Abstract:
A composition for preparing a nonlinear optic material including an organic chromophore that is polarized by an electric field, a precursor that can form an inorganic material polymer by a sol-gel reaction, and a compatibilizer that can bind to both the organic chromophore and the inorganic material polymer, wherein the organic chromophore includes a functional group at a terminal end that can bind to both the inorganic material polymer and the compatibilizer, a nonlinear optic material prepared from the composition, a method of preparing the nonlinear optic material, and an electro-optic device including the nonlinear optic material are disclosed.
Abstract:
A poly(amide-imide) copolymer including an amide structural unit having an amide bond in a polymer main chain and an imide structural unit having an imide bond in a polymer main chain, wherein at least one imide structural unit includes a moiety cross-linked to an adjacent polymer main chain through an amide bond.
Abstract:
A poly(amide-imide) copolymer that is a reaction product of a substituted or unsubstituted aromatic diamine having a maximum absorption wavelength in a range from 500 nanometers (nm) to 650 nm in a visible light region, a diamine represented by Chemical Formula 1, a dicarbonyl compound represented by Chemical Formula 2, and a tetracarboxylic acid dianhydride represented by Chemical Formula 3: wherein, in Chemical Formulae 1 to 3, A, R3, R10, R12, R13, X, n7 and n8 are the same as defined in the specification.
Abstract:
A slot extrusion coating method includes: preparing a composition including a condensation polymerization product of a diamine and a mixture of an acid dianhydride or an acid dianhydride and a reactive carbonyl compound, an imidized product thereof, or a mixture thereof, wherein the composition has a viscoelasticity having a tan δ of less than about 96 at a strain of about 1 percent and an angular frequency of more than about 0 to less than about 10 radians per second, and coating the composition on a substrate using a slit coater.
Abstract:
A conductive paste may include a conductive powder, metallic glass, a metal precursor including an element forming a solid solution with the metallic glass, and an organic vehicle, and an electronic device and a solar cell may include an electrode formed using the conductive paste.
Abstract:
A polishing slurry and a method of manufacturing a semiconductor device using the polishing slurry. The polishing slurry includes plate-shaped particles having a Mohs hardness of less than or equal to about 5, and a spherical abrasive. The plate-shaped particles have a thermal conductivity in a dimensional direction of greater than or equal to about 10 W/mK, and the plate-shaped particles have a larger average particle size than the spherical abrasive. Also, the plate-shaped particles and the spherical abrasive are not chemically bonded to the other.
Abstract:
Provided are a polymer nanoparticle, a method of preparing the polymer nanoparticle, and a polishing slurry including the polymer nanoparticle are provided, where the polymer nanoparticle including a mixture of a hydrophobic polymer and a copolymer including both hydrophobic and hydrophilic groups, the hydrophilic group of the copolymer is disposed on an outer surface of the polymer nanoparticle.
Abstract:
A flexible plastic substrate includes a film including a poly(amide-imide) copolymer; and a hard coating layer disposed on a first surface of the film, wherein the hard coating layer includes a crosslinked siloxane copolymer, and wherein the flexible plastic substrate has pencil hardness of greater than or equal to 2H under a vertical load of 1 kilogram according to ASTM D3363, a total light transmittance of greater than or equal to about 89% in a wavelength region of 350 nanometers to 750 nanometers.
Abstract:
A poly(imide-amide) copolymer, which is a product of a reaction between a diamine including an amide structural unit-containing oligomer represented by Chemical Formula 1 and a dianhydride represented by Chemical Formula 3: wherein, groups and variables in Chemical Formulae 1 and 3 are the same as described in the specification.
Abstract:
A composition including a polyamic acid modified with an alkoxysilane group; and an oligo silica compound, wherein the polyamic acid modified with an alkoxysilane group includes a reaction product of (i) a condensation reaction product of an acid anhydride and a diamine, and (ii) a reactive organosilane compound, wherein the oligo silica compound includes a condensation reaction product of an organosilane diol and a an alkoxysilane compound, wherein an amount of silicon atoms in the composition is less than or equal to about 15 wt % based on a total weight of solid contents in the composition.