SLOT EXTRUSION COATING METHODS FOR PRODUCING POLYIMIDE-BASED FILMS
    4.
    发明申请
    SLOT EXTRUSION COATING METHODS FOR PRODUCING POLYIMIDE-BASED FILMS 审中-公开
    用于生产基于聚酰亚胺膜的片材挤出涂布方法

    公开(公告)号:US20160264819A1

    公开(公告)日:2016-09-15

    申请号:US15056273

    申请日:2016-02-29

    Abstract: A slot extrusion coating method includes: preparing a composition including a condensation polymerization product of a diamine and a mixture of an acid dianhydride or an acid dianhydride and a reactive carbonyl compound, an imidized product thereof, or a mixture thereof, wherein the composition has a viscoelasticity having a tan δ of less than about 96 at a strain of about 1 percent and an angular frequency of more than about 0 to less than about 10 radians per second, and coating the composition on a substrate using a slit coater.

    Abstract translation: 狭缝挤出涂布方法包括:制备包含二胺与酸二酐或酸二酐与反应性羰基化合物的混合物的缩聚产物,其酰亚胺化产物或其混合物的组合物,其中组合物具有 在大约1%的应变和大于约0至小于约10弧度/秒的角频率下具有小于约96的tanδ的粘弹性,并使用狭缝涂布机将该组合物涂覆在基底上。

    POLISHING SLURRY, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20250011624A1

    公开(公告)日:2025-01-09

    申请号:US18761170

    申请日:2024-07-01

    Abstract: A polishing slurry and a method of manufacturing a semiconductor device using the polishing slurry. The polishing slurry includes plate-shaped particles having a Mohs hardness of less than or equal to about 5, and a spherical abrasive. The plate-shaped particles have a thermal conductivity in a dimensional direction of greater than or equal to about 10 W/mK, and the plate-shaped particles have a larger average particle size than the spherical abrasive. Also, the plate-shaped particles and the spherical abrasive are not chemically bonded to the other.

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