SEMICONDUCTOR DISPLAY DEVICE
    1.
    发明申请

    公开(公告)号:US20190067336A1

    公开(公告)日:2019-02-28

    申请号:US16107536

    申请日:2018-08-21

    Abstract: It is an object of the present invention to provide a semiconductor display device having an interlayer insulating film which can obtain planarity of a surface while controlling film formation time, can control treatment time of heating treatment with an object of removing moisture, and can prevent moisture in the interlayer insulating film from being discharged to a film or an electrode adjacent to the interlayer insulating film. An inorganic insulating film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover a TFT. Next, an organic resin film containing photosensitive acrylic resin is applied to the organic insulting film, and the organic resin film is partially exposed to light to be opened. Thereafter, an inorganic insulting film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is fanned so as to cover the opened organic resin film. Then, in the opening part of the organic resin film, a gate insulating film and the two layer inorganic insulating film containing nitrogen are opened partially by etching to expose an active layer of the TFT.

    SEMICONDUCTOR DISPLAY DEVICE
    4.
    发明申请

    公开(公告)号:US20220077199A1

    公开(公告)日:2022-03-10

    申请号:US17401360

    申请日:2021-08-13

    Abstract: It is an object of the present invention to provide a semiconductor display device having an interlayer insulating film which can obtain planarity of a surface while controlling film formation time, can control treatment time of heating treatment with an object of removing moisture, and can prevent moisture in the interlayer insulating film from being discharged to a film or an electrode adjacent to the interlayer insulating film. An inorganic insulating film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover a TFT. Next, an organic resin film containing photosensitive acrylic resin is applied to the organic is insulting film, and the organic resin film is partially exposed to light to be opened. Thereafter, an inorganic insulting film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover the opened organic resin film. Then, in the opening part of the organic resin film, a gate insulating film and the two layer inorganic insulating film containing nitrogen are opened partially by etching, to expose an active layer of the TFT.

    SEMICONDUCTOR DISPLAY DEVICE
    9.
    发明申请
    SEMICONDUCTOR DISPLAY DEVICE 审中-公开
    半导体显示设备

    公开(公告)号:US20150001545A1

    公开(公告)日:2015-01-01

    申请号:US14481458

    申请日:2014-09-09

    Abstract: It is an object of the present invention to provide a semiconductor display device having an interlayer insulating film which can obtain planarity of a surface while controlling film formation time, can control treatment time of heating treatment with an object of removing moisture, and can prevent moisture in the interlayer insulating film from being discharged to a film or an electrode adjacent to the interlayer insulating film. An inorganic insulating film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover a TFT. Next, an organic resin film containing photosensitive acrylic resin is applied to the organic insulting film, and the organic resin film is partially exposed to light to be opened. Thereafter, an inorganic insulting film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover the opened organic resin film. Then, in the opening part of the organic resin film, a gate insulating film and the two layer inorganic insulating film containing nitrogen are opened partially by etching to expose an active layer of the TFT.

    Abstract translation: 本发明的目的是提供一种具有层间绝缘膜的半导体显示装置,其可以在控制成膜时间的同时获得表面的平面性,并且可以控制用于除去水分的加热处理的处理时间,并且可以防止水分 在层间绝缘膜中不被放电到与层间绝缘膜相邻的膜或电极。 形成与有机树脂相比不容易透过水分的含氮的无机绝缘膜,以覆盖TFT。 接着,在有机绝缘膜上涂布含有感光性丙烯酸树脂的有机树脂膜,将有机树脂膜部分地曝光以打开。 然后,形成与有机树脂相比不容易透过水分的含有氮的无机绝缘膜,以覆盖打开的有机树脂膜。 然后,在有机树脂膜的开口部分中,通过蚀刻部分地打开栅极绝缘膜和含氮的两层无机绝缘膜,以暴露TFT的有源层。

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