108684

    申请日:2013-12-17

    摘要: An ESC may include a dielectric layer, an electrode, a pedestal, a heater, an adhesive and a protecting ring. The dielectric layer may be configured to support a substrate. The electrode may be disposed in the dielectric layer and is configured to form plasma over the substrate. The pedestal may be disposed under the dielectric layer. The heater may be disposed between the pedestal and the dielectric layer and is configured to heat the substrate. The adhesive may be disposed between the pedestal and the heater, and between the heater and the dielectric layer. The protecting ring may be configured to surround the adhesive. The protecting ring may include a plasma-resistant material.

    摘要翻译: ESC可以包括电介质层,电极,基座,加热器,粘合剂和保护环。 介电层可以被配置为支撑衬底。 电极可以设置在电介质层中并且被配置为在衬底上形成等离子体。 基座可以设置在介电层下方。 加热器可以设置在基座和电介质层之间,并且被配置为加热基底。 粘合剂可以设置在基座和加热器之间,以及加热器和电介质层之间。 保护环可以被配置为围绕粘合剂。 保护环可以包括耐等离子体材料。