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公开(公告)号:US20140225182A1
公开(公告)日:2014-08-14
申请号:US14253690
申请日:2014-04-15
申请人: Soitec
发明人: Mohamad A. Shaheen , Frederic Allibert , Gweltaz Gaudin , Fabrice Lallement , Didier Landru , Karine Landry , Carlos Mazure
IPC分类号: H01L29/786
CPC分类号: H01L29/78603 , H01L29/32 , H01L29/7841 , H01L31/0248
摘要: A substrate comprises a base wafer, an insulating layer over the base wafer, and a top semiconductor layer over the insulating layer on a side thereof opposite the base wafer. The insulating layer comprises a charge-confining layer confined on one or both sides with diffusion barrier layers, wherein the charge-confining layer has a density of charges in absolute value higher than 1010 charges/cm2. Alternatively, the insulating layer comprises charge-trapping islands embedded therein, wherein the charge-trapping islands have a total density of charges in absolute value higher than 1010 charges/cm2.
摘要翻译: 衬底包括基底晶片,在基底晶片上方的绝缘层,以及在与基底晶片相对的一侧上的绝缘层上的顶部半导体层。 绝缘层包括限制在具有扩散阻挡层的一侧或两侧的电荷限制层,其中电荷限制层的绝对值的电荷密度高于1010电荷/ cm 2。 或者,绝缘层包括嵌入其中的电荷捕获岛,其中电荷捕获岛具有高于1010电荷/ cm 2的绝对值的电荷的总密度。
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公开(公告)号:US08625374B2
公开(公告)日:2014-01-07
申请号:US13718571
申请日:2012-12-18
申请人: Soitec
发明人: Carlos Mazure , Richard Ferrant , Bich-Yen Nguyen
IPC分类号: G11C7/00 , G11C11/4091
CPC分类号: G11C7/08 , G11C7/06 , G11C7/067 , G11C7/18 , G11C11/4091 , G11C11/4097 , G11C2211/4016
摘要: A sense amplifier for a series of cells of a memory, including a writing stage comprising a CMOS inverter, the input of which is directly or indirectly connected to an input terminal of the sense amplifier, and the output of which is connected to an output terminal of the sense amplifier intended to be connected to a local bitline addressing the cells of the series, and a reading stage that includes a sense transistor, the gate of which is connected to the output of the inverter and the drain of which is connected to the input of the inverter.
摘要翻译: 一种用于存储器的一系列单元的读出放大器,包括一个写入级,它包括一个CMOS反相器,其输入直接或间接地连接到读出放大器的输入端,并且其输出端连接到输出端 所述读出放大器旨在连接到寻址该串联的单元的本地位线;以及读取级,其包括检测晶体管,其栅极连接到反相器的输出端,其漏极连接到 输入变频器。
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公开(公告)号:US20140015023A1
公开(公告)日:2014-01-16
申请号:US14027528
申请日:2013-09-16
申请人: Soitec
发明人: Frederic Allibert , Gweltaz Gaudin , Fabrice Lallement , Didier Landru , Karine Landry , Carlos Mazure , Mohamad A. Shaheen
IPC分类号: H01L31/0248
CPC分类号: H01L29/78603 , H01L29/32 , H01L29/7841 , H01L31/0248
摘要: Embodiments of the invention relate to substrates comprising a base wafer, an insulating layer and a top semiconductor layer, wherein the insulating layer comprises at least a zone wherein a density of charges is in absolute value higher than 1010 charges/cm2. The invention also relates to processes for making such substrates.
摘要翻译: 本发明的实施例涉及包括基底晶片,绝缘层和顶部半导体层的基板,其中绝缘层至少包括电荷密度高于1010电荷/ cm 2的绝对值的区域。 本发明还涉及制造这种基材的方法。
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公开(公告)号:US20150145049A1
公开(公告)日:2015-05-28
申请号:US14396665
申请日:2013-05-08
申请人: Soitec
发明人: Franz Hoffman , Richard Ferrant , Carlos Mazure
IPC分类号: H01L27/108 , H01L27/092
CPC分类号: H01L27/10802 , H01L27/092 , H01L27/1203 , H01L29/7841
摘要: The present invention relates to a floating body memory cell comprising: a first MOS transistor and a second MOS transistor, wherein at least the second MOS transistor has a floating body; and wherein the first and second MOS transistors are configured such that charges can be moved to/from the floating body of the second MOS transistor via the first MOS transistor.
摘要翻译: 本发明涉及一种浮体存储单元,包括:第一MOS晶体管和第二MOS晶体管,其中至少第二MOS晶体管具有浮体; 并且其中所述第一和第二MOS晶体管被配置为使得电荷可以经由所述第一MOS晶体管移动到所述第二MOS晶体管的浮体。
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公开(公告)号:US08735946B2
公开(公告)日:2014-05-27
申请号:US14027528
申请日:2013-09-16
申请人: Soitec
发明人: Mohamad A Shaheen , Frederic Allibert , Gweltaz Gaudin , Fabrice Lallement , Didier Landru , Karine Landry , Carlos Mazure
IPC分类号: H01L27/148
CPC分类号: H01L29/78603 , H01L29/32 , H01L29/7841 , H01L31/0248
摘要: Embodiments of the invention relate to substrates comprising a base wafer, an insulating layer and a top semiconductor layer, wherein the insulating layer comprises at least a zone wherein a density of charges is in absolute value higher than 1010 charges/cm2. The invention also relates to processes for making such substrates.
摘要翻译: 本发明的实施例涉及包括基底晶片,绝缘层和顶部半导体层的基板,其中绝缘层至少包括电荷密度高于1010电荷/ cm 2的绝对值的区域。 本发明还涉及制造这种基材的方法。
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