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    Manufacturing Method of Magnetic Head Slider
    1.
    发明申请
    Manufacturing Method of Magnetic Head Slider 审中-公开
    磁头滑块的制造方法

    公开(公告)号：US20110113620A1

    公开(公告)日：2011-05-19

    申请号：US12948348

    申请日：2010-11-17

    申请人： Shinji Sasaki ,  Hiroyuki Kojima ,  Nobuhiko Fukuoka ,  Kenji Furusawa

    发明人： Shinji Sasaki ,  Hiroyuki Kojima ,  Nobuhiko Fukuoka ,  Kenji Furusawa

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3163 ,  G11B5/3169 ,  G11B5/6011 ,  Y10T29/49032

    摘要： A conventional lapping process of executing element size control and surface roughness reduction at the same time is divided in the present invention into a lapping process for element size control and a lapping step for surface roughness reduction. In the lapping process for surface roughness reduction, a surface of a ceramic substrate portion is used as a stopper for limiting cut-in of abrasive grains to realize surface roughness reduction while maintaining productivity.

    摘要翻译： 在本发明中，将元件尺寸控制和表面粗糙度减少执行的常规研磨处理分为用于元件尺寸控制的研磨工艺和用于表面粗糙度降低的研磨步骤。 在表面粗糙度降低的研磨工艺中，陶瓷基板部分的表面用作限制磨粒的切割以在保持生产率的同时实现表面粗糙度减小。

    Gas cluster-ion irradiation apparatus
    2.
    发明授权
    Gas cluster-ion irradiation apparatus 失效
    气体簇离子照射装置

    公开(公告)号：US07405394B2

    公开(公告)日：2008-07-29

    申请号：US11173023

    申请日：2005-07-05

    申请人： Shigeru Ono ,  Shinji Sasaki ,  Kenji Furusawa ,  Jiro Matsuo ,  Toshio Seki

    发明人： Shigeru Ono ,  Shinji Sasaki ,  Kenji Furusawa ,  Jiro Matsuo ,  Toshio Seki

    IPC分类号： B01D59/44

    CPC分类号： H01J37/3053 ,  H01J2237/04756 ,  H01J2237/0812 ,  H01J2237/304

    摘要： In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N2/3/E1/2 Pa·m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.

    摘要翻译： 在包括用于通过使用飞行时间（TOF）质谱法测量气体簇离子的尺寸和能量分布的装置的集束离子束照射装置中，在TOF测量仪器之前的阶段中设置用于施加延迟电压的单元，包括 漂移管和电流测量仪器。 通过测量气体团簇离子的尺寸和能量分布并调节电离条件，将具有预定能量和尺寸的簇离子供应到工作表面。 此外，控制离子输送装置中的压力和离子输送长度的乘积，以满足关系式PxL <= 30 / N 2/3 / E 1/2 Pa.m，其中N是用于照射的气体簇离子的大小，E是气体簇离子的动能（eV）。

    Cluster-ion beam irradiation apparatus and method for manufacturing magnetic head element using the same
    3.
    发明申请
    Cluster-ion beam irradiation apparatus and method for manufacturing magnetic head element using the same 失效
    集束离子束照射装置及使用其的磁头元件的制造方法

    公开(公告)号：US20060043317A1

    公开(公告)日：2006-03-02

    申请号：US11173023

    申请日：2005-07-05

    申请人： Shigeru Ono ,  Shinji Sasaki ,  Kenji Furusawa ,  Jiro Matsuo ,  Toshio Seki

    发明人： Shigeru Ono ,  Shinji Sasaki ,  Kenji Furusawa ,  Jiro Matsuo ,  Toshio Seki

    IPC分类号： H01J37/08

    CPC分类号： H01J37/3053 ,  H01J2237/04756 ,  H01J2237/0812 ,  H01J2237/304

    摘要： In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N2/3/E1/2 Pa.m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.

    摘要翻译： 在包括用于通过使用飞行时间（TOF）质谱法测量气体簇离子的尺寸和能量分布的装置的集束离子束照射装置中，在TOF测量仪器之前的阶段中设置用于施加延迟电压的单元，包括 漂移管和电流测量仪器。 通过测量气体团簇离子的尺寸和能量分布并调节电离条件，将具有预定能量和尺寸的簇离子供应到工作表面。 此外，控制离子输送装置中的压力和离子输送长度的乘积，以满足关系式PxL <= 30 / N 2/3 / E 1/2 Pa.m，其中N是用于照射的气体簇离子的大小，E是气体簇离子的动能（eV）。

    Plasma processing apparatus with real-time particle filter
    4.
    发明授权
    Plasma processing apparatus with real-time particle filter 失效
    具有实时粒子滤波器的等离子体处理装置

    公开(公告)号：US06875326B2

    公开(公告)日：2005-04-05

    申请号：US10319695

    申请日：2002-12-16

    申请人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

    发明人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

    IPC分类号： H05H1/24 ,  B01J19/08 ,  C23C14/32 ,  C23F4/00 ,  H01J37/32 ,  H01L21/203 ,  H01L21/302 ,  C23C14/00 ,  C23C16/00

    CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/3266

    摘要： A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.

    摘要翻译： 等离子体处理装置包括：通过使用阴极电弧放电来产生等离子体的等离子体生成单元，排列成一行的第一和第二磁场导管，用于输送等离子体，该等离子体的一端与等离子体产生单元连接;处理室 连接到行单元的另一端并且具有用于保持要处理的基板的台。 在电弧放电开始之后的预定时间期间或在电弧放电结束之前的预定时间段期间，提供用于覆盖等离子体的快门。 快门设置在第一磁场通道和待处理基板之间，并且是可移动的。 快门能够被提供电压，并且保持在与处理室电绝缘的状态。

    Plasma processing apparatus with real-time particle filter
    5.
    发明授权
    Plasma processing apparatus with real-time particle filter 有权
    具有实时粒子滤波器的等离子体处理装置

    公开(公告)号：US06638403B1

    公开(公告)日：2003-10-28

    申请号：US09644072

    申请日：2000-08-23

    申请人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

    发明人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

    IPC分类号： C23C1400

    CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/3266

    摘要： In the plasma processing device which utilizes a low pressure arc discharge, a method for efficiently capturing and removing electrically charged particles and neutral particles having no charge which are at most 5 &mgr;m in particle diameter is demanded. The electrically charged particles can be captured efficiently by installing an electric field filter in a transportation course of plasma. The electric field filter has a cylindrical structure which is uneven in inner wall shape. A voltage in the range of 10 to 90 V is applied to the electric field filter. The neutral filters can be captured efficiently by installing a neutral filter having an opening sectional area which is at most 40% of a sectional area of the transportation course.

    摘要翻译： 在使用低压电弧放电的等离子体处理装置中，要求有效地捕获和去除带电粒子的方法和粒径不超过5μm的无电荷的中性粒子。 通过在等离子体的输送过程中安装电场滤波器可以有效地捕获带电粒子。 电场滤波器具有内壁形状不均匀的圆筒状结构。 对电场滤波器施加10〜90V范围的电压。 可以通过安装具有开口截面积至多为运输路线横截面面积的40％的中性过滤器来有效地捕获中性过滤器。

    Magnetic head slider and method of manufacturing the same
    8.
    发明授权
    Magnetic head slider and method of manufacturing the same 失效
    磁头滑块及其制造方法

    公开(公告)号：US07147540B2

    公开(公告)日：2006-12-12

    申请号：US10384310

    申请日：2003-03-06

    申请人： Hideaki Tanaka ,  Kenji Furusawa ,  Takateru Seki ,  Akio Takakura ,  Yukihiro Isono

    发明人： Hideaki Tanaka ,  Kenji Furusawa ,  Takateru Seki ,  Akio Takakura ,  Yukihiro Isono

    IPC分类号： B24B49/10

    CPC分类号： G11B5/6005 ,  Y10T29/49048

    摘要： In order to realize a shape of an air bearing surface of a magnetic head slider which is capable of coping with a lowering of flying height and which has high reliability, at the time of polishing the air bearing surface of the magnetic head slider by bringing the air bearing surface and the surface of a polishing machine into contact with each other, machining is conducted in the condition where the stiffness acting between both the members is enhanced, and the standard deviation of the flatness of the air bearing surface machined and the standard deviation of the recess amount between the air bearing surface and a magnetic element are controlled. Thus, it is possible to efficiently manufacture a magnetic head slider which enables driving at a low flying height.

    摘要翻译： 为了实现能够应对飞行高度的降低并且具有高可靠性的磁头滑块的空气轴承表面的形状，在通过使磁头滑块的空气支承表面进行研磨时， 空气轴承表面和抛光机的表面彼此接触，在两个构件之间作用的刚度增强的情况下进行机械加工，并且空气轴承表面的平面度的标准偏差和标准偏差 控制空气轴承表面和磁性元件之间的凹陷量。 因此，可以有效地制造能够以低飞行高度驾驶的磁头滑块。

    Magnetic head slider and method of manufacturing the same
    9.
    发明申请
    Magnetic head slider and method of manufacturing the same 失效
    磁头滑块及其制造方法

    公开(公告)号：US20050280941A9

    公开(公告)日：2005-12-22

    申请号：US10384310

    申请日：2003-03-06

    申请人： Hideaki Tanaka ,  Kenji Furusawa ,  Takateru Seki ,  Akio Takakura ,  Yukihiro Isono

    发明人： Hideaki Tanaka ,  Kenji Furusawa ,  Takateru Seki ,  Akio Takakura ,  Yukihiro Isono

    IPC分类号： G11B5/60

    CPC分类号： G11B5/6005 ,  Y10T29/49048

    摘要： In order to realize a shape of an air bearing surface of a magnetic head slider which is capable of coping with a lowering of flying height and which has high reliability, at the time of polishing the air bearing surface of the magnetic head slider by bringing the air bearing surface and the surface of a polishing machine into contact with each other, machining is conducted in the condition where the stiffness acting between both the members is enhanced, and the standard deviation of the flatness of the air bearing surface machined and the standard deviation of the recess amount between the air bearing surface and a magnetic element are controlled. Thus, it is possible to efficiently manufacture a magnetic head slider which enables driving at a low flying height.

    摘要翻译： 为了实现能够应对飞行高度的降低并且具有高可靠性的磁头滑块的空气轴承表面的形状，在通过使磁头滑块的空气支承表面进行研磨时， 空气轴承表面和抛光机的表面彼此接触，在两个构件之间作用的刚度增强的情况下进行机械加工，并且空气轴承表面的平面度的标准偏差和标准偏差 控制空气轴承表面和磁性元件之间的凹陷量。 因此，可以有效地制造能够以低飞行高度驾驶的磁头滑块。