公开(公告)号：US20200211828A1

公开(公告)日：2020-07-02

申请号：US16622423

申请日：2018-06-13

申请人： Semblant Limited

发明人： Andrew Simon Hall Brooks ,  Gareth Hennighan ,  Gianfranco Aresta ,  Richard Anthony Lione ,  Shailendra Vikram Singh ,  Siobhan Marie Woollard

IPC分类号： H01J37/32 ,  C23C16/458 ,  C23C16/509

摘要： A plasma processing apparatus for processing a substrate using a plasma, comprising: a process chamber in which the processing takes place; a plasma source for providing a plasma to the process chamber; a substrate mount within the process chamber for holding the substrate, the substrate mount comprising a surface having a plurality of apertures.

公开(公告)号：US20190090358A1

公开(公告)日：2019-03-21

申请号：US16046075

申请日：2018-07-26

申请人： Semblant Limited

发明人： Gianfranco Aresta ,  Gareth Hennighan ,  Andrew Simon Hall Brooks ,  Shailendra Vikram Singh

IPC分类号： H05K3/46 ,  C23C16/30 ,  C23C16/505 ,  H05K3/28 ,  H05K1/18

摘要： An electrical assembly which has a multi-layer conformal coating on at least one surface of the electrical assembly, wherein each layer of the multi-layer coating is obtainable by plasma deposition of a precursor mixture comprising (a) one or more organosilicon compounds, (b) optionally O2, N2O, NO2, H2, NH3, N2, SiF4 and/or hexafluoropropylene (HFP), and (c) optionally He, Ar and/or Kr. The chemistry of the resulting plasma-deposited material chemistry can be described by the general formula: SiOxHyCzFaNb. The properties of the conformal coating are tailored by tuning the values of x, y, z, a and b.

公开(公告)号：US20170094810A1

公开(公告)日：2017-03-30

申请号：US15266624

申请日：2016-09-15

申请人： Semblant Limited

发明人： Gianfranco Aresta ,  Gareth Hennighan ,  Andrew Simon Hall Brooks ,  Shailendra Vikram Singh

IPC分类号： H05K3/46 ,  C23C16/505 ,  H05K1/18

CPC分类号： H05K3/467 ,  C23C16/30 ,  C23C16/505 ,  H05K1/181 ,  H05K3/285 ,  H05K2201/0104 ,  H05K2201/0162 ,  H05K2201/09872 ,  H05K2201/10015 ,  H05K2201/10022 ,  H05K2201/1003 ,  H05K2201/10037 ,  H05K2201/10053 ,  H05K2201/10075 ,  H05K2201/10083 ,  H05K2201/10098 ,  H05K2201/10106 ,  H05K2201/10121 ,  H05K2201/10128 ,  H05K2201/10166 ,  H05K2201/10174 ,  H05K2201/10181 ,  H05K2203/095 ,  H05K2203/121 ,  H05K2203/1322 ,  H05K2203/1338

摘要： An electrical assembly which has a multi-layer conformal coating on at least one surface of the electrical assembly, wherein each layer of the multi-layer coating is obtainable by plasma deposition of a precursor mixture comprising (a) one or more organosilicon compounds, (b) optionally O2, N2O, NO2, H2, NH3, N2, SiF4 and/or hexafluoropropylene (HFP), and (c) optionally He, Ar and/or Kr. The chemistry of the resulting plasma-deposited material chemistry can be described by the general formula: SiOxHyCzFaNb. The properties of the conformal coating are tailored by tuning the values of x, y, z, a and b.