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    Fabrication of trapezoidal pole for magnetic recording
    4.
    发明授权
    Fabrication of trapezoidal pole for magnetic recording 有权
    用于磁记录的梯形极的制造

    公开(公告)号：US08259411B2

    公开(公告)日：2012-09-04

    申请号：US12116798

    申请日：2008-05-07

    申请人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    发明人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3163 ,  C25D5/10 ,  C25D5/14 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021

    摘要： A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross-sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.

    摘要翻译： 描述了形成具有梯形截面的磁性写入极的方法。 该方法包括首先在基底上形成磁性种子层，然后在种子层上沉积可去除的材料层，然后在可移除材料层上形成抗蚀剂层。 然后在抗蚀剂中形成沟槽，并且加热抗蚀剂以使沟槽的横截面轮廓呈现梯形。 然后将抗蚀剂用另一抗蚀剂层封盖，并进一步加热，使梯形沟槽的宽度变窄。 然后去除沟槽底部的覆盖层和可移除材料层，并通过电镀填充磁性材料的沟槽。 最后去除沟槽外部的抗蚀剂和籽晶层以形成具有梯形横截面的写入极。

    Lithography process
    5.
    发明申请
    Lithography process 有权
    平版印刷工艺

    公开(公告)号：US20090004609A1

    公开(公告)日：2009-01-01

    申请号：US11824124

    申请日：2007-06-29

    申请人： XiaoMin Yang ,  Shuaigang Xiao

    发明人： XiaoMin Yang ,  Shuaigang Xiao

    IPC分类号： G03F7/30 ,  G03F7/20 ,  B05D3/02

    CPC分类号： G03F7/70 ,  B82Y10/00 ,  G03F7/2022 ,  G03F7/40 ,  G11B5/743 ,  G11B5/746 ,  G11B5/82 ,  G11B5/855

    摘要： A lithography process for manufacturing bit-island storage mediums that results in improved resolution and uniformity between bit-islands. The lithography process includes applying a resist coating polymer to a surface of a substrate. Selected areas of the resist coating polymer are then exposed to an energy source, wherein each selected area is exposed to the energy source multiple times to provide a time-averaged exposure of the selected areas that reduces errors caused by noise associated with the energy source. After exposure of the resist coating to the energy source, a selective developer solution is applied to the resist coating to develop the fully exposed regions of the resist coating while leaving undeveloped the partially exposed regions of the resist coating. A polymer reflow material is applied to the developed resist pattern and heated to a selected temperature. The polymer reflow material and selected temperature induce reflow of the developed resist coating such that such that a circumferential diameter associated with the holes formed in the resist pattern is reduced to a desired value distance. The process of inducing reflow of the resist coating can be repeated as desired to achieve a resist pattern wherein the holes formed in the resist pattern are reduced to a desired size. The resist pattern formed on the substrate is then transferred to a magnetic medium to form the desired pattern of bit-islands.

    摘要翻译： 用于制造比特岛存储介质的光刻工艺，其导致位岛之间的分辨率和均匀性得到改善。 光刻工艺包括将抗蚀涂层聚合物涂覆在基材的表面上。 然后将抗蚀剂涂层聚合物的选定区域暴露于能量源，其中每个选择的区域多次暴露于能量源，以提供所选区域的时间平均曝光，其减少由与能量源相关联的噪声引起的误差。 在将抗蚀剂涂层暴露于能量源之后，将选择性显影剂溶液施加到抗蚀剂涂层上，以形成抗蚀剂涂层的完全曝光区域，同时留下未显影抗蚀剂涂层的部分曝光区域。 将聚合物回流材料施加到显影的抗蚀剂图案上并加热至选定的温度。 聚合物回流材料和所选择的温度引起显影的抗蚀剂涂层的回流，使得与形成在抗蚀剂图案中的孔相关联的圆周直径减小到期望的值距离。 可以根据需要重复感应抗蚀剂涂层的回流的过程，以实现抗蚀剂图案，其中形成在抗蚀剂图案中的孔被还原成所需的尺寸。 然后将形成在基板上的抗蚀剂图案转移到磁性介质以形成所需的位岛图案。

    Lithography process
    6.
    发明授权
    Lithography process 有权

    公开(公告)号：US08404432B2

    公开(公告)日：2013-03-26

    申请号：US11824124

    申请日：2007-06-29

    申请人： XiaoMin Yang ,  Shuaigang Xiao

    发明人： XiaoMin Yang ,  Shuaigang Xiao

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70 ,  B82Y10/00 ,  G03F7/2022 ,  G03F7/40 ,  G11B5/743 ,  G11B5/746 ,  G11B5/82 ,  G11B5/855

    摘要： A lithography process for manufacturing bit-island storage mediums that results in improved resolution and uniformity between bit-islands. The lithography process includes applying a resist coating polymer to a surface of a substrate. Selected areas of the resist coating polymer are then exposed to an energy source, wherein each selected area is exposed to the energy source multiple times to provide a time-averaged exposure of the selected areas that reduces errors caused by noise associated with the energy source. After exposure of the resist coating to the energy source, a selective developer solution is applied to the resist coating to develop the fully exposed regions of the resist coating while leaving undeveloped the partially exposed regions of the resist coating. A polymer reflow material is applied to the developed resist pattern and heated to a selected temperature. The polymer reflow material and selected temperature induce reflow of the developed resist coating such that such that a circumferential diameter associated with the holes formed in the resist pattern is reduced to a desired value distance. The process of inducing reflow of the resist coating can be repeated as desired to achieve a resist pattern wherein the holes formed in the resist pattern are reduced to a desired size. The resist pattern formed on the substrate is then transferred to a magnetic medium to form the desired pattern of bit-islands.

    POLE FOR MAGNETIC RECORDING
    7.
    发明申请
    POLE FOR MAGNETIC RECORDING 有权
    磁记录

    公开(公告)号：US20130010387A1

    公开(公告)日：2013-01-10

    申请号：US13602915

    申请日：2012-09-04

    申请人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    发明人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3163 ,  C25D5/10 ,  C25D5/14 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021

    摘要： A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross-sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.

    摘要翻译： 描述了形成具有梯形截面的磁性写入极的方法。 该方法包括首先在基底上形成磁性种子层，然后在种子层上沉积可去除的材料层，然后在可移除材料层上形成抗蚀剂层。 然后在抗蚀剂中形成沟槽，并且加热抗蚀剂以使沟槽的横截面轮廓呈现梯形。 然后将抗蚀剂用另一抗蚀剂层封盖，并进一步加热，使梯形沟槽的宽度变窄。 然后去除沟槽底部的覆盖层和可移除材料层，并通过电镀填充磁性材料的沟槽。 最后去除沟槽外部的抗蚀剂和籽晶层以形成具有梯形横截面的写入极。

    METHOD OF MAKING OPTICAL TRANSDUCERS
    8.
    发明申请
    METHOD OF MAKING OPTICAL TRANSDUCERS 审中-公开
    制造光学传感器的方法

    公开(公告)号：US20100104768A1

    公开(公告)日：2010-04-29

    申请号：US12260228

    申请日：2008-10-29

    申请人： Shuaigang Xiao ,  XiaoMin Yang ,  Keith Mountfield

    发明人： Shuaigang Xiao ,  XiaoMin Yang ,  Keith Mountfield

    IPC分类号： B05D3/06 ,  B05D5/12

    CPC分类号： G11B5/3163 ,  G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A process for making an optical transducer that includes depositing a lower molecular weight first layer and a higher molecular weight second layer. E-beam radiation is applied to the first and second layers which are developed to form an aperture. The aperture includes a resist protrusion in the second layer. The resist protrusion protrudes outward beyond the first layer. Metal is evaporated through the aperture to form the optical transducer. The resist protrusion defines a shape of a concave metal transducer corner.

    摘要翻译： 一种制造光学换能器的方法，包括沉积较低分子量的第一层和较高分子量的第二层。 将电子束辐射施加到被显影以形成孔的第一和第二层。 孔包括在第二层中的抗蚀剂突起。 抗蚀剂突起向外突出超出第一层。 金属通过孔被蒸发以形成光学换能器。 抗蚀剂突起限定凹形金属转换器角的形状。

    FABRICATION OF TRAPEZOIDAL POLE FOR MAGNETIC RECORDING
    9.
    发明申请
    FABRICATION OF TRAPEZOIDAL POLE FOR MAGNETIC RECORDING 有权
    用于磁记录的铁皮石的制造

    公开(公告)号：US20090279206A1

    公开(公告)日：2009-11-12

    申请号：US12116798

    申请日：2008-05-07

    申请人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    发明人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    IPC分类号： G11B5/127 ,  C25D5/02

    CPC分类号： G11B5/3163 ,  C25D5/10 ,  C25D5/14 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021

    摘要： A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross-sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.

    摘要翻译： 描述了形成具有梯形截面的磁性写入极的方法。 该方法包括首先在基底上形成磁性种子层，然后在种子层上沉积可去除的材料层，然后在可移除材料层上形成抗蚀剂层。 然后在抗蚀剂中形成沟槽，并且加热抗蚀剂以使沟槽的横截面轮廓呈现梯形。 然后将抗蚀剂用另一抗蚀剂层封盖，并进一步加热，使梯形沟槽的宽度变窄。 然后去除沟槽底部的覆盖层和可移除材料层，并通过电镀填充磁性材料的沟槽。 最后去除沟槽外部的抗蚀剂和籽晶层以形成具有梯形横截面的写入极。

    Pole for magnetic recording
    10.
    发明授权
    Pole for magnetic recording 有权
    极磁记录

    公开(公告)号：US08848315B2

    公开(公告)日：2014-09-30

    申请号：US13602915

    申请日：2012-09-04

    申请人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    发明人： XiaoMin Yang ,  Shuaigang Xiao ,  Jie Gong ,  Michael Seigler

    IPC分类号： G11B5/127 ,  C25D5/10 ,  C25D5/14 ,  G11B5/31 ,  G11B5/187

    CPC分类号： G11B5/3163 ,  C25D5/10 ,  C25D5/14 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021

    摘要： A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross -sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.

    摘要翻译： 描述了形成具有梯形截面的磁性写入极的方法。 该方法包括首先在基底上形成磁性种子层，然后在种子层上沉积可去除的材料层，然后在可移除材料层上形成抗蚀剂层。 然后在抗蚀剂中形成沟槽，并且加热抗蚀剂以使沟槽的横截面呈现呈梯形。 然后将抗蚀剂用另一抗蚀剂层封盖，并进一步加热，使梯形沟槽的宽度变窄。 然后去除沟槽底部的覆盖层和可移除材料层，并通过电镀填充磁性材料的沟槽。 最后去除沟槽外部的抗蚀剂和籽晶层以形成具有梯形横截面的写入极。