Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus
    1.
    发明授权
    Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus 有权
    蒸镀装置,气相沉积法和制造有机发光显示装置的方法

    公开(公告)号:US08883267B2

    公开(公告)日:2014-11-11

    申请号:US13431880

    申请日:2012-03-27

    摘要: A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.

    摘要翻译: 一种用于有效地执行沉积工艺以形成具有改善的基板特性的薄膜的蒸镀装置和方法,以及制造有机发光显示装置的方法。 该蒸镀装置具备包括排气口的室, 设置在所述室中的台,并且包括将要设置所述基板的安装表面; 注射部分,其包括至少一个注射开口,气体在与要形成所述薄膜的所述基底的表面平行的方向上被注入; 以及等离子体发生器,其与衬底分离设置以面对衬底。

    VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS
    3.
    发明申请
    VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS 有权
    蒸气沉积装置,蒸发沉积方法和制造有机发光显示装置的方法

    公开(公告)号:US20130017343A1

    公开(公告)日:2013-01-17

    申请号:US13431880

    申请日:2012-03-27

    摘要: A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.

    摘要翻译: 一种用于有效地执行沉积工艺以形成具有改善的基板特性的薄膜的蒸镀装置和方法,以及制造有机发光显示装置的方法。 该蒸镀装置具备包括排气口的室, 设置在所述室中的台,并且包括将要设置所述基板的安装表面; 注射部分,其包括至少一个注射开口,气体在与要形成所述薄膜的所述基底的表面平行的方向上被注入; 以及等离子体发生器,其与衬底分离设置以面对衬底。

    Vapor Deposition Apparatus and Method, and Method of Manufacturing Organic Light Emitting Display Apparatus
    4.
    发明申请
    Vapor Deposition Apparatus and Method, and Method of Manufacturing Organic Light Emitting Display Apparatus 有权
    气相沉积装置和方法以及制造有机发光显示装置的方法

    公开(公告)号:US20130017318A1

    公开(公告)日:2013-01-17

    申请号:US13352191

    申请日:2012-01-17

    摘要: A vapor deposition apparatus, which is capable of performing a thin film deposition process and improving characteristics of a formed thin film, includes: a chamber having an exhaust opening; a stage disposed in the chamber, and comprising a mounting surface on which the substrate may be mounted; an injection unit having at least one injection opening for injecting a gas into the chamber in a direction parallel with a surface of the substrate, on which the thin film is to be formed; a guide member facing the substrate to provide a set or predetermined space between the substrate and the guide member; and a driving unit conveying the stage and the guide member.

    摘要翻译: 能够进行薄膜沉积工艺和改善所形成的薄膜特性的气相沉积设备包括:具有排气口的室; 设置在所述室中的台,并且包括其上可以安装所述基板的安装表面; 注射单元,其具有至少一个注射开口,用于在平行于要形成所述薄膜的所述基底的表面的方向上将气体注入所述腔室; 面向所述基板的引导构件,以在所述基板和所述引导构件之间提供设定的或预定的空间; 以及传送台和引导构件的驱动单元。

    Vapor deposition method
    6.
    发明授权
    Vapor deposition method 有权
    气相沉积法

    公开(公告)号:US08828490B2

    公开(公告)日:2014-09-09

    申请号:US13352191

    申请日:2012-01-17

    IPC分类号: B05D5/12 C23C16/00

    摘要: A vapor deposition apparatus, which is capable of performing a thin film deposition process and improving characteristics of a formed thin film, includes: a chamber having an exhaust opening; a stage disposed in the chamber, and comprising a mounting surface on which the substrate may be mounted; an injection unit having at least one injection opening for injecting a gas into the chamber in a direction parallel with a surface of the substrate, on which the thin film is to be formed; a guide member facing the substrate to provide a set or predetermined space between the substrate and the guide member; and a driving unit conveying the stage and the guide member.

    摘要翻译: 能够进行薄膜沉积工艺和改善所形成的薄膜特性的气相沉积设备包括:具有排气口的室; 设置在所述室中的台,并且包括其上可以安装所述基板的安装表面; 注射单元,其具有至少一个注射开口,用于在平行于要形成所述薄膜的所述基底的表面的方向上将气体注入所述腔室; 面向所述基板的引导构件,以在所述基板和所述引导构件之间提供设定的或预定的空间; 以及传送台和引导构件的驱动单元。

    ROTATING TYPE THIN FILM DEPOSITION APPARATUS AND THIN FILM DEPOSITION METHOD USED BY THE SAME
    8.
    发明申请
    ROTATING TYPE THIN FILM DEPOSITION APPARATUS AND THIN FILM DEPOSITION METHOD USED BY THE SAME 有权
    旋转式薄膜沉积装置及其使用的薄膜沉积方法

    公开(公告)号:US20130115373A1

    公开(公告)日:2013-05-09

    申请号:US13443268

    申请日:2012-04-10

    IPC分类号: C23C16/458

    摘要: A rotating type thin film deposition apparatus having an improved structure that allows continuous deposition, and a thin film deposition method used by the rotating type thin film deposition apparatus are provided. The rotating type thin film deposition apparatus includes a deposition device; a circulation running unit that runs a deposition target on a circulation track via a deposition region of the deposition device; and a support unit that supports the deposition target and moves along the circulation track. Thin layers can be precisely and uniformly formed on the entire surface of a deposition target, and since deposition is performed while a plurality of deposition targets move along a caterpillar track, a working speed is faster compared to a method involving a general reciprocating motion, and the size of the thin film deposition apparatus can be reduced.

    摘要翻译: 提供一种旋转型薄膜沉积设备,其具有能够连续沉积的改进的结构,以及由旋转型薄膜沉积设备使用的薄膜沉积方法。 旋转型薄膜沉积设备包括沉积设备; 循环运行单元,其经由沉积装置的沉积区域在循环轨道上运行沉积靶; 以及支撑单元,其支撑沉积靶并沿着循环轨迹移动。 可以在沉积靶的整个表面上精确均匀地形成薄层,并且由于在多个沉积靶沿着履带轨道移动时进行沉积,与涉及一般往复运动的方法相比,加工速度更快, 可以减小薄膜沉积装置的尺寸。

    Organic Light Emitting Diode Display and Method for Manufacturing the Same
    9.
    发明申请
    Organic Light Emitting Diode Display and Method for Manufacturing the Same 有权
    有机发光二极管显示器及其制造方法

    公开(公告)号:US20130092972A1

    公开(公告)日:2013-04-18

    申请号:US13438574

    申请日:2012-04-03

    IPC分类号: H01L51/52 H01L51/56

    CPC分类号: H01L51/5256 H01L27/3246

    摘要: An organic light emitting diode (OLED) display includes: a substrate; an organic light emitting diode formed on the substrate; a first inorganic layer formed on the substrate and covering the organic light emitting diode; an intermediate layer formed on the first inorganic layer and covering an area relatively smaller than the first inorganic layer; and a second inorganic layer formed on the first inorganic layer and the intermediate layer, and contacting the first inorganic layer at an edge thereof while covering a relatively larger area than the intermediate layer. A third inorganic layer may be formed on the second inorganic layer so as to contact the second inorganic layer at an edge thereof. At least one of the first, second and third inorganic layers is formed by an atomic layer deposition (ALD) method.

    摘要翻译: 有机发光二极管(OLED)显示器包括:基板; 形成在所述基板上的有机发光二极管; 形成在所述基板上并覆盖所述有机发光二极管的第一无机层; 形成在所述第一无机层上并覆盖比所述第一无机层相对小的区域的中间层; 以及形成在所述第一无机层和所述中间层上的第二无机层,并且在覆盖比所述中间层相对较大的区域的边缘处与所述第一无机层接触。 可以在第二无机层上形成第三无机层,以便在其边缘与第二无机层接触。 第一,第二和第三无机层中的至少一个由原子层沉积(ALD)方法形成。

    Thin film deposition apparatus and thin film deposition method using the same
    10.
    发明授权
    Thin film deposition apparatus and thin film deposition method using the same 有权
    薄膜沉积装置和使用其的薄膜沉积方法

    公开(公告)号:US09045826B2

    公开(公告)日:2015-06-02

    申请号:US13613804

    申请日:2012-09-13

    IPC分类号: C23C16/455

    CPC分类号: C23C16/45551

    摘要: In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.

    摘要翻译: 在使用其的薄膜沉积装置和薄膜沉积方法中,制备分别驱动的第一喷射单元和第二喷射单元,驱动第一喷射单元以顺序地将第一沉积源和惰性气体喷射到 衬底,腔室被排出以从腔室中除去未从腔室吸附到衬底上的过量的第一沉积源,驱动第二喷射单元以顺序地将第二沉积源和惰性气体喷射到衬底上, 并且室被排出以从腔室中除去未吸附到基底上的多余的第二沉积源。 当使用薄膜沉积方法时,在沉积期间非常期望的微粒的产生被充分地抑制。