公开(公告)号：US20210265258A1

公开(公告)日：2021-08-26

申请号：US17316028

申请日：2021-05-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yu-Kyung PARK ,  Seung-kwan RYU ,  Min-seung YOON ,  Yun-seok CHOI

IPC: H01L23/498 ,  H01L25/18 ,  H01L21/48 ,  H01L23/538

Abstract: An interposer includes: a base substrate; an interconnection structure on a top surface of the base substrate and including a metal interconnection pattern; an upper passivation layer on the interconnection structure and having compressive stress; a lower passivation layer under a bottom surface of base substrate, the lower passivation layer having compressive stress that is less than the compressive stress of the upper passivation layer; a lower conductive layer under the lower passivation layer; and a through electrode penetrating the base substrate and the lower passivation layer. The through electrode electrically connects the lower conductive layer to the metal interconnection pattern of the interconnection structure.

公开(公告)号：US20170229412A1

公开(公告)日：2017-08-10

申请号：US15494942

申请日：2017-04-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sun-kyoung SEO ,  Seung-kwan RYU ,  Cha-jea JO ,  Tae-Je CHO

IPC: H01L23/00 ,  H01L23/48 ,  H01L25/065

CPC classification number: H01L24/14 ,  H01L23/481 ,  H01L23/562 ,  H01L24/11 ,  H01L24/13 ,  H01L25/0652 ,  H01L25/0657 ,  H01L25/18 ,  H01L25/50 ,  H01L2224/02331 ,  H01L2224/02375 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05024 ,  H01L2224/05025 ,  H01L2224/05567 ,  H01L2224/0557 ,  H01L2224/11462 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/13018 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13026 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/14051 ,  H01L2224/1415 ,  H01L2224/14181 ,  H01L2224/14519 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/17519 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06555 ,  H01L2225/06565 ,  H01L2225/06582 ,  H01L2225/06589 ,  H01L2924/15311 ,  H01L2924/3511 ,  H01L2924/01047 ,  H01L2924/014 ,  H01L2924/00014

Abstract: The semiconductor chip including a semiconductor device layer including a pad region and a cell region, a plurality of uppermost wirings formed on the semiconductor device layer to be arranged at an equal distance in the cell region, a passivation layer formed in the cell region and the pad region, and a plurality of thermal bumps disposed on the passivation layer to be electrically insulated from the plurality of uppermost wirings may be provided. The semiconductor device layer may include a plurality of through silicon via (TSV) structures in the pad region. The plurality of uppermost wirings may extend in parallel along one direction and have a same width. The passivation layer may cover at least a top surface of the plurality of uppermost wirings in the cell region and includes a top surface having a wave shape.

公开(公告)号：US20200312760A1

公开(公告)日：2020-10-01

申请号：US16563202

申请日：2019-09-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yu-Kyung PARK ,  Seung-kwan RYU ,  Min-seung YOON ,  Yun-seok CHOI

IPC: H01L23/498 ,  H01L25/18 ,  H01L21/48

Abstract: An interposer includes: a base substrate; an interconnection structure on a top surface of the base substrate and including a metal interconnection pattern; an upper passivation layer on the interconnection structure and having compressive stress; a lower passivation layer under a bottom surface of base substrate, the lower passivation layer having compressive stress that is less than the compressive stress of the upper passivation layer; a lower conductive layer under the lower passivation layer; and a through electrode penetrating the base substrate and the lower passivation layer. The through electrode electrically connects the lower conductive layer to the metal interconnection pattern of the interconnection structure.

公开(公告)号：US20170170136A1

公开(公告)日：2017-06-15

申请号：US15236814

申请日：2016-08-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sun-kyoung SEO ,  Seung-kwan RYU ,  Cha-jea JO ,  Tae-Je CHO

IPC: H01L23/00 ,  H01L25/00 ,  H01L21/768 ,  H01L23/48 ,  H01L25/065

CPC classification number: H01L24/14 ,  H01L23/481 ,  H01L24/11 ,  H01L24/13 ,  H01L25/0652 ,  H01L25/0657 ,  H01L25/18 ,  H01L25/50 ,  H01L2224/02331 ,  H01L2224/02375 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05024 ,  H01L2224/05025 ,  H01L2224/05567 ,  H01L2224/0557 ,  H01L2224/11462 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/13018 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13026 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/14051 ,  H01L2224/1415 ,  H01L2224/14181 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/17181 ,  H01L2224/17519 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06555 ,  H01L2225/06565 ,  H01L2225/06582 ,  H01L2225/06589 ,  H01L2924/15311 ,  H01L2924/3511 ,  H01L2924/01047 ,  H01L2924/014 ,  H01L2924/00014

Abstract: The semiconductor chip including a semiconductor device layer including a pad region and a cell region, a plurality of uppermost wirings formed on the semiconductor device layer to be arranged at an equal distance in the cell region, a passivation layer formed in the cell region and the pad region, and a plurality of thermal bumps disposed on the passivation layer to be electrically insulated from the plurality of uppermost wirings may be provided. The semiconductor device layer may include a plurality of through silicon via (TSV) structures in the pad region. The plurality of uppermost wirings may extend in parallel along one direction and have a same width. The passivation layer may cover at least a top surface of the plurality of uppermost wirings in the cell region and includes a top surface having a wave shape.