公开(公告)号：US12125717B2

公开(公告)日：2024-10-22

申请号：US17533348

申请日：2021-11-23

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Seung Han Lee ,  Sun Wook Jung ,  Si Eun Kim

IPC: H01L21/67 ,  C23C16/44 ,  C23C16/455 ,  H01L21/02 ,  H01L21/687

CPC classification number: H01L21/67051 ,  C23C16/4412 ,  C23C16/45502 ,  H01L21/68764 ,  H01L21/02337

Abstract: An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.

公开(公告)号：US12140868B2

公开(公告)日：2024-11-12

申请号：US17749437

申请日：2022-05-20

Applicant: SEMES CO., LTD.

Inventor： Sun Wook Jung ,  Ki Sang Eum ,  Jin Ho Choi ,  Byoung Doo Choi ,  Hee Man Ahn

IPC: G03F7/16 ,  B05C11/10

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes substrate treating apparatus comprising: a treating container having an inner space; a support unit configured to support and rotate a substrate within the inner space; an exhaust duct configured to exhaust the inner space; and at least one guide member combined with the treating container and configured to guide an airflow within the inner space, and wherein the at least one guide member is arranged such that the airflow within the inner space obliquely flows with respect to a rotation direction of the substrate supported by the support unit when seen from above.

公开(公告)号：US09915261B2

公开(公告)日：2018-03-13

申请号：US14527936

申请日：2014-10-30

Applicant: Semes Co., Ltd.

Inventor： Jin Ho Choi ,  Ju Mi Yoo

IPC: F16D31/02 ,  F04B49/20 ,  H01L21/67 ,  F04B49/06 ,  F04B49/10 ,  H01L21/677

CPC classification number: F04B49/20 ,  F04B49/06 ,  F04B49/103 ,  F04B2201/0201 ,  F04B2201/0202 ,  H01L21/67259 ,  H01L21/67742

Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes: a transfer chamber conveying a substrate; a process chamber disposed adjacent to the transfer chamber and performing a treating process o the substrate; and a drive assembly supplying a power by which a component of the transfer chamber or the process chamber operates, wherein the drive assembly includes: a cylinder connected to pipes; a piston disposed to be movable inside the cylinder and connected to the component by a drive shaft; and a pipe control unit automatically adjusting a moving speed of the piston.

公开(公告)号：US12230510B2

公开(公告)日：2025-02-18

申请号：US17566874

申请日：2021-12-31

Applicant: SEMES CO., LTD.

Inventor： Byoung Doo Choi ,  Jin Ho Choi

IPC: H01L21/47 ,  H01L21/67

Abstract: A substrate treating apparatus is disclosed. The substrate treating apparatus includes a treating container having a treatment space to treat a substrate, a standby port positioned at one side of the treating container to allow a nozzle, which discharges a treatment liquid, to stand by, and a liquid supplying unit moving between the treating container and the standby port and having the nozzle. The standby port includes a nozzle receiving member including a nozzle receiving unit having a receiving space formed inside the nozzle receiving unit to receive the nozzle and a cleaning liquid and a discharge part having a discharge port provided at one side of the nozzle cleaning unit to discharge the cleaning liquid to the nozzle. The discharge port is provided to overlap at least a portion of the nozzle when viewed from above.

公开(公告)号：US12228861B2

公开(公告)日：2025-02-18

申请号：US17522007

申请日：2021-11-09

Applicant: SEMES CO., LTD.

Inventor： Ki Sang Eum ,  Jin Ho Choi ,  Sun Wook Jung ,  Byoung Doo Choi ,  Hee Man Ahn ,  Si Eun Kim

IPC: G03F7/16 ,  C23C16/458

Abstract: An apparatus for treating a substrate includes a treating vessel having an inner space, a support unit that supports and rotates the substrate in the inner space, and an exhaust unit that releases an air flow in the inner space. The exhaust unit includes an air-flow guide duct into which the air flow is introduced in a tangential direction with respect to a rotating direction of the substrate supported on the support unit.