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公开(公告)号：US11264216B2
公开(公告)日：2022-03-01
申请号：US13148384
申请日：2009-12-30
摘要： The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set.
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公开(公告)号：US20110308941A1
公开(公告)日：2011-12-22
申请号：US13148384
申请日：2009-12-30
IPC分类号： C23C14/24
CPC分类号： H01J37/3266 , C23C14/325 , H01J37/32055 , H01J37/3455 , H01J37/3458
摘要： The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set.
摘要翻译： 本发明涉及一种用于在工具上产生硬表面涂层的电弧蒸发源。 本发明包括电弧蒸发源，其包括至少一个电螺线管和相对于目标表面可移位的永磁体装置。 蒸发源可以根据氧化物，氮化物或金属涂层的不同要求进行调整。 可以通过适当地调节永久磁铁与目标的前侧的距离，使待蒸发的目标的寿命期间的速率下降保持不变或调节。 可以设置涂层粗糙度和速率之间的折衷。
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公开(公告)号：US20110220495A1
公开(公告)日：2011-09-15
申请号：US13127489
申请日：2009-10-08
CPC分类号： H01J37/32 , C23F1/08 , H01J37/32009 , H01J37/32055
摘要： The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target.
摘要翻译： 点火装置技术领域本发明涉及一种用于点燃真空镀膜系统中电弧蒸发器的高电流放电的点火装置。 通过机械地闭合和打开阴极和阳极之间的接触来进行点火。 通过可在强制路径上移动的点火指示器建立接触。 由于强制路径，点火指可以通过简单的机械驱动移动到停止位置，防止被涂覆，并且所述点火指也可用于点燃第二目标。
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公开(公告)号：US09657389B2
公开(公告)日：2017-05-23
申请号：US13641499
申请日：2011-01-10
IPC分类号： C23C14/00 , C23C14/32 , H01J37/305 , H01J37/32
CPC分类号： C23C14/325 , H01J37/305 , H01J37/32614
摘要： The present invention relates to a target for an ARC source having a first body (3) of a material to be vaporized, which essentially comprises in one plane a surface which is intended to be vaporized, wherein the surface surrounds in this plane a central area, characterized in that in the central area a second body (7) is provided, which is preferably in the form of a disk and is electrically isolated from the first body (3), in such a way that the second body (7) can essentially provide no electrons for maintaining a spark.
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公开(公告)号：US20130126347A1
公开(公告)日：2013-05-23
申请号：US13805730
申请日：2011-06-03
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/0089 , C23C14/021 , C23C14/325 , C23C14/5873 , H01J37/32055
摘要： The invention relates to an arc deposition device, comprising a cathode, an anode, as well as a voltage source for putting the anode at positive potential relative to the cathode. The device also comprises magnetic elements, which cause a magnetic field over the cathode surface, wherein the anode is arranged in the vicinity of the cathode in such a way that the magnetic field lines exiting from the cathode surface hit the anode.
摘要翻译： 本发明涉及一种电弧沉积装置，其包括阴极，阳极以及用于将阳极相对于阴极置于正电位的电压源。 该装置还包括在阴极表面上产生磁场的磁性元件，其中阳极被布置在阴极附近，使得从阴极表面离开的磁场线撞击阳极。
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公开(公告)号：US09226379B2
公开(公告)日：2015-12-29
申请号：US14343549
申请日：2012-08-29
CPC分类号： H05H1/24 , H01J27/022 , H01J37/32045 , H01J37/32064
摘要： The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.
摘要翻译： 本发明涉及一种以浮动方式设置在真空室上的等离子体源，其中等离子体源包括源壳体，并且灯丝设置在源壳体中并且被布置成与其绝缘，其中用于 提供测量源壳体和灯丝之间的电位降。 测量的电位降可用于调节灯丝的电压加热。 根据本发明，提供了相应的装置。
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公开(公告)号：US10253407B2
公开(公告)日：2019-04-09
申请号：US13805730
申请日：2011-06-03
摘要： The invention relates to an arc deposition device, comprising a cathode, an anode, as well as a voltage source for putting the anode at positive potential relative to the cathode. The device also comprises magnetic elements, which cause a magnetic field over the cathode surface, wherein the anode is arranged in the vicinity of the cathode in such a way that the magnetic field lines exiting from the cathode surface hit the anode.
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公开(公告)号：US20140217892A1
公开(公告)日：2014-08-07
申请号：US14343549
申请日：2012-08-29
IPC分类号： H05H1/24
CPC分类号： H05H1/24 , H01J27/022 , H01J37/32045 , H01J37/32064
摘要： The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.
摘要翻译： 本发明涉及一种以浮动方式设置在真空室上的等离子体源，其中等离子体源包括源壳体，并且灯丝设置在源壳体中并且被布置成与其绝缘，其中用于 提供测量源壳体和灯丝之间的电位降。 测量的电位降可用于调节灯丝的电压加热。 根据本发明，提供了相应的装置。
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9.发明申请TARGET FOR SPARK VAPORIZATION WITH PHYSICAL LIMITING OF THE PROPAGATION OF THE SPARK 有权用于火山喷发的目标用于火山喷发的物理限制公开(公告)号：US20130126348A1
公开(公告)日：2013-05-23
申请号：US13641499
申请日：2011-01-10
IPC分类号： C23C14/32
CPC分类号： C23C14/325 , H01J37/305 , H01J37/32614
摘要： The present invention relates to a target for an ARC source having a first body (3) of a material to be vaporized, which essentially comprises in one plane a surface which is intended to be vaporized, wherein the surface surrounds in this plane a central area, characterized in that in the central area a second body (7) is provided, which is preferably in the form of a disk and is electrically isolated from the first body (3), in such a way that the second body (7) can essentially provide no electrons for maintaining a spark.
摘要翻译： 本发明涉及一种用于具有待蒸发的材料的第一主体（3）的ARC源的靶，其基本上在一个平面中包括要被蒸发的表面，其中该表面在该平面中包围中心区域 其特征在于，在所述中央区域中，设置有第二主体（7），所述第二主体（7）优选地为盘的形式，并且与所述第一主体（3）电隔离，使得所述第二主体（7）能够 基本上不提供用于维持火花的电子。
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公开(公告)号：US20090260977A1
公开(公告)日：2009-10-22
申请号：US12427021
申请日：2009-04-21
CPC分类号： H01J37/32 , H01J2237/334
摘要： Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.
摘要翻译： 安装在转盘（19）上的工件的行星架（22）设置在真空室内。 提供了用于包含离子（CL）的云的源（24），使得云的中心轴（ACL）拦截转盘（19）的旋转轴线（A20）。 云（CL）在行星轴（A22）的移动路径（T）处具有离离约定中心轴（ACL）一定距离处的最大离子密度的50％的离子密度分布， 行星架（22）的直径。 当行星齿轮架（22）上的工件被包含离子的云所蚀刻时，被蚀刻掉的物质基本上不会重新沉积在相邻的行星架上，而是朝向真空室的壁喷射。
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