公开(公告)号：US5966765A

公开(公告)日：1999-10-19

申请号：US955292

申请日：1997-10-21

申请人： Satomi Hamada ,  Toshiro Maekawa ,  Toshiya Takeuchi

发明人： Satomi Hamada ,  Toshiro Maekawa ,  Toshiya Takeuchi

IPC分类号： H01L21/00 ,  A46B13/02

CPC分类号： H01L21/67046

摘要： A cleaning apparatus is used for cleaning a thin disk-shaped workpiece such as a semiconductor wafer, a liquid crystal display or the like. The cleaning apparatus comprises a support mechanism for supporting a workpiece and rotating the workpiece about its own axis, and a cleaning member for being in sliding contact with at least one of opposite surfaces of the workpiece. The support mechanism comprises a plurality of spindles, and a plurality of rotatable holding portions provided on upper ends of the spindles and having respective circumferential edges engageable with a circumferential edge of the workpiece. The plurality of spindles are clustered into groups around the workpiece, and two adjacent groups of the spindles are positioned to form a wide spacing between two adjacent groups of the spindles, and a path along which the workpiece is supplied to and removed from the support mechanism is positioned in the wide spacing.

摘要翻译： 清洁装置用于清洁诸如半导体晶片，液晶显示器等的薄盘形工件。 清洁装置包括用于支撑工件并围绕其自身轴线旋转工件的支撑机构，以及用于与工件的相对表面中的至少一个滑动接触的清洁构件。 所述支撑机构包括多个主轴，以及设置在所述主轴的上端上的多个可旋转保持部，并且具有可与所述工件的周向边缘接合的各自的周向边缘。 多个锭子围绕工件聚集成组，并且两个相邻的心轴组被定位成在心轴的两个相邻组之间形成宽的间隔，并且沿工件被提供到支撑机构和从支撑机构移除的路径 位于宽间距。

公开(公告)号：US06221171B1

公开(公告)日：2001-04-24

申请号：US08868889

申请日：1997-06-04

申请人： Toshiro Maekawa ,  Satomi Hamada ,  Riichiro Aoki ,  Shoichi Kodama ,  Hiromi Yajima

发明人： Toshiro Maekawa ,  Satomi Hamada ,  Riichiro Aoki ,  Shoichi Kodama ,  Hiromi Yajima

IPC分类号： G08B102

CPC分类号： H01L21/67051 ,  Y10S134/902

摘要： A method and apparatus for conveying workpiece is used for conveying a workpiece such as a semiconductor wafer, glass substrate or liquid crystal panel between processing apparatuses when the workpiece is processed in a plurality of processing apparatuses. The method includes adjusting the amount of liquid on a surface of a workpiece to a predetermined amount, and conveying the workpiece which retains the predetermined amount of liquid between processes. The surface of the workpiece is kept wet by the liquid on the workpiece. The adjusting includes supplying a sufficient amount of liquid onto the surface of the workpiece which is in a certain state, and removing a certain amount of liquid from the surface of the workpiece.

摘要翻译： 当在多个处理装置中处理工件时，用于输送工件的方法和装置用于在处理装置之间输送诸如半导体晶片，玻璃基板或液晶面板的工件。 该方法包括将工件表面上的液体量调整到预定量，并且在工艺之间输送保留预定量液体的工件。 工件的表面被工件上的液体保持湿润。 该调整包括将足够量的液体供给到处于一定状态的工件的表面上，并从工件的表面去除一定量的液体。

公开(公告)号：US6106635A

公开(公告)日：2000-08-22

申请号：US35770

申请日：1998-03-06

申请人： Satomi Hamada ,  Toshiro Maekawa

发明人： Satomi Hamada ,  Toshiro Maekawa

IPC分类号： B08B1/04 ,  B08B3/02 ,  B08B3/12 ,  B08B1/02 ,  B08B3/04

CPC分类号： B08B1/007 ,  B08B1/04 ,  B08B3/024 ,  B08B3/12 ,  H01L21/67051 ,  B08B2203/0288 ,  Y10S134/902

摘要： A washing method provides a liquid jet washing by jetting a liquid against a rotating thin-plate-shaped workpiece from a nozzle which shifts while being positioned opposite a front or back surface of the workpiece, thus removing dust adhering to the front or back surface and thereby washing the workpiece. The locus of the shifting nozzle is caused to pass in the vicinity of, but not over, the center of rotation of the workpiece. Electronic circuitry present at the central portion of workpiece is prevented from suffering electrostatic breakage caused by collision with washing liquid. At the same time, an appropriate quantity of washing liquid is made to collide with the entire surface of a workpiece, so that the workpiece can be washed satisfactorily.

摘要翻译： 洗涤方法通过从喷嘴喷射液体抵靠旋转的薄板状工件提供液体喷射洗涤，该喷嘴在与工件的前表面或后表面相对定位的同时移动，从而去除附着在前表面或后表面上的灰尘， 从而洗涤工件。 移位喷嘴的轨迹被引导到工件的旋转中心附近但不超过工件的旋转中心。 存在于工件中心部分的电子电路不会受到与洗涤液体碰撞引起的静电破坏。 同时，使适量的洗涤液与工件的整个表面碰撞，从而可以令人满意地清洗工件。

公开(公告)号：US06595220B2

公开(公告)日：2003-07-22

申请号：US09797822

申请日：2001-03-05

申请人： Toshiro Maekawa ,  Satomi Hamada ,  Riichiro Aoki ,  Shoichi Kodama ,  Hiromi Yajima

发明人： Toshiro Maekawa ,  Satomi Hamada ,  Riichiro Aoki ,  Shoichi Kodama ,  Hiromi Yajima

IPC分类号： B08B300

CPC分类号： H01L21/67051 ,  Y10S134/902

摘要： An apparatus for conveying a workpiece as used to convey the workpiece such as a semiconductor wafer, a glass substrate or liquid crystal panel, between processing apparatuses when the workpiece is processed in the plurality of processing apparatuses. The amount of liquid on a surface of a workpiece is adjusted to a predetermined amount, and the workpiece, which retains the predetermined amount of liquid, is conveyed between processes. The adjusting includes both supplying a sufficient amount of liquid onto the surface of the workpiece, which is in a certain state, and removing a certain amount of liquid from the surface of the workpiece.

摘要翻译： 一种用于在多个处理装置中处理工件时在处理装置之间输送用于输送工件（例如半导体晶片，玻璃基板或液晶面板）的工件的装置。 将工件表面上的液体量调整到预定量，并且保持预定量的液体的工件在工艺之间传送。 该调整包括在工件的处于一定状态的表面上提供足够量的液体，并从工件的表面去除一定量的液体。

公开(公告)号：US5860181A

公开(公告)日：1999-01-19

申请号：US716889

申请日：1996-09-20

申请人： Toshiro Maekawa ,  Satomi Hamada ,  Koji Ono ,  Atsushi Shigeta ,  Masako Kodera

发明人： Toshiro Maekawa ,  Satomi Hamada ,  Koji Ono ,  Atsushi Shigeta ,  Masako Kodera

IPC分类号： B08B1/00 ,  B08B1/04 ,  B24B53/007 ,  H01L21/00 ,  H01L21/304 ,  H01L21/687 ,  A46B13/02 ,  A47L25/00

CPC分类号： H01L21/68728 ,  B08B1/00 ,  B08B1/007 ,  B08B1/04 ,  B24B53/017 ,  H01L21/67046 ,  H01L21/67051

摘要： A method of and an apparatus for cleaning workpiece is suitable for cleaning a substrate such as a semiconductor substrate, a glass substrate, or a liquid crystal panel to a high level of cleanliness. The method of cleaning a workpiece comprises the steps of holding a workpiece, scrubbing the workpiece with a cleaning member, and rubbing the cleaning member against a member having a rough surface to carry out a self-cleaning of the cleaning member. The cleaning member which is contaminated by having scrubbed the workpiece is rubbed against the rough surface, and the rough surface scrapes the contaminant off the cleaning member. Therefore, the contaminant can effectively be removed from the cleaning member, and hence the cleaning member has a high self-cleaning effect.

摘要翻译： 用于清洁工件的方法和装置适用于清洁诸如半导体衬底，玻璃衬底或液晶面板的衬底以达到高清洁度。 清洁工件的方法包括以下步骤：保持工件，用清洁构件擦拭工件，并将清洁构件摩擦抵靠具有粗糙表面的构件，以进行清洁构件的自清洁。 被擦洗工件污染的清洁部件与粗糙表面摩擦，粗糙表面将污染物从清洁部件上刮下。 因此，可以有效地从清洁部件去除污染物，因此清洁部件具有高的自清洁效果。

公开(公告)号：US6079073A

公开(公告)日：2000-06-27

申请号：US52948

申请日：1998-04-01

申请人： Toshiro Maekawa

发明人： Toshiro Maekawa

IPC分类号： B08B1/04 ,  H01L21/00 ,  A47L25/00

CPC分类号： H01L21/67051 ,  B08B1/007 ,  B08B1/04 ,  H01L21/67046

摘要： A roll type washer is a primary washer and includes a roll type washing member which rotates in contact with the surface of a semiconductor wafer, and a rotary driving member which rotates the semiconductor wafer. A secondary washer is a pad type washer including a pad washing mechanism which rotates and pivots over the semiconductor surface while in contact with the surface, and a rotary member which rotates the semiconductor wafer.

摘要翻译： 辊式洗衣机是主洗衣机，并且包括与半导体晶片的表面接触旋转的辊式洗涤部件和使半导体晶片旋转的旋转驱动部件。 次级垫圈是垫片式洗衣机，其包括在与表面接触的同时在半导体表面上旋转并且枢转的垫洗涤机构，以及旋转半导体晶片的旋转部件。

公开(公告)号：US5868866A

公开(公告)日：1999-02-09

申请号：US609686

申请日：1996-03-01

申请人： Toshiro Maekawa ,  Koji Ono ,  Manabu Tsujimura

发明人： Toshiro Maekawa ,  Koji Ono ,  Manabu Tsujimura

IPC分类号： B08B1/04 ,  B08B3/02 ,  B08B3/12 ,  G11B23/50 ,  H01L21/00 ,  H01L21/304

CPC分类号： H01L21/6715 ,  B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67046 ,  H01L21/67051 ,  B08B2203/0288 ,  G11B23/505 ,  Y10S134/902

摘要： A method of and an apparatus for cleaning a thin disk-shaped workpiece that is required to have a high degree of cleanliness, e.g., a semiconductor wafer, a glass substrate, a liquid crystal display, or the like. The method of cleaning the workpiece includes a plurality of cleaning steps, and comprises the steps of holding a workpiece, and performing a liquid jet cleaning of a surface of the workpiece in a first portion of plural cleaning steps. The method further comprises the step of performing a liquid jet cleaning of the surface of the workpiece in a latter portion of the plural cleaning steps.

摘要翻译： 用于清洁需要具有高度清洁度的薄盘形工件的方法和装置，例如半导体晶片，玻璃基板，液晶显示器等。 清洁工件的方法包括多个清洁步骤，并且包括保持工件的步骤，并且在多个清洁步骤的第一部分中对工件的表面进行液体喷射清洁。 该方法还包括在多个清洁步骤的后一部分中对工件的表面执行液体喷射清洁的步骤。

公开(公告)号：US5775000A

公开(公告)日：1998-07-07

申请号：US855361

申请日：1997-05-13

申请人： Toshiro Maekawa ,  Ryuji Haraguchi

发明人： Toshiro Maekawa ,  Ryuji Haraguchi

IPC分类号： H01L21/687 ,  F26B17/24

CPC分类号： H01L21/68728 ,  Y10S134/902

摘要： A substrate gripper device for gripping a substrate has a rotatable substrate stage, a plurality of fixing fingers vertically mounted on an outer edge of the rotatable substrate stage and having respective horizontal substrate rests for placing thereon an outer edge of the substrate, and a plurality of swing fingers angularly movably supported on the fixing fingers, respectively, for vertically gripping the substrate in coaction with the fixing fingers. The swing fingers are normally biased to move in a closing direction toward the fixing fingers, respectively, by helical springs acting on the swing fingers. A plurality of opening pins are vertically movably disposed below the swing fingers, respectively, and movable upwardly for angularly moving the swing fingers in the opening direction against biasing forces of the helical springs. An opening mechanism is vertically movably disposed below the substrate stage for simultaneously moving the opening pins upwardly.

摘要翻译： 用于夹持基板的基板夹持器装置具有可旋转的基板台，垂直地安装在可旋转基板台的外边缘上的多个固定指状物，并且具有各自的水平基板支架，用于在其上放置基板的外边缘，以及多个 分别用于以固定指状物方向可移动地支撑在所述固定指状物上的摆动指，用于垂直地夹持所述基板，并与所述固定指状物配合。 摆动指通常被偏置以通过作用在摆动指状物上的螺旋弹簧分别沿闭合方向朝着固定指状物移动。 多个开启销分别垂直地可移动地设置在摆动指状件的下方，并且可向上移动，用于使摆动指沿打开方向角度地移动以抵抗螺旋弹簧的偏压力。 垂直移动地设置在基底台下方的打开机构，用于同时向上移动开口销。

公开(公告)号：USRE37347E1

公开(公告)日：2001-09-04

申请号：US09612542

申请日：2000-07-07

申请人： Toshiro Maekawa ,  Ryuji Haraguchi

发明人： Toshiro Maekawa ,  Ryuji Haraguchi

IPC分类号： F26B1724

CPC分类号： H01L21/68728 ,  Y10S134/902

摘要： A substrate gripper device for gripping a substrate has a rotatable substrate stage, a plurality of fixing fingers vertically mounted on an outer edge of the rotatable substrate stage and having respective horizontal substrate rests for placing thereon an outer edge of the substrate, and a plurality of swing fingers angularly movably supported on the fixing fingers, respectively, for vertically gripping the substrate in coaction with the fixing fingers. The swing fingers are normally biased to move in a closing direction toward the fixing fingers, respectively, by helical springs acting on the swing fingers. A plurality of opening pins are vertically movably disposed below the swing fingers, respectively, and movable upwardly for angularly moving the swing fingers in the opening direction against biasing forces of the helical springs. An opening mechanism is vertically movably disposed below the substrate stage for simultaneously moving the opening pins upwardly.

摘要翻译： 用于夹持基板的基板夹持器装置具有可旋转的基板台，垂直地安装在可旋转基板台的外边缘上的多个固定指状物，并且具有各自的水平基板支架，用于在其上放置基板的外边缘，以及多个 分别用于以固定指状物方向可移动地支撑在所述固定指状物上的摆动指，用于垂直地夹持所述基板，并与所述固定指状物配合。 摆动指通常被偏置以通过作用在摆动指状物上的螺旋弹簧分别沿闭合方向朝着固定指状物移动。 多个开启销分别垂直地可移动地设置在摆动指状件的下方，并且可向上移动，用于使摆动指沿打开方向角度地移动以抵抗螺旋弹簧的偏压力。 垂直移动地设置在基底台下方的打开机构，用于同时向上移动开口销。

公开(公告)号：US20070012415A1

公开(公告)日：2007-01-18

申请号：US10569511

申请日：2004-08-24

申请人： Masayuki Tsuchiya ,  Hiroaki Ueno ,  Chiaki Ushigome ,  Toshiro Maekawa ,  Syuichi Shikai

发明人： Masayuki Tsuchiya ,  Hiroaki Ueno ,  Chiaki Ushigome ,  Toshiro Maekawa ,  Syuichi Shikai

IPC分类号： B22D17/10

CPC分类号： B22C9/06 ,  B22D17/007

摘要： Disclosed is an apparatus for and a method of thixocasting a cast iron, that can effectively prevent the scale from mixing in the die (cavity) thereby to obtain sound iron castings having good mechanical properties. The apparatus includes at least a pair of dies that can freely opened and closed to define a cavity to be filled under a pressure, and an injector that injects the semi-molten iron into the cavity through a hole in a gate at the entry of the cavity so as to throttle the entry. The gate is a separate member disposed at the entry of the cavity every time an injection casting operation is carried out and is taken out together with the casting after the injection casting operation.

摘要翻译： 本发明公开了一种能够有效地防止鳞片在模具（空腔）中混合从而获得具有良好机械性能的铁铸件的铸铁镶嵌装置和方法。 该装置包括至少一对可以自由地打开和关闭以限定要在压力下填充的空腔的模具;以及喷射器，其通过门中的孔将半熔融铁注入空腔中 以便节流入口。 闸门是每次执行注射操作时设置在空腔入口处的单独构件，并且在注射铸造操作之后与铸件一起取出。