利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

10 条记录 (耗时 0.016 秒)

    PLASMA DEPOSITION METHOD
    1.
    发明申请
    PLASMA DEPOSITION METHOD 审中-公开

    公开(公告)号：US20190093225A1

    公开(公告)日：2019-03-28

    申请号：US16082740

    申请日：2017-03-06

    申请人： SEMBLANT LIMITED

    发明人： Shailendra Vikram SINGH ,  Richard Anthony LIONE

    IPC分类号： C23C16/503 ,  C23C16/02 ,  C23C16/56 ,  C23C16/44 ,  C23C16/511 ,  B05D1/00 ,  B05D3/00

    摘要： A plasma deposition method in which a cover layer is deposited onto the internal walls of an empty plasma chamber by plasma deposition of a precursor mixture comprising (i) one or more hydrocarbon compounds of formula (A), or (ii) one or more C1-C3 alkane, C2-C3 alkene or C2-C3 alkyne compounds: (Formula (A)) wherein: Z1 represents C1-C3 alkyl or C2-C3 alkenyl; Z2 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z3 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z4 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z5 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; and Z6 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl.

    COATED ELECTRICAL ASSEMBLY
    2.
    发明申请
    COATED ELECTRICAL ASSEMBLY 审中-公开

    公开(公告)号：US20190037705A1

    公开(公告)日：2019-01-31

    申请号：US16071647

    申请日：2017-01-19

    申请人： SEMBLANT LIMITED

    发明人： Shailendra Vikram SINGH ,  Gianfranco ARESTA ,  Andrew Simon Hall BROOKS ,  Gareth HENNIGHAN

    IPC分类号： H05K3/28 ,  H05K1/18 ,  B05D1/00

    摘要： An electrical assembly which has a multi-layer conformal coating comprising three or more layers on at least one surface of the electrical assembly, wherein the lowest layer of the multi-layer conformal coating, which is in contact with the at least one surface of the electrical assembly, is obtainable by plasma deposition of a precursor mixture comprising (a) one or more organo-silicon compounds, (b) optionally O2, N2O, NO2, H2, NH3 and/or N2, and (c) optionally He, Ar and/or Kr; the uppermost layer of the multi-layer conformal coating is obtainable by plasma deposition of a precursor mixture comprising (a) one or more organosilicon compounds, (b) optionally O2, N2O, NO2, H2, NH3 and/or N2, and (c) optionally He, Ar and/or Kr; and the multi-layer coating comprises one or more layers which is obtainable by plasma deposition of a precursor mixture comprising (a) one or more hydrocarbon compounds of formula (A), (b) optionally NH3, N2O, N2, NO2, CH4, C2H6, C3H6 and/or C3H8, and (c) optionally He, Ar and/or Kr, Z1 represents C1-C3 alkyl or C2-C3 alkenyl; Z2 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z3 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z4 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; Z5 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl; and Z6 represents hydrogen, C1-C3 alkyl or C2-C3 alkenyl.

    SUBSTRATE MOUNT
    5.
    发明申请
    SUBSTRATE MOUNT 有权

    公开(公告)号：US20210134566A1

    公开(公告)日：2021-05-06

    申请号：US16638742

    申请日：2018-08-15

    申请人： Semblant Limited

    发明人： Reynaldo CORPUZ CO ,  Grant Sales VILLAVICENCIO ,  Ebrahim GHANBARI

    IPC分类号： H01J37/32

    摘要： A substrate mount for a plasma processing apparatus comprising: a frame; an aperture within the frame, configured to accommodate an insert, the insert being configured to support a substrate for processing by the plasma processing apparatus; a releasable securing mechanism configured to releasably secure the insert within the aperture such that the insert can be replaced.

    COATED ELECTRICAL ASSEMBLY
    9.
    发明申请
    COATED ELECTRICAL ASSEMBLY 审中-公开

    公开(公告)号：US20190090358A1

    公开(公告)日：2019-03-21

    申请号：US16046075

    申请日：2018-07-26

    申请人： Semblant Limited

    发明人： Gianfranco Aresta ,  Gareth Hennighan ,  Andrew Simon Hall Brooks ,  Shailendra Vikram Singh

    IPC分类号： H05K3/46 ,  C23C16/30 ,  C23C16/505 ,  H05K3/28 ,  H05K1/18

    摘要： An electrical assembly which has a multi-layer conformal coating on at least one surface of the electrical assembly, wherein each layer of the multi-layer coating is obtainable by plasma deposition of a precursor mixture comprising (a) one or more organosilicon compounds, (b) optionally O2, N2O, NO2, H2, NH3, N2, SiF4 and/or hexafluoropropylene (HFP), and (c) optionally He, Ar and/or Kr. The chemistry of the resulting plasma-deposited material chemistry can be described by the general formula: SiOxHyCzFaNb. The properties of the conformal coating are tailored by tuning the values of x, y, z, a and b.