-
1.发明申请公开(公告)号：US20100079060A1
公开(公告)日：2010-04-01
申请号：US12242399
申请日：2008-09-30
申请人： Ahmet Gun ERLAT , George Theodore DALAKOS , Min YAN , Sheila Neumann TANDON , Brian Joseph SCHERER
发明人： Ahmet Gun ERLAT , George Theodore DALAKOS , Min YAN , Sheila Neumann TANDON , Brian Joseph SCHERER
CPC分类号： C23C16/0245 , B05D1/62 , C23C16/029 , H01L51/5253 , H01L2251/5346 , Y10T428/24612
摘要： In a method for depositing a barrier coating, a device is provided comprising a first portion and a second portion where a surface of the second portion is in a shadow zone. The device is pretreated wherein the pretreating alters a deposition rate of the barrier coating on a surface exposed to the pretreating. The shadow zone is substantially unexposed to the pretreating. A barrier coating is deposited wherein the barrier coating substantially conforms to a profile of the device. The coating may be a graded-composition barrier coating wherein a composition of the coating varies substantially continuously across a thickness thereof. The first portion may include a flexible, substantially transparent substrate. The second portion may include an electronic device. The barrier coating and first portion may encapsulate the second portion. The method is a single, commercially advantageous, barrier deposition process, enabling increased product throughput and low process tact time.
摘要翻译： 在用于沉积阻挡涂层的方法中，提供了包括第一部分和第二部分的装置，其中第二部分的表面处于阴影区域。 该装置被预处理，其中预处理改变了暴露于预处理的表面上的阻挡涂层的沉积速率。 阴影区域基本上未被暴露于预处理。 沉积阻挡涂层，其中阻挡涂层基本上符合设备的轮廓。 涂层可以是梯度组合物阻挡涂层，其中涂层的组合物在其厚度上基本连续地变化。 第一部分可以包括柔性的，基本上透明的基底。 第二部分可以包括电子设备。 阻挡涂层和第一部分可以封装第二部分。 该方法是单一的，商业上有利的阻隔沉积工艺，能够提高产品生产量和低工艺节拍时间。
-
公开(公告)号：US20100065099A1
公开(公告)日：2010-03-18
申请号：US12284132
申请日：2008-09-18
IPC分类号： H01L31/042 , H01L21/768
CPC分类号： H01L31/0392 , H01L31/022425 , H01L31/03925 , H01L31/03928 , H01L31/046 , H01L31/0465 , Y02E10/541
摘要： A method of monolithically interconnecting electrical devices that isolates and interconnects the contacts of neighboring electrical devices such as thin film PV cells, without damaging the surrounding materials.
摘要翻译： 一种单片互连电气装置的方法，其隔离和互连相邻电气装置（例如薄膜PV电池）的触点，而不损坏周围的材料。
-
3.发明授权Collection probe for use in a Raman spectrometer system and methods of making and using the same 有权用于拉曼光谱仪系统的收集探针及其制作和使用方法公开(公告)号：US07411670B2
公开(公告)日：2008-08-12
申请号：US11400863
申请日：2006-04-10
申请人： Anis Zribi , Ayan Banerjee , Shivappa Ningappa Goravar , Shankar (nmn) Chandrasekaran , Sandip Maity , Glenn Scott Claydon , Stacey Joy Kennerly , Todd Ryan Tolliver , David Cecil Hays , Sheila Neumann Tandon , Long Que , Christopher Fred Keimel
发明人： Anis Zribi , Ayan Banerjee , Shivappa Ningappa Goravar , Shankar (nmn) Chandrasekaran , Sandip Maity , Glenn Scott Claydon , Stacey Joy Kennerly , Todd Ryan Tolliver , David Cecil Hays , Sheila Neumann Tandon , Long Que , Christopher Fred Keimel
IPC分类号： G01J3/44
CPC分类号： G01J3/44 , G01J3/02 , G01J3/0291 , G01N21/65
摘要： A photonic crystal based collection probe is provided. The probe includes a photonic crystal configured to guide and condition a beam of Raman scattered photons. Further, the device includes a spectrograph in optical communication with the photonic crystal and configured to receive Raman scattering from the photonic crystal. The device may be employed in a Raman spectrometer system.
摘要翻译： 提供了一种基于光子晶体的收集探针。 探针包括配置为引导和调节拉曼散射光子束的光子晶体。 此外，该装置包括与光子晶体光学通信并被配置为从光子晶体接收拉曼散射的光谱仪。 该装置可以用在拉曼光谱仪系统中。
-
公开(公告)号：US07994418B2
公开(公告)日：2011-08-09
申请号：US12284132
申请日：2008-09-18
IPC分类号： H01L31/05
CPC分类号： H01L31/0392 , H01L31/022425 , H01L31/03925 , H01L31/03928 , H01L31/046 , H01L31/0465 , Y02E10/541
摘要： A method of monolithically interconnecting electrical devices that isolates and interconnects the contacts of neighboring electrical devices such as thin film PV cells, without damaging the surrounding materials.
摘要翻译： 一种单片互连电气装置的方法，其隔离和互连相邻电气装置（例如薄膜PV电池）的触点，而不损坏周围的材料。
-
公开(公告)号：US20100080929A1
公开(公告)日：2010-04-01
申请号：US12242443
申请日：2008-09-30
申请人： Ahmet Gun ERLAT , George Theodore Dalakos , Min Yan , Sheila Neumann Tandon , Brian Joseph Scherer
发明人： Ahmet Gun ERLAT , George Theodore Dalakos , Min Yan , Sheila Neumann Tandon , Brian Joseph Scherer
IPC分类号： C23C14/34 , C23C16/04 , C23C16/513
CPC分类号： C23C16/029 , C23C16/50
摘要： An improvement of a baseline method for depositing a coating on a device having a surface where the surface includes a first portion and a second portion, where the second portion is in a shadow zone, and where the coating is deposited using a first predetermined set of process parameters having a first ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion. In the improved method, the coating is deposited using a second predetermined set of process parameters such that the coating substantially conforms to a profile of the device and a second ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion is greater than the first ratio. The method is a single, commercially advantageous deposition process, enabling increased product throughput and low process tact time.
摘要翻译： 一种用于在具有表面的装置上沉积涂层的基线方法的改进，其中所述表面包括第一部分和第二部分，其中第二部分处于阴影区域，并且其中涂层使用第一预定组 工艺参数具有第二部分上的涂层的厚度与第一部分上的涂层的厚度的第一比率。 在改进的方法中，使用第二预定的一组工艺参数沉积涂层，使得涂层基本上符合装置的轮廓，并且第二部分上的涂层的厚度与涂层的厚度的第二比率 第一部分大于第一比例。 该方法是单一的，商业上有利的沉积工艺，能够提高产品产量和低的工艺节拍时间。
-
-
-
-
搜索结果
5 条记录 (耗时 0.013 秒)
