公开(公告)号：US20250146917A1

公开(公告)日：2025-05-08

申请号：US19018240

申请日：2025-01-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yoonbum NAM ,  Namkyun KIM ,  Seungbo SHIM ,  Donghyeon NA ,  Naohiko OKUNISHI ,  Dongseok HAN ,  Minyoung HUR ,  Byeongsang KIM ,  Kuihyun YOON

IPC: G01N9/24 ,  H01Q1/40 ,  H01Q9/30

Abstract: An apparatus for measuring parameters of plasma includes a cutoff probe. The cutoff probe includes: a first antenna having a line shape and configured to emit a microwave to the plasma in response to the signal provided by at least one processor; a second antenna having a line shape and configured to generate an electrical signal in response to receiving the microwave emitted by the first antenna and transferred through the plasma; a first insulating layer; a second insulating layer; a first shield; a second shield; an end protection layer covering an end of each of the first insulating layer, the second insulating layer, the first shield, and the second shield; a first antenna protection layer, of insulating nature, covering the first antenna; and a second antenna protection layer, of insulating nature, covering the second antenna.

公开(公告)号：US20240355583A1

公开(公告)日：2024-10-24

申请号：US18431163

申请日：2024-02-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Naohiko OKUNISHI ,  Hyeong Mo KANG ,  Nam Kyun KIM ,  Seong Sik NAM ,  Seung Bo SHIM

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/458 ,  C23C16/509 ,  C23C16/52

CPC classification number: H01J37/32137 ,  C23C16/45565 ,  C23C16/4583 ,  C23C16/509 ,  C23C16/52 ,  H01J37/32183 ,  H01J37/32541

Abstract: A plasma processing apparatus comprises a shower head configured to receive an electrode therein, and a variable impedance controller on the shower head. The variable impedance controller includes a first member spaced apart from the shower head and arranged along a circumference of the shower head, and a second member on the first member and configured to rotate. The variable impedance controller is configured to control an impedance by changing the impedance resulting from the first member and the second member as at least one contact point between the first member and the second member is changed according to rotation of the second member.

公开(公告)号：US20230010881A1

公开(公告)日：2023-01-12

申请号：US17591751

申请日：2022-02-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Byeongsang KIM ,  Dougyong SUNG ,  Sungjin KIM ,  Yunhwan KIM ,  Inseok SEO ,  Seungbo SHIM ,  Naohiko OKUNISHI ,  Minyoung HUR

IPC: G01R27/16 ,  H01L21/683 ,  H01L21/67 ,  C23C16/52 ,  H01L21/66 ,  C23C16/455

Abstract: An impedance measurement jig may include a first contact plate, a second contact plate, a cover plate, a plug, and an analyzer. The first contact plate may make electrical contact with an ESC in a substrate-processing apparatus. The second contact plate may make electrical contact with a focus ring configured to surround the ESC. The cover plate may be configured to cover an upper surface of the substrate-processing apparatus. The plug may be installed at the cover plate to selectively make contact with the first contact plate or the second contact plate. The analyzer may individually apply a power to the first contact plate and the second contact plate through the plug to measure an impedance of the ESC and an impedance of the focus ring. Thus, the impedances of the ESC and the focus ring may be individually measured to inspect the ESC and/or the focus ring.