公开(公告)号：US20130011711A1

公开(公告)日：2013-01-10

申请号：US13177674

申请日：2011-07-07

申请人： Steven L. Peace ,  Kevin B. Witt

发明人： Steven L. Peace ,  Kevin B. Witt

IPC分类号： H01M4/36 ,  H01M2/08 ,  H01M10/04 ,  H01M2/00

CPC分类号： H01M8/188 ,  Y02E60/528 ,  Y10T29/49108 ,  Y10T29/4911

摘要： An energy storage cell charged and discharged by electrolyte fluid. The cell includes a module that comprises a wall that separates an anode plate from a cathode plate. An anode hub is connected to the anode plate and a cathode hub is connected to the cathode plate. The anode hub and cathode hub are assembled together through an opening in the wall. An electrical connector connects the anode hub to the cathode hub to electrically connect the anode plate to the cathode plate maintaining the plates on separate sides of the wall at the same electrical potential. A plurality of energy storage cells are connected together to provide a flow cell battery system.

摘要翻译： 由电解质液体充放电的储能单元。 电池包括模块，其包括将阳极板与阴极板分离的壁。 阳极集线器连接到阳极板，阴极集线器连接到阴极板。 阳极轮毂和阴极轮毂通过壁中的开口组装在一起。 电连接器将阳极轮毂连接到阴极轮毂，以将阳极板电连接到阴极板，从而在相同的电势下将板保持在壁的分开的两侧。 多个能量存储单元连接在一起以提供流动池电池系统。

公开(公告)号：US06969682B2

公开(公告)日：2005-11-29

申请号：US10693668

申请日：2003-10-24

申请人： Kyle M. Hanson ,  Paul Z. Wirth ,  Steven L. Peace ,  Jon Kuntz ,  Scott A. Bruner

发明人： Kyle M. Hanson ,  Paul Z. Wirth ,  Steven L. Peace ,  Jon Kuntz ,  Scott A. Bruner

IPC分类号： H01L21/00 ,  H01L21/3213 ,  H01L21/311

CPC分类号： H01L21/6715 ,  H01L21/32134 ,  H01L21/67017 ,  Y10S438/906 ,  Y10S438/913

摘要： A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment pins, and a lower rotor having one or more openings for receiving the alignment pins to form a processing chamber around the workpiece. The alignment pins center the workpiece relative to a rotor spin axis and to an etch or drain groove in the upper rotor. A first fluid outlet delivers processing fluid to a central region of the workpiece. The processing fluid is distributed across the workpiece surface via centrifugal force generated by spinning the processing chamber. Purge gas is optionally delivered into the processing chamber through an annular opening around the first fluid outlet to help remove processing fluid from the processing chamber.

摘要翻译： 用于处理晶片的系统包括可在外壳内移动以将工件加载和卸载到工件处理器中的机器人。 处理器包括具有对准销的上转子和具有一个或多个开口的下转子，用于接收对准销以在工件周围形成处理室。 对准销使工件相对于转子旋转轴线和上转子中的蚀刻或排水槽居中。 第一流体出口将处理流体输送到工件的中心区域。 处理液通过旋转处理室产生的离心力分布在工件表面上。 吹扫气体可选地通过围绕第一流体出口的环形开口输送到处理室中，以帮助从处理室去除处理流体。

公开(公告)号：US06692613B2

公开(公告)日：2004-02-17

申请号：US10223974

申请日：2002-08-20

申请人： Steven L. Peace ,  Gary L. Curtis ,  Raymon F. Thompson ,  Brian Aegerter ,  Curt T. Dundas

发明人： Steven L. Peace ,  Gary L. Curtis ,  Raymon F. Thompson ,  Brian Aegerter ,  Curt T. Dundas

IPC分类号： H01L2348

CPC分类号： H01L21/6715 ,  B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6708 ,  Y10S118/90 ,  Y10S438/906 ,  Y10S438/913

摘要： A method for processing a semiconductor wafer or similar article includes the step of spinning the wafer and applying a fluid to a first side of the wafer, while it is spinning. The fluid flows radially outwardly in all directions, over the first side of the wafer, via centrifugal force. As the fluid flows off of the circumferential edge of the wafer, it is contained in an annular reservoir, so that the fluid also flows onto an outer annular area of the second side of the wafer. An opening allows fluid to flow out of the reservoir. The opening defines the location of a parting line beyond which the fluid will not travel on the second side of the wafer. An apparatus for processing a semiconductor wafer or similar article includes a reactor having a processing chamber formed by upper and lower rotors. The wafer is supported between the rotors. The rotors are rotated by a spin motor. A processing fluid is introduced onto the top or bottom surface of the wafer, or onto both surfaces, at a central location. The fluid flows outwardly uniformly and in all directions. A wafer support automatically lifts the wafer, so that it can be removed from the reactor by a robot, when the rotors separate from each other after processing.

摘要翻译： 用于处理半导体晶片或类似物品的方法包括在旋转晶片时旋转晶片并将其施加到晶片的第一侧的步骤。 流体通过离心力在晶片的第一侧上在所有方向上径向向外流动。 当流体从晶片的圆周边缘流出时，其被包含在环形储存器中，使得流体也流到晶片的第二侧的外部环形区域。 开口允许流体从储存器流出。 开口限定分流线的位置，超过该分隔线，流体不会在晶片的第二侧上行进。 用于处理半导体晶片或类似物品的装置包括具有由上下转子形成的处理室的反应器。 晶片支撑在转子之间。 转子由旋转电机旋转。 处理流体在中心位置被引入到晶片的顶表面或底表面上，或在两个表面上。 流体向外均匀地向各个方向流动。 晶片支架自动提升晶片，从而当转子在加工后彼此分离时，可以通过机器人将其从反应器中移除。

公开(公告)号：US06423642B1

公开(公告)日：2002-07-23

申请号：US09437711

申请日：1999-11-10

申请人： Steven L. Peace ,  Gary L. Curtis ,  Raymon F. Thompson ,  Brian Aegerter ,  Curt T. Dundas

发明人： Steven L. Peace ,  Gary L. Curtis ,  Raymon F. Thompson ,  Brian Aegerter ,  Curt T. Dundas

IPC分类号： H01L21311

CPC分类号： H01L21/6715 ,  B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6708 ,  Y10S118/90 ,  Y10S438/906 ,  Y10S438/913

摘要： A method for processing a semiconductor wafer or similar article includes the step of spinning the wafer and applying a fluid to a first side of the wafer, while it is spinning. The fluid flows radially outwardly in all directions, over the first side of the wafer, via centrifugal force. As the fluid flows off of the circumferential edge of the wafer, it is contained in an annular reservoir, so that the fluid also flows onto an outer annular area of the second side of the wafer. An opening allows fluid to flow out of the reservoir. The opening defines the location of a parting line beyond which the fluid will not travel on the second side of the wafer. An apparatus for processing a semiconductor wafer or similar article includes a reactor having a processing chamber formed by upper and lower rotors. The wafer is supported between the rotors. The rotors are rotated by a spin motor. A processing fluid is introduced onto the top or bottom surface of the wafer, or onto both surfaces, at a central location. The fluid flows outwardly uniformly and in all directions. A wafer support automatically lifts the wafer, so that it can be removed from the reactor by a robot, when the rotors separate from each other after processing.

公开(公告)号：US5132017A

公开(公告)日：1992-07-21

申请号：US685860

申请日：1991-04-16

申请人： Thomas E. Birdsong ,  Steve O. Mork ,  Steven L. Peace

发明人： Thomas E. Birdsong ,  Steve O. Mork ,  Steven L. Peace

IPC分类号： B01D61/08 ,  B01D61/10 ,  B01D61/12

CPC分类号： B01D61/12 ,  B01D61/08 ,  B01D61/10

摘要： A reverse osmosis method includes a sediment filter which cleans feed water from a source and from which that feed water is fed to a reverse osmosis membrane filter. Permeate from the latter is fed to a bladder within a storage tank. Concentrate from the membrane filter is fed to and used within the storage tank as squeeze water for the bladder. When a faucet that delivers permeate to the user is open, squeeze water is used to cause permeate to flow out of the storage tank through an impurity filter to supply the faucet. A valve unit is included to control the amount of squeeze water fed to the storage tank and to regulate permeate flow so that the water outletted from the faucet remains at a constant pressure and provides relief as against overpressure in the system. A proportioning valve within the valve unit serves to maintain at all times a constant ratio of concentrate to permeate flow through the membrane filter for adequate cleansing of the membrane. Also included are input-side and output-side flow monitors which provide signals to a processor that serves to indicate the status of filter conditions. There also is an advantageous faucet assembly for controlling the delivery of permeate to the user with flexibility and convenience.

摘要翻译： 反渗透方法包括沉淀过滤器，其从源中清洗进料水，并将进料水从其中供给到反渗透膜过滤器。 后者的渗透液被送入储罐内的膀胱。 将来自膜过滤器的浓缩物作为用于膀胱的挤压水供给到储罐内并使用。 当向使用者传递渗透物的水龙头是开放的时，使用挤压水来使渗透物通过杂质过滤器从储罐流出以供应水龙头。 包括阀单元以控制供给到储罐的挤压水的量并且调节渗透物流，使得从龙头出来的水保持在恒定压力并且提供缓解以防止系统中的过压。 阀单元内的比例阀用于始终保持浓缩物与透过膜过滤器之间的恒定比例，以充分清洁膜。 还包括输入侧和输出侧流量监视器，其为处理器提供信号，用于指示过滤条件的状态。 还有一种有利的龙头组件，用于控制渗透物向用户的输送，具有灵活性和方便性。

公开(公告)号：US20130029195A1

公开(公告)日：2013-01-31

申请号：US13192943

申请日：2011-07-28

申请人： Steven L. Peace

发明人： Steven L. Peace

IPC分类号： H01M8/20 ,  H01M8/00 ,  H01M2/40

CPC分类号： H01M8/188 ,  Y02E60/528 ,  Y10T29/49108

摘要： A stacked cell battery including anode plates and cathode plates that define an anolyte chamber and a catholyte chamber that are divided by a separator membrane. Perimeter flanges of the anode plate and cathode plate may define a seal retainer on the plate that extends between the perimeter flanges and the housing. Alternatively, an over-molded seal may be provided on the flanges of the anode plate and cathode plate that extends between the flanges and the housing.

摘要翻译： 包括阳极板和阴极板的堆叠电池电池，其限定阳极电解液室和由分隔膜分隔的阴极电解液室。 阳极板和阴极板的周边凸缘可以在板上限定在周边凸缘和壳体之间延伸的密封保持器。 或者，可以在凸缘和壳体之间延伸的阳极板和阴极板的凸缘上设置过度密封。

公开(公告)号：US20130029194A1

公开(公告)日：2013-01-31

申请号：US13192834

申请日：2011-07-28

申请人： Steven L. Peace

发明人： Steven L. Peace

IPC分类号： H01M2/40 ,  H01M8/18

CPC分类号： H01M8/188 ,  Y02E60/528 ,  Y02P70/56 ,  Y10T29/4911

摘要： A flow cell battery system includes a plurality of stacked cells that include an anode plate and a cathode plate that are separated by a seal layer off an inner side of the anode plates and cathode plates. An outer side of the anode plates and cathode plates is disposed in an anolyte flow path and a catholyte flow path, respectively. A membrane acts as a barrier between the anolyte flow path and the catholyte flow path. A flow screen may be provided in the flow paths to mix the anolyte and catholyte in the respective flow paths.

摘要翻译： 流动池电池系统包括多个堆叠的电池，其包括由阳极板和阴极板的内侧隔开的密封层的阳极板和阴极板。 阳极板和阴极板的外侧分别设置在阳极电解液流路和阴极电解液流路中。 膜用作阳极电解液流动路径和阴极电解液流动路径之间的屏障。 可以在流动路径中设置流动筛以在相应的流动路径中混合阳极电解液和阴极电解液。

公开(公告)号：US06806194B2

公开(公告)日：2004-10-19

申请号：US10412944

申请日：2003-04-14

申请人： Paul Z. Wirth ,  Steven L. Peace ,  Erik Lund

发明人： Paul Z. Wirth ,  Steven L. Peace ,  Erik Lund

IPC分类号： H01L21311

CPC分类号： B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/6715 ,  Y10S134/902 ,  Y10S438/906 ,  Y10S438/913

摘要： A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap. Fluid is rapid evacuated by spinning the rotors with the head rotors slightly apart and unsealed, causing the fluid to flow our quickly under centrifugal force.

摘要翻译： 用于处理工件的系统包括附接到头部升降器的头部。 工件在上转子和下转子之间的头部中被支撑。 底座有一个容纳液体的碗。 头部可由头部升降器从垂直于碗的第一位置移动到第二位置，在该位置，工件至少部分地定位在碗中。 碗具有轮廓部分，其侧壁具有与碗中的排水出口相邻增加的曲率半径，以帮助液体从碗中快速排出。 头部具有负载位置，其中转子间隔开第一量，以及处理位置，其中转子彼此接合并密封。 为了快速排出流体，头部还具有快速的排放位置，其中转子被足够地移动以产生环形的排水间隙。 流体通过旋转转子而迅速抽空，头部转子稍微分开并开封，导致流体在离心力下快速流动。

公开(公告)号：US06494984B2

公开(公告)日：2002-12-17

申请号：US09231194

申请日：1999-01-14

申请人： Steven L. Peace

发明人： Steven L. Peace

IPC分类号： H01L213065

CPC分类号： H01L21/6838

摘要： A machine for processing the front side of a flat media workpiece, such as a silicon wafer, seals the backside of the wafer from processing chemicals. A rotor has an inside ring and an outside ring protruding from the rotor face. The inside ring and outside ring are separated by an annular groove in the rotor. A O-ring is positioned between the inside ring and the outside ring. A membrane extends from the inside ring, over the annular groove and the O-ring, to the outside ring. The membrane and face of the rotor form a sealable wafer back face chamber between them. Vacuum is applied to the back face chamber to hold the wafer against the membrane. The back surface of the wafer is sealed from processing chemicals, which are allowed to contact only the front surface and edges of the wafer.

摘要翻译： 用于处理诸如硅晶片的平坦介质工件的前侧的机器将晶片的背面与处理化学品密封。 转子具有从转子表面突出的内环和外环。 内环和外环由转子中的环形槽分隔开。 O形圈位于内圈和外圈之间。 膜从内环延伸到环形槽和O形环上方到外部环。 转子的膜和面在它们之间形成可密封的晶片背面室。 真空被施加到背面腔室以将晶片保持在膜上。 晶片的后表面与处理化学品密封，化学品只允许与晶片的前表面和边缘接触。

公开(公告)号：US06492284B2

公开(公告)日：2002-12-10

申请号：US09907552

申请日：2001-07-16

申请人： Steven L. Peace ,  Paul Z. Wirth ,  Eric Lund

发明人： Steven L. Peace ,  Paul Z. Wirth ,  Eric Lund

IPC分类号： H01L2348

CPC分类号： B08B3/04 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086 ,  H01L21/6715 ,  Y10S438/913

摘要： A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. Sonic energy is introduced into the liquid and acts on the workpiece to improve processing. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.