SYSTEM AND METHOD FOR APPLYING A CONFORMAL BARRIER COATING
    3.
    发明申请
    SYSTEM AND METHOD FOR APPLYING A CONFORMAL BARRIER COATING 审中-公开
    用于施加一致性障碍物涂层的系统和方法

    公开(公告)号:US20100080929A1

    公开(公告)日:2010-04-01

    申请号:US12242443

    申请日:2008-09-30

    CPC分类号: C23C16/029 C23C16/50

    摘要: An improvement of a baseline method for depositing a coating on a device having a surface where the surface includes a first portion and a second portion, where the second portion is in a shadow zone, and where the coating is deposited using a first predetermined set of process parameters having a first ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion. In the improved method, the coating is deposited using a second predetermined set of process parameters such that the coating substantially conforms to a profile of the device and a second ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion is greater than the first ratio. The method is a single, commercially advantageous deposition process, enabling increased product throughput and low process tact time.

    摘要翻译: 一种用于在具有表面的装置上沉积涂层的基线方法的改进,其中所述表面包括第一部分和第二部分,其中第二部分处于阴影区域,并且其中涂层使用第一预定组 工艺参数具有第二部分上的涂层的厚度与第一部分上的涂层的厚度的第一比率。 在改进的方法中,使用第二预定的一组工艺参数沉积涂层,使得涂层基本上符合装置的轮廓,并且第二部分上的涂层的厚度与涂层的厚度的第二比率 第一部分大于第一比例。 该方法是单一的,商业上有利的沉积工艺,能够提高产品产量和低的工艺节拍时间。