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    WET ETCHING METHOD USING ULTRAVIOLET LIGHT AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    1.
    发明申请
    WET ETCHING METHOD USING ULTRAVIOLET LIGHT AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
    使用紫外光的湿蚀刻方法和制造半导体器件的方法

    公开(公告)号：US20080113518A1

    公开(公告)日：2008-05-15

    申请号：US11964794

    申请日：2007-12-27

    申请人： Satoshi Kume ,  Nobuyuki Hishinuma ,  Hiroshi Sugahara

    发明人： Satoshi Kume ,  Nobuyuki Hishinuma ,  Hiroshi Sugahara

    IPC分类号： H01L21/302

    CPC分类号： H01L21/0206 ,  H01L21/31111

    摘要： A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing an organic coatings from the film and making the surface of the film hydrophilic. A chemical solution is applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.

    摘要翻译： 要蚀刻的基底支撑膜保持在旋转台上。 从第一灯辐射的波长为200nm或更短的紫外光在空气中照射该膜，由此从膜中除去有机涂层并使膜的表面亲水。 在旋转衬底的同时将化学溶液施加到亲水膜。 波长超过200nm的紫外光通过化学溶液从第二个灯辐射到膜上。

    Wet etching method using ultraviolet-light and method of manufacturing semiconductor device
    2.
    发明授权
    Wet etching method using ultraviolet-light and method of manufacturing semiconductor device 有权
    使用紫外光的湿式蚀刻方法和制造半导体器件的方法

    公开(公告)号：US07935266B2

    公开(公告)日：2011-05-03

    申请号：US11964794

    申请日：2007-12-27

    申请人： Satoshi Kume ,  Nobuyuki Hishinuma ,  Hiroshi Sugahara

    发明人： Satoshi Kume ,  Nobuyuki Hishinuma ,  Hiroshi Sugahara

    IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C23F3/00

    CPC分类号： H01L21/0206 ,  H01L21/31111

    摘要： A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing an organic coatings from the film and making the surface of the film hydrophilic. A chemical solution is applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.

    摘要翻译： 要蚀刻的基底支撑膜保持在旋转台上。 从第一灯辐射的波长为200nm或更短的紫外光在空气中照射该膜，由此从膜中除去有机涂层并使膜的表面亲水。 在旋转衬底的同时将化学溶液施加到亲水膜。 波长超过200nm的紫外光通过化学溶液从第二个灯辐射到膜上。

    Wet etching apparatus and wet etching method
    3.
    发明申请
    Wet etching apparatus and wet etching method 审中-公开
    湿蚀刻装置和湿式蚀刻方法

    公开(公告)号：US20050205521A1

    公开(公告)日：2005-09-22

    申请号：US11038191

    申请日：2005-01-21

    申请人： Satsohi Kume ,  Hiroshi Sugahara ,  Nobuyuki Hishinuma

    发明人： Satsohi Kume ,  Hiroshi Sugahara ,  Nobuyuki Hishinuma

    IPC分类号： H01L21/306 ,  B44C1/22

    CPC分类号： H01L21/31111 ,  H01L21/31133 ,  H01L21/6708

    摘要： A wet etching apparatus comprises a stage for fixing a substrate having a major surface covered with a film to be etched, a rotation mechanism for rotating the stage, a rotation controller for controlling rotation operation by the rotation mechanism, an ultraviolet irradiation unit having a light source for irradiating a portion of the major surface of the substrate with ultraviolet radiation, and an etching solution supply unit for supplying etching solution to the major surface of the substrate. The entire surface of the substrate can be irradiated with the ultraviolet radiation by a rotation of the stage.

    摘要翻译： 湿法蚀刻装置包括用于固定主表面被被蚀刻膜覆盖的基板的台，用于旋转台的旋转机构，用于控制旋转机构的旋转操作的旋转控制器，具有光的紫外线照射单元 用于用紫外线辐射照射基板的主表面的一部分的源;以及用于将蚀刻溶液供应到基板的主表面的蚀刻溶液供应单元。 通过台的旋转可以用紫外线照射基板的整个表面。

    Dielectric barrier discharge lamp
    4.
    发明授权
    Dielectric barrier discharge lamp 失效
    介质阻挡放电灯

    公开(公告)号：US5757132A

    公开(公告)日：1998-05-26

    申请号：US725039

    申请日：1996-10-02

    申请人： Hiromitsu Matsuno ,  Nobuyuki Hishinuma ,  Kenichi Hirose ,  Kunio Kasagi ,  Fumitoshi Takemoto ,  Yoshinori Aiura ,  Tatsushi Igarashi

    发明人： Hiromitsu Matsuno ,  Nobuyuki Hishinuma ,  Kenichi Hirose ,  Kunio Kasagi ,  Fumitoshi Takemoto ,  Yoshinori Aiura ,  Tatsushi Igarashi

    IPC分类号： H01J65/00 ,  H01J61/067

    CPC分类号： H01J65/046

    摘要： To maintain the relative positional relationship between an inner tube and an inner electrode of a dielectric barrier discharge tube having a roughly cylindrical, double tube arrangement of an outer tube coaxially arranged about an inner tube with a discharge space defined therebetween, an outer electrode on an outer surface of the outer tube, an inner electrode on an inner surface of the inner tube, and a discharge gas which forms excimer molecules by a dielectric barrier discharge filling said discharge space, despite repeated expansion and contraction of the inner electrode due to the dielectric barrier discharge lamp being repeatedly turned on and off, according to the invention, the inner electrode is formed of a substantially tubular metal component or the like, and a motion preventing component is provided at opposite ends of the inner electrode for maintaining an axial position of the inner electrode relative to the inner tube.

    摘要翻译： 为了保持介质阻挡放电管的内管和内电极之间的相对位置关系，所述介质阻挡放电管具有围绕内管同轴布置的外管的大致圆筒形双管布置，其间限定有放电空间，外电极 外管的外表面，内管的内表面上的内电极和通过填充所述放电空间的介电阻挡放电形成准分子分子的放电气体，尽管内电极由于电介质的反复膨胀和收缩 根据本发明，根据本发明，内部电极由基本上管状的金属部件等形成，并且在内部电极的相对端设置防止运动部件，用于保持轴向位置 内部电极相对于内管。

    Dielectric barrier discharge lamp device
    5.
    发明授权
    Dielectric barrier discharge lamp device 有权
    介电阻挡放电灯装置

    公开(公告)号：US06657367B1

    公开(公告)日：2003-12-02

    申请号：US09703596

    申请日：2000-11-02

    申请人： Satoru Fukuda ,  Nobuyuki Hishinuma ,  Shinji Sugioka

    发明人： Satoru Fukuda ,  Nobuyuki Hishinuma ,  Shinji Sugioka

    IPC分类号： H01J1100

    CPC分类号： H05G2/003 ,  H01J65/04 ,  H01L21/67115 ,  H05B3/04

    摘要： A dielectric barrier discharge lamp device which allows ultraviolet rays to be uniformly radiated onto a workpiece having a large surface area and which can be easily adapted to the size of workpiece. In the dielectric barrier, at least one dielectric barrier discharge lamp is arranged in a hermetically sealed casing which has a hollow longitudinally extending main part that is closed at both ends by end parts, at least a portion of the main part of the casing defining a window allowing light radiated from the at least one dielectric barrier discharge lamp to pass therethrough onto the workpiece. At least one end part of the casing is provided with a passage allowing inert gas to be introduced into the casing, and at least one end part of the casing is adapted to allow loading or unloading of the at least one dielectric barrier discharge lamp. A plurality of casings are arranged side by side with their windows facing the workpiece to be irradiated.

    摘要翻译： 一种介电阻挡放电灯装置，其能够使紫外线均匀地照射到具有大表面积的工件上，并且可以容易地适应于工件的尺寸。 在电介质阻挡层中，至少一个电介质阻挡放电灯布置在密封的壳体中，该壳体具有中空的纵向延伸的主要部分，其两端由端部封闭，壳体的主要部分的至少一部分限定一个 窗口，允许从至少一个介质阻挡放电灯辐射的光通过其中穿过工件。 壳体的至少一个端部设置有允许惰性气体引入壳体的通道，并且壳体的至少一个端部适于允许加载或卸载至少一个介质阻挡放电灯。 多个壳体并排布置，其窗口面向工件以进行照射。

    Process and device for treatment by dielectric barrier discharge lamps
    6.
    发明授权
    Process and device for treatment by dielectric barrier discharge lamps 有权
    介质阻挡放电灯处理工艺及装置

    公开(公告)号：US06624428B2

    公开(公告)日：2003-09-23

    申请号：US10292630

    申请日：2002-11-13

    申请人： Nobuyuki Hishinuma

    发明人： Nobuyuki Hishinuma

    IPC分类号： H01J3700

    CPC分类号： H05B3/0052 ,  B01J19/123 ,  C23C16/482

    摘要： To advantageously eliminate the disadvantage of attenuation of the radiant light from dielectric barrier discharge lamps by a UV transmission component, a treatment device using dielectric barrier discharge lamps is provided with a lamp chamber in which dielectric barrier discharge lamps are located and in which there is an inert gas atmosphere; a treatment chamber, in which an article to be treated is located, is provided with a treatment gas atmosphere, and a UV transmission component by which the lamp chamber and the treatment chamber are separated from one another. In each of the lamp chamber and the treatment chamber there are devices for determining the gas pressure within the respective chamber, a supply arrangement for delivering gas to the inside the respective chamber and an arrangement for discharging gas from the respective chamber. A control device regulates the pressure of the gas atmosphere within the lamp chamber and the pressure of the gas atmosphere of the treatment chamber relative to one another by determining the gas pressures of the lamp chamber and the treatment chamber.

    摘要翻译： 为了有利地消除通过UV透射部件衰减来自电介质阻挡放电灯的辐射光的缺点，使用介质阻挡放电灯的处理装置设置有灯室，其中介质阻挡放电灯位于其中，其中存在 惰性气体气氛; 在处理室中设置待处理物品，处理气体气氛和灯室与处理室相互分离的UV透射部件。 在灯室和处理室的每一个中，存在用于确定相应室内的气体压力的装置，用于将气体输送到相应室的内部的供应装置和用于从相应室排出气体的装置。 控制装置通过确定灯室和处理室的气体压力来调节灯室内的气体气氛的压力和处理室的气体气氛的压力。

    Dielectric barrier discharge lamp
    7.
    发明授权
    Dielectric barrier discharge lamp 失效
    介质阻挡放电灯

    公开(公告)号：US5581152A

    公开(公告)日：1996-12-03

    申请号：US303033

    申请日：1994-09-08

    申请人： Hiromitsu Matsuno ,  Tatsushi Igarashi ,  Tatsumi Hiramoto ,  Fumitoshi Takemoto ,  Nobuyuki Hishinuma ,  Yasuo Oonishi ,  Kunio Kasagi ,  Takashi Asahina ,  Yasuhiko Wakahata

    发明人： Hiromitsu Matsuno ,  Tatsushi Igarashi ,  Tatsumi Hiramoto ,  Fumitoshi Takemoto ,  Nobuyuki Hishinuma ,  Yasuo Oonishi ,  Kunio Kasagi ,  Takashi Asahina ,  Yasuhiko Wakahata

    IPC分类号： H01J65/00 ,  H01J65/04 ,  H01J61/067

    CPC分类号： H01J65/046 ,  H01J65/00

    摘要： In a dielectric barrier discharge lamp, in which a discharge vessel, in which a discharge gas forming "excimer" molecules is encapsulated, is provided with a dielectric provided with a netlike electrode and a window, through which the light goes, the first object of the invention is achieved by an arrangement in which a thickness of ends of the above-described netlike electrodes is greater than the average thickness of the entire electrode. Another object of the invention is achieved by an arrangement in which a holder incorporated in the discharge vessel has an outer dimension that is less than/equal to an outer dimension of the netlike electrodes. A further object of the invention is achieved by an arrangement by which the discharge vessel has a hollow cylindrical shape formed from an external tube and an internal tube and a means for hermetic sealing is arranged inside the internal tube.

    摘要翻译： 在其中封装了形成“准分子”分子的放电气体的放电容器的电介质阻挡放电灯中，设置有电介质，所述电介质设置有网状电极和窗，光通过该电介质，第一物体 本发明通过上述网状电极的端部的厚度大于整个电极的平均厚度的结构来实现。 本发明的另一个目的是通过一种结构实现的，其中结合在放电容器中的保持器的外形尺寸小于/等于网状电极的外部尺寸。 本发明的另一个目的是通过这样一种布置实现放电容器具有由外管和内管形成的中空圆筒形状，并且用于气密密封的装置设置在内管的内部。

    Dielectric barrier discharge lamp device with coupler for coolant fluid flow
    9.
    发明授权
    Dielectric barrier discharge lamp device with coupler for coolant fluid flow 失效
    具有用于冷却剂流体流动的耦合器的介电阻挡放电灯装置

    公开(公告)号：US06570301B1

    公开(公告)日：2003-05-27

    申请号：US09537715

    申请日：2000-03-30

    申请人： Nobuyuki Hishinuma ,  Shinji Sugioka ,  Satoru Fukuda

    发明人： Nobuyuki Hishinuma ,  Shinji Sugioka ,  Satoru Fukuda

    IPC分类号： H01J6152

    CPC分类号： H01J61/52 ,  H01J65/046

    摘要： A dielectric-barrier discharge lamp device that can reliably prevent leakage of the coolant fluid used to cool the dielectric-barrier discharge lamp, and that can reliably cool the dielectric-barrier discharge lamp, is achieved by the dielectric-barrier discharge lamp device having a dielectric-barrier discharge lamp (1) with a hollow-cylinder-shaped discharge space (P) formed by an outer tube (3) that is roughly cylindrical in external shape and a co-axial inner tube (2), in which the inner tube (2) has a cylindrical tube extension (2A) that extends outward from the discharge space (4), and in which the outer periphery of the end (2A1) of the tube extension (2A) is held tightly by a coupler fitting (8) connected to a guide tube (11) through which a coolant fluid flows.

    摘要翻译： 可以可靠地防止用于冷却介电阻挡放电灯的冷却剂流体泄漏并且可以可靠地冷却介电阻挡放电灯的电介质阻挡放电灯装置是通过具有 介质阻挡放电灯（1），其具有由大致外形为圆筒形的外管（3）形成的中空圆柱形放电空间（P）和同轴内管（2），其中内 管（2）具有从放电空间（4）向外延伸的圆筒形管延伸部（2A），并且管延伸部（2A）的端部（2A1）的外周由联接器配件 连接到导管（11），冷却剂流体通过该引导管流动。